Abrasive regeneration method
US-9701878-B2 · Jul 11, 2017 · US
Diamond abrasive recovery method
US9868187B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9868187-B2 |
| Application number | US-201414786895-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 16, 2014 |
| Priority date | Apr 30, 2013 |
| Publication date | Jan 16, 2018 |
| Grant date | Jan 16, 2018 |
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Abstract
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A diamond abrasive recovery method in which diamond abrasive is recovered from polishing material slurry including diamond abrasive used for polishing a polishing target mainly composed of silicon. The method comprises (1) recovering polishing material slurry including the used diamond abrasive; (2) adding inorganic salt including a metallic element which is to be a divalent or trivalent cation to the recovered polishing material slurry to aggregate the diamond abrasive and separating a supernatant liquid from a diamond abrasive included dispersion medium; and (3) extracting diamond abrasive from the separated diamond abrasive included dispersion medium using a low polarity dispersion medium.
First claim
Opening claim text (preview).
The invention claimed is: 1. A diamond abrasive recovery method in which diamond abrasive is recovered from polishing material slurry including diamond abrasive used for polishing a polishing target mainly composed of silicon, the method comprising: (1) recovering polishing material slurry including the used diamond abrasive; (2) adding inorganic salt including a metallic element which is to be a divalent or trivalent cation to the recovered polishing material slurry to aggregate the diamond abrasive and separating a supernatant liquid from a diamond abrasive included dispersion medium; and (3) extracting diamond abrasive from the separated diamond abrasive included dispersion medium using a low polarity dispersion medium. 2. The diamond abrasive recovery method according to claim 1 , wherein, the inorganic salt including the metallic element which is to be a divalent or trivalent cation used in the separating is magnesium salt, calcium salt, or aluminum salt. 3. The diamond abrasive recovery method according to claim 1 , wherein, the low polarity dispersion medium is toluene or diethyl ether. 4. The diamond abrasive recovery method according to claim 1 , wherein, the recovery method of polishing material in the separating is a decantation separating method by natural sediment.
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Classifications
using flocculating agents (for purifying water C02F1/52; for liquid radioactive waste G21F9/10) · CPC title
by flocculation or precipitation of suspended impurities {(C02F1/463 takes precedence)} · CPC title
- B24B55/12Primary
Devices for exhausting mist of oil or coolant; Devices for collecting or recovering materials resulting from grinding or polishing, e.g. of precious metals, precious stones, diamonds or the like · CPC title
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- What does patent US9868187B2 cover?
- A diamond abrasive recovery method in which diamond abrasive is recovered from polishing material slurry including diamond abrasive used for polishing a polishing target mainly composed of silicon. The method comprises (1) recovering polishing material slurry including the used diamond abrasive; (2) adding inorganic salt including a metallic element which is to be a divalent or trivalent cation…
- Who is the assignee on this patent?
- Konica Minolta Inc
- What technology area does this patent fall under?
- Primary CPC classification B24B55/12. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Jan 16 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).