Structures and fabrication methods of flexible thermoelectric devices
US-2017170381-A1 · Jun 15, 2017 · US
US9863885B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9863885-B2 |
| Application number | US-201615288687-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 7, 2016 |
| Priority date | Oct 7, 2015 |
| Publication date | Jan 9, 2018 |
| Grant date | Jan 9, 2018 |
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A method for fabricating a composite film structure, the method includes determining a desired morphology for a metallic layer of the composite film structure, selecting a first metal substrate based on the determining, transferring a graphene layer onto the first metal substrate, depositing the metallic layer on the graphene layer to achieve the desired morphology, and removing the first metal substrate from the graphene and the deposited metallic layer to form the composite film structure. A surface energy difference between the first metal substrate and the deposited metallic layer results in the desired morphology of the metallic layer.
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What is claimed is: 1. A method for fabricating a composite film structure, the method comprising: determining a desired morphology for a metallic layer of the composite film structure; selecting a first metal substrate based on the determining; transferring a graphene layer onto the first metal substrate; depositing the metallic layer on the graphene layer to achieve the desired morphology, wherein a surface energy difference between the first metal substrate and the deposited metallic layer results in the desired morphology of the metallic layer, the desired morphology comprises a layer of nanoislands having controlled and uniform inter-nanoisland separation and a distance between edges of nanoislands in the metallic layer is on the order of about 2 Å to a few nanometers, and removing the first metal substrate from the graphene and the deposited metallic layer to form the composite film structure. 2. The method of claim 1 , wherein depositing the metallic layer comprises deposition of evaporated flux of metallic atoms. 3. The method of claim 2 , wherein the evaporated flux of metallic atoms self-assemble to yield the desired morphology. 4. The method of claim 2 , where in the evaporated flux of metallic atoms are produced by electron beam evaporation, thermal evaporation, or sputtering. 5. The method of claim 1 , wherein transferring the graphene layer onto the first metal substrate comprises exfoliating the graphene grown on a second metal substrate and placing the graphene layer onto the first metal substrate; and wherein the graphene comprises a single layer of graphene. 6. The method of claim 5 , wherein the graphene is grown on the second metal substrate using chemical vapor deposition. 7. The method of claim 1 , wherein the first metal substrate comprises a transition metal. 8. The method of claim 7 , wherein the transition metal comprises gold, silver, or nickel. 9. A method of forming a substrate for surface-enhanced Raman scattering, the method comprising: depositing a graphene layer on a first metal substrate; depositing a plurality of metallic nanoislands on the graphene layer, wherein a surface energy difference between the first metal substrate and the deposited metallic nanoislands results in the desired morphology of the metallic nanoislands, the desired morphology comprises a layer of nanoislands having controlled and uniform inter-nanoisland separation and a distance between edges of nanoislands in the metallic layer is on the order of about 2 Å to a few nanometers; removing the first metal substrate from the graphene and the deposited plurality of metallic nanoislands to form the substrate for surface-enhanced Raman scattering. 10. A method of performing surface-enhanced Raman scattering of an analyte, the method comprising: forming a substrate for surface-enhanced Raman scattering according to the method of claim 9 ; transferring the substrate on an optical fiber; coating the analyte on the substrate; and recording surface-enhanced Raman scattering signals from the analyte. 11. The method of claim 10 , wherein the plurality of metallic nanoislands comprises a plasmonically active metal. 12. The method of claim 11 , wherein the plasmatically active metal comprises copper, silver, palladium, gold, or platinum nanoislands. 13. A method of performing surface-enhanced Raman scattering of an analyte, the method comprising: forming a substrate for surface-enhanced Raman scattering according to the method of claim 9 ; transferring the substrate on an optical fiber; placing the substrate into the analyte; and recording surface-enhanced Raman scattering signals from the analyte.
Cuvettes therefore · CPC title
using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material · CPC title
on temporary substrates, e.g. substrates subsequently removed by etching · CPC title
Coating on selected surface areas, e.g. using masks · CPC title
on other inorganic substrates · CPC title
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