Process for making hydroxylated cyclopentylpyrimidine compounds
US-9676730-B2 · Jun 13, 2017 · US
US9862689B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9862689-B2 |
| Application number | US-201415036741-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 13, 2014 |
| Priority date | Nov 15, 2013 |
| Publication date | Jan 9, 2018 |
| Grant date | Jan 9, 2018 |
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The present invention relates to a process for the preparation of a compound of formula (I), wherein R 1 is as defined herein, which is useful as an intermediate in the preparation of active pharmaceutical compounds.
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The invention claimed is: 1. A process for the preparation of a compound of formula (I) or a salt thereof, comprising coupling a compound of formula (II) with a deprotected compound of formula (III) wherein R 1 is an amino-protecting group selected from the list of benzyl, benzyloxycarbonyl (carbobenzyloxy, CBZ), 9-Fluorenylmethyloxycarbonyl (Fmoc), p-methoxybenzyloxycarbonyl, p-nitrobenzyloxycarbonyl, tert-butoxycarbonyl (BOC), and trifluoroacetyl; R 2 is an amino-protecting group selected from the list of benzyl, benzyloxycarbonyl (carbobenzyloxy, CBZ), 9-Fluorenylmethyloxycarbonyl (Fmoc), p-methoxybenzyloxycarbonyl, p-nitrobenzyloxycarbonyl, tert-butoxycarbonyl (BOC), and trifluoroacetyl; and M is a metal ion selected from the list of alkali metal ion, alkaline earth metal ion and transition metal ion; to provide the compound of formula (I) or a salt thereof. 2. The process according to claim 1 , wherein R 1 is tert-butoxycarbonyl (BOC). 3. The process according to claim 1 , wherein R 2 is tert-butoxycarbonyl (BOC). 4. The process according to claim 1 , wherein M is Na + . 5. The process according to claim 1 , comprising the following reaction steps: a) Deprotection of the compound of formula (III) in a solvent under acidic conditions; b) Adjustment to an alkaline pH using a base; c) Addition of a solution comprising the compound of formula (II) in a solvent; d) Addition of a solution comprising a coupling agent in a solvent. 6. The process according to claim 5 , wherein the deprotection in step a) is performed using hydrochloric acid. 7. The process according to claim 5 , wherein the solvent used for the deprotection in step a) is selected from n-propanol and isopropanol. 8. The process according to claim 5 , wherein the base in step b) is selected from N-ethyl morpholine (NEM), triethylamine (TEA), tri(n-propyl)amine (TPA), diisopropylethylamine (DIPEA), pyridine and lutidine. 9. The process according to claim 5 , wherein the solvent in step c) is selected from n-propanol and isopropanol. 10. The process according to claim 5 , wherein the coupling agent used in step d) is propylphosphonic anhydride (T3P). 11. The process according to claim 5 , wherein the solvent used in step d) is a mixture of n-propanol and toluene. 12. The process according to claim 1 , further comprising preparing the compound of formula (II) comprising the asymmetric hydrogenation of a compound of formula (IV) using a metal complex catalyst (C); wherein the metal complex catalyst (C) is a ruthenium complex catalyst selected from a compound of formula (C1), (C2) or (C3): Ru(Z) 2 D (C1) [Ru(Z) 2-p (D)(L) m ](Y) p (C2) Ru(E)(E′)(D)(F) (C3) wherein: D is a chiral phosphine ligand; L is a neutral ligand selected from C 2-7 alkene, cyclooctene, 1,3-hexadiene, norbornadiene, 1,5-cyclooctadiene, benzene, hexamethylbenzene, 1,3,5-trimethylbenzene, p-cymene, tetrahydrofuran, dimethylformamide, acetonitrile, benzonitrile, acetone, toluene and methanol; Z is an anionic ligand selected from hydride, fluoride, chloride, bromide, η 5 -2,4-pentadienyl, η 5 -2,4-dimethyl-pentadienyl or the group A-COO − , with the proviso that when two Z are attached to the Ru atom they can either be the same or different; A is C 1-7 alkyl, C 1-7 haloalkyl, aryl, or haloaryl; Y is a non-coordinating anion selected from fluoride, chloride, bromide, BF 4 − , ClO 4 − , SbF 6 − , PF 6 − , B(phenyl) 4 − , B(3,5-di-trifluoromethyl-phenyl) 4 − , CF 3 SO 3 − , and C 6 H 5 SO 3 − ; F is an optionally chiral diamine; E and E′ are both halogen ions, or E is hydride and E′ is BH 4 − ; m is 1, 2, 3 or 4; and p is 1 or 2, to provide the compound of formula (II). 13. The process according to claim 1 , further comprising deprotecting the compound of formula I or a salt thereof to provide a compound of formula (VI) or a pharmaceutically acceptable salt thereof. 14. The process according to claim 13 , comprising the following reaction steps: i) Deprotection of the compound of formula (I) in a solvent under acidic conditions; ii) Adjustment of the pH using a base in a solvent; iii) Optionally crystallizing the compound of formula (VI). 15. The process according to claim 14 , wherein the deprotection in step i) is performed using hydrochloric acid, sulfuric acid, trifluoro acetic acid or hydrobromic acid. 16. The process according to claim 14 , wherein the solvent used for the deprotection in step i) is selected from n-propanol and isopropanol. 17. The process according to claim 14 , wherein the base in step ii) is ammonia. 18. The process according to claim 14 , wherein the solvent in step ii) is selected from n-propanol and isopropanol. 19. The process according to claim 14 , wherein the crystallization in step iii) is performed by a solvent switch to a crystallization solvent selected from toluene, heptane, tetrahydrofuran, 2-propanone, 2-butanone, ethylene glycol dimethyl ether, ethyl acetate, butyl acetate, isopropyl acetate and mixtures thereof. 20. A mixture comprising a compound of formula (VI) or a pharmaceutically acceptable salt thereof as described in claim 13 and between 1 ppb and 100 ppm of a compound of formula (I) or a salt thereof. 21. A mixture comprising a compound of formula (VI) or a pharmaceutically acceptable salt thereof as described in 13 and between 1 ppb and 1 ppm of a compound of formula (I) or a salt thereof. 22. A mixture comprising a compound of formula (I) or a salt thereof as described in claim 1 and between 1 ppb and 100 ppm of a compound of formula (II). 23. A mixture comprising a compound of formula (I) or a salt thereof as described in claim 1 and between 1 ppb and 1 ppm of a compound of formula (II). 24. A mixture comprising a compound of formula (I) or a salt thereof as described in claim 1 and between 1 ppb and 100 ppm of a compound of formula (III). 25. A mixture comprising a compound of formula (I) or a salt thereof as described in claim 1 and between 1 ppb and 1 ppm of a compound of formula (III). 26. A mixture comprising a compound of formula (I) or a salt thereof as described in claim 1 and between 1 ppb and 100 ppm of a compound of formula (II) and between 1 ppb and 100 ppm of a compound of formula (III). 27. A mixture comprising a compound of formula (I) or a salt thereof as described in claim 1 and between 1 ppb and 1 ppm of a compound of formula (II) and between 1 ppb and 1 ppm of a compound of formula (III).
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