Vertical field effect transistors with metallic source/drain regions

Patent metadata

Field	Value
Publication number	US-9859384-B2
Application number	US-201715431807-A
Country	US
Kind code	B2
Filing date	Feb 14, 2017
Priority date	Apr 28, 2016
Publication date	Jan 2, 2018
Grant date	Jan 2, 2018

Abstract

Semiconductor devices having vertical FET (field effect transistor) devices with metallic source/drain regions are provided, as well as methods for fabricating such vertical FET devices. For example, a semiconductor device includes a first source/drain region formed on a semiconductor substrate, a vertical semiconductor fin formed on the first source/drain region, a second source/drain region formed on an upper surface of the vertical semiconductor fin, a gate structure formed on a sidewall surface of the vertical semiconductor fin, and an insulating material that encapsulates the vertical semiconductor fin and the gate structure. The first source/drain region comprises a metallic layer and at least a first epitaxial semiconductor layer. For example, the metallic layer of the first source/drain region comprises a metal-semiconductor alloy such as silicide.

First claim

What is claimed is:

1. A semiconductor device, comprising:
a first source/drain region formed on a semiconductor substrate, wherein the first source/drain region comprises a metallic layer and at least a first epitaxial semiconductor layer;
a vertical semiconductor fin formed on the first source/drain region;
a second source/drain region formed on an upper surface of the vertical semiconductor fin;
a gate structure formed on a sidewall surface of the vertical semiconductor fin;
a layer of insulating material encapsulating the vertical semiconductor fin and the gate structure; and
a first vertical contact formed through the layer of insulating material and in contact with the metallic layer of the first source/drain region, wherein the first vertical contact and the metallic layer of the first source/drain region are formed of a same metallic material.

2. The semiconductor device of claim 1 , wherein the metallic layer of the first source/drain region extends along an entire length of the vertical semiconductor fin.

3. The semiconductor device of claim 1 , wherein the metallic layer comprises at least one of copper, tungsten, cobalt, and aluminum.

4. The semiconductor device of claim 1 , wherein the first source/drain region comprises a second epitaxial semiconductor layer, wherein the metallic layer is disposed between the first and second epitaxial semiconductor layers.

5. The semiconductor device of claim 1 , wherein the vertical semiconductor fin comprises an epitaxial semiconductor material that is epitaxially grown on the first epitaxial semiconductor layer of the first source/drain region.

6. The semiconductor device of claim 1 , further comprising a second vertical contact formed through the layer of insulating material, which is formed of the same metallic material as the metallic layer of the first source/drain region, wherein the first vertical contact is disposed adjacent to an end of the vertical semiconductor fin, and wherein the second vertical contact is disposed adjacent to a first sidewall of the vertical semiconductor fin.

7. The semiconductor device of claim 6 , further comprising a third vertical contact formed through the layer of insulating material, which is formed of the same metallic material as the metallic layer of the first source/drain region, wherein the third vertical contact is disposed adjacent to a second sidewall of the vertical semiconductor fin, which is opposite the first sidewall of the vertical semiconductor fin.

8. A method for fabricating a semiconductor device, comprising:
forming a first source/drain region on a semiconductor substrate, wherein the first source/drain region comprises a first epitaxial semiconductor layer and a sacrificial epitaxial semiconductor layer;
forming a vertical semiconductor fin on the first source/drain region;
forming, a gate structure on a sidewall surface of the vertical semiconductor fin;
encapsulating the vertical semiconductor fin and the gate structure in insulating, material;
forming a second source/drain region on an upper surface of the vertical semiconductor fin;
forming an opening through the insulating material and into the first source/drain region to expose the sacrificial epitaxial semiconductor layer of the first source/drain region;
removing at least a portion of the sacrificial epitaxial semiconductor layer through the opening in the insulating material to form a void in the first source/drain region; and
filling the void in the first source/drain region and the opening in the insulating material with a same metallic material to form a first vertical contact which vertically extends through the insulating material.

9. The method of claim 8 , wherein forming the first source/drain region on the semiconductor substrate comprises forming a heteroepitaxial stack structure comprising the sacrificial epitaxial semiconductor layer disposed between the first epitaxial semiconductor layer and a second semiconductor epitaxial layer.

10. The method of claim 8 , wherein forming a vertical semiconductor fin on the first source/drain region comprises epitaxially growing the vertical semiconductor fin on the first epitaxial semiconductor layer of the first source/drain region.

11. The method of claim 8 , wherein removing at least a portion of the sacrificial epitaxial semiconductor layer to form a void in the first source/drain region comprises etching the sacrificial epitaxial semiconductor layer selective to the first epitaxial semiconductor layer.

12. The method of claim 8 , wherein filling the void in the first source/drain region and the opening in the insulating material with the metallic material comprises performing a single metal deposition process to concurrently fill the void and the opening with the same metallic material.

13. The method of claim 12 , wherein the metallic material comprises at least one of copper, tungsten, cobalt, and aluminum.

14. The method of claim 8 , wherein forming an opening through the insulating material comprises forming two or more openings through the insulating material and into the first source/drain region to expose the sacrificial epitaxial semiconductor layer of the first source/drain region; and
wherein filling the opening with the metallic material comprises filling, the two or more openings with the metallic material to form the first vertical contact and at least a second vertical in the insulating material, wherein the first vertical contact is disposed adjacent to an end of the vertical semiconductor fin, and wherein the second vertical contact is disposed adjacent to a sidewall of the vertical semiconductor fin.

Assignees

• IBM

Inventors

• Mallela Hari V
• Robison Robert R
• Vega Reinaldo
• Venigalla Rajasekhar

Classifications

• H10W20/40

  Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes · CPC title

• H01L29/41741 Primary

  Electricity · mapped topic

• H01L29/7827

  Electricity · mapped topic

• H01L23/485

  Electricity · mapped topic

• H01L29/41791

  Electricity · mapped topic