Semiconductor device with a reduced band gap zone

Patent metadata

Field	Value
Publication number	US-9859272-B2
Application number	US-201615210449-A
Country	US
Kind code	B2
Filing date	Jul 14, 2016
Priority date	Jul 20, 2015
Publication date	Jan 2, 2018
Grant date	Jan 2, 2018

Abstract

A semiconductor device comprising a source region being electrically connected to a first load terminal (E) of the semiconductor device and a drift region comprising a first semiconductor material (M 1 ) having a first band gap, the drift region having dopants of a first conductivity type and being configured to carry at least a part of a load current between the first load terminal (E) and a second load terminal (C) of the semiconductor device, is presented. The semiconductor device further comprises a semiconductor body region having dopants of a second conductivity type complementary to the first conductivity type and being electrically connected to the first load terminal (E), a transition between the semiconductor body region and the drift region forming a pn-junction, wherein the pn-junction is configured to block a voltage applied between the first load terminal (E) and the second load terminal (C). The semiconductor body region isolates the source region from the drift region and includes a reduced band gap zone comprising a second semiconductor material (M 2 ) having a second band gap that is smaller than the first band gap, wherein the reduced band gap zone is arranged in the semiconductor body region such that the reduced band gap zone and the source region exhibit, in a cross-section along a vertical direction (Z), at least one of a common lateral extension range (LR) along a first lateral direction (X) and a common vertical extension range (VR) along the vertical direction (Z).

First claim

The invention claimed is:

1. A semiconductor device comprising
a source region being electrically connected to a first load terminal of the semiconductor device;
a drift region comprising a first semiconductor material having a first band gap, the drift region having dopants of a first conductivity type and being configured to carry at least a part of a load current between the first load terminal and a second load terminal of the semiconductor device; and
a semiconductor body region having dopants of a second conductivity type complementary to the first conductivity type and being electrically connected to the first load terminal, a transition between the semiconductor body region and the drift region forming a pn-junction, the pn-junction being configured to block a voltage applied between the first load terminal and the second load terminal,
wherein
the semiconductor body region isolates the source region from the drift region and includes a reduced band gap zone comprising a second semiconductor material having a second band gap that is smaller than the first band gap, wherein the reduced band gap zone and the source region exhibit, in a cross-section along a vertical direction, at least one of a common lateral extension range along a first lateral direction and a common vertical extension range along the vertical direction;
the first load terminal comprises a contact metal arranged in contact with each of the source region and the reduced band gap zone; and
the semiconductor body region further comprises an anti latch-up zone, the anti latch-up zone being arranged in contact with the source region and the contact metal, and exhibiting a higher electric conductivity than the semiconductor body region external of the anti latch-up zone, wherein the anti latch-up zone and the reduced band gap zone exhibit a common overlap region.

2. A semiconductor device comprising
a source region being electrically connected to a first load terminal of the semiconductor device;
a drift region comprising a first semiconductor material having a first band gap, the drift region having dopants of a first conductivity type and being configured to carry at least a part of a load current between the first load terminal and a second load terminal of the semiconductor device; and
a semiconductor body region having dopants of a second conductivity type complementary to the first conductivity type and being electrically connected to the first load terminal, a transition between the semiconductor body region and the drift region forming a pn-junction, the pn-junction being configured to block a voltage applied between the first load terminal and the second load terminal,
wherein
the semiconductor body region isolates the source region from the drift region and includes a reduced band gap zone comprising a second semiconductor material having a second band gap that is smaller than the first band gap, wherein the reduced band gap zone and the source region exhibit, in a cross-section along a vertical direction, at least one of a common lateral extension range along a first lateral direction and a common vertical extension range along the vertical direction;
the semiconductor device further comprises a first gate trench and a second gate trench extending into the semiconductor body along the vertical direction, the semiconductor body region being arranged between the first gate trench and the second gate trench, wherein the reduced band gap zone extends for at least 20% of a horizontal distance between the first gate trench and the second gate trench along the first lateral direction.

3. The semiconductor device of claim 2 , wherein the first load terminal comprises a contact metal arranged in contact with each of the source region and the reduced band gap zone.

4. The semiconductor device of claim 3 , wherein the semiconductor body region further comprises an anti latch-up zone, the anti latch-up zone being arranged in contact with the source region and the contact metal, and exhibiting a higher electric conductivity than the semiconductor body region external of the anti latch-up zone, wherein the anti latch-up zone and the reduced band gap zone exhibit a common overlap region.

5. The semiconductor device of claim 1 , further comprising an insulator and a gate electrode, the gate electrode being electrically insulated from the source region, the semiconductor body region and the drift region by the insulator, and being configured to induce an inversion channel inside a channel region of the semiconductor body region, the channel region extending along the insulator through the semiconductor body region from the source region to the drift region.

6. The semiconductor device of claim 5 , wherein the reduced band gap zone extends into the channel region.

7. The semiconductor device of claim 6 , wherein the overlap region extends into the channel region.

8. The semiconductor device of claim 1 , further comprising at least one gate trench extending into the semiconductor body along the vertical direction, the gate trench being arranged in contact with each of the source region, the semiconductor body region and the drift region, and comprising the gate electrode and the insulator.

9. The semiconductor device of claim 8 , wherein the semiconductor device comprises a first gate trench and a second gate trench, the semiconductor body region being arranged between the first gate trench and the second gate trench, wherein the reduced band gap zone extends for at least 20% of a horizontal distance between the first gate trench and the second gate trench along the first lateral direction.

10. The semiconductor device of claim 1 , wherein the source region comprises the second semiconductor material.

11. A semiconductor device comprising a semiconductor body coupled to a first load terminal and a second load terminal of the semiconductor device, wherein the semiconductor body includes:
a first semiconductor layer comprising a first semiconductor material having a first band gap, the first semiconductor layer being configured to carry at least a part of a load current between the first load terminal and the second load terminal; and
an emitter layer being in contact with the first semiconductor layer and being configured to inject charge carriers into the first semiconductor layer, wherein the emitter layer includes at least one first emitter zone comprising the first semiconductor material and at least one second emitter zone arranged laterally adjacent to the first emitter zone and comprising a second semiconductor material having a second band gap that is smaller than the first band gap;
wherein the semiconductor device further comprises a metal layer being electrically connected with one of the first load terminal and the second load terminal and arranged in contact with the emitter layer, a transition between the metal layer and the first emitter zone forming a first semiconductor-to-metal transition exhibiting a first contact resistance, and a transition between the metal layer and the second emitter zone forming a second semiconductor-to-metal transition exhibiting a second contact resistance that is smaller than the first contact resistance.

12. The semiconductor device of claim 11 , wherein the first semiconductor-to-metal transition is configured to provide a Schottky contact between the metal layer and the first emitter zone, and wherein the second semiconductor-to-metal transition is configured to provide an ohmic contact between the metal layer and the second emitter zone.

13. The semiconductor device of claim 11 , wherein the first semiconductor layer has dopants of a first conduc

Assignees

• Infineon Technologies Ag

Inventors

• Schulze Hans-Joachim
• Huesken Holger
• Niedernostheide Franz-Josef
• Pfirsch Frank Dieter
• Roth Roman
• Sandow Christian Philipp
• Schaeffer Carsten
• Voss Stephan

Classifications

• H01L29/0834

  Electricity · mapped topic

• H01L29/165

  Electricity · mapped topic

• H01L29/0619

  Electricity · mapped topic

• H01L29/45

  Electricity · mapped topic

• H01L29/47

  Electricity · mapped topic