Image processing-based lithography system and method of coating target object

Patent metadata

Field	Value
Publication number	US-9856564-B2
Application number	US-201615008995-A
Country	US
Kind code	B2
Filing date	Jan 28, 2016
Priority date	Sep 30, 2009
Publication date	Jan 2, 2018
Grant date	Jan 2, 2018

Abstract

A technique related with a lithography system is disclosed. The lithography system includes at least one target object disposed on a substrate, a processor configured to process an image of the target object to determine an optical pattern for a coating layer of the target object, and an exposure apparatus configured to provide light having the optical pattern determined by the processor to the substrate.

First claim

What is claimed is:

1. A lithography system comprising:
an illuminator configured to provide a first light to at least one target object disposed on a substrate to form an image of the at least one target object;
a processor configured to process the image formed by the first light provided by the illuminator and determine an optical pattern for a coating layer of the at least one target object based on the processing of the image formed by the first light provided by the illuminator;
a coater configured to supply a photoresist to at least a portion of surfaces of the substrate and the target object; and
an exposure apparatus configured to provide the optical pattern determined by the processor to the substrate,
wherein the exposure apparatus comprises:
a light source; and
a spatial light modulator configured to modulate a second light provided by the light source in response to a signal corresponding to the optical pattern provided by the processor.

2. The system of claim 1 , wherein the photoresist contains a phosphor.

3. The system of claim 1 , further comprising a beam splitter configured to transmit the second light modulated by the exposure apparatus to the substrate and to transmit the image formed by the first light provided by the illuminator to the processor.

4. The system of claim 1 , wherein the coater is selected from a group consisting of a spin coater, a spray coater, and a microfluidic channel.

5. The system of claim 1 , further comprising a second coater configured to form a conductive layer or an insulating layer on at least a portion of the surfaces of the substrate and the target object.

6. The system of claim 5 , wherein the second coater is selected from a group consisting of a physical vapor deposition apparatus, chemical vapor deposition apparatus, and an electroplating apparatus.

7. The system of claim 1 , wherein the at least one target object comprises a light emitting device.

8. A method of coating a target object, comprising:
preparing a substrate having a surface on which at least one target object is disposed;
providing, by a first light source, a first light to the at least one target object;
capturing, by a camera, an image of the at least one target object formed by the first light and providing an electric signal corresponding to the captured image to a processor;
determining, by the processor, an optical pattern for a coating layer of the at least one target object by processing the image of the at least one target object formed by the first light;
supplying, by a coater, a photoresist onto at least a portion of surfaces of the substrate and the at least one target object; and
providing, by a second light source, a second light having the determined optical pattern to the substrate so as to form the photoresist into the coating layer having a shape of the optical pattern.

9. The method of claim 8 ,
wherein the photoresist contains a phosphor, and
wherein the photoresist is selectively cured by the second light having the determined optical pattern.

10. The method of claim 9 , further comprising forming an additional coating layer on at least a portion of the at least one target object before supplying the photoresist.

11. The method of claim 8 , wherein the second light having the determined optical pattern is transmitted to the substrate by a beam splitter and the image of the at least one target object formed by the first light is transmitted to the processor by the beam splitter.

12. The method of claim 8 , further comprising: forming a conductive layer or an insulating layer, by a second coater, on at least the portion of the surfaces of the substrate and the target object.

13. The method of claim 8 , wherein the photoresist comprises a phosphor and the at least one target object is a light emitting device.

14. A method of coating a target object, comprising:
preparing a substrate having one surface on which at least one target object is disposed;
forming photoresist on at least a portion of surfaces of the substrate and the at least one target object;
forming a perimeter wall on each target object by processing an image of the at least one target object, the perimeter wall surrounding each target object; and
coating each target object by providing a resin to an inside of the perimeter wall surrounding each target object.

15. The method of claim 14 , wherein the resin contains a phosphor.

16. The method of claim 14 , wherein forming the perimeter wall comprises:
obtaining the image of the at least one target object; and
providing light having an optical pattern corresponding to the perimeter wall to the substrate using the obtained image of the at least one target object.

Assignees

• Snu R&Db Foundation

Inventors

• Kwon Sunghoon
• Chung Sueun
• Lee Seungah
• Jang Jisung
• Han Sangkwon

Classifications

• H10W74/014

  using batch processing · CPC title

• G03F7/7085

  Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load · CPC title

• G03F7/70483

  Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring · CPC title

• G03F9/00

  Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/70625

  Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness · CPC title