Resistive memory devices with an oxygen-supplying layer

Patent metadata

Field	Value
Publication number	US-9847482-B2
Application number	US-201415305599-A
Country	US
Kind code	B2
Filing date	Apr 29, 2014
Priority date	Apr 29, 2014
Publication date	Dec 19, 2017
Grant date	Dec 19, 2017

Abstract

A resistive memory device includes a bottom electrode and a top electrode crossing the bottom electrode at a non-zero angle. A switching region operatively contacts the bottom electrode and the top electrode. The switching region defines a current path between the bottom electrode and the top electrode in an ON state. An oxygen-supplying layer operatively contacts a portion of the switching region. The oxygen-supplying layer is positioned orthogonally to the current path and to the switching region.

First claim

What is claimed is:

1. A resistive memory device, comprising:
a bottom electrode;
a top electrode crossing the bottom electrode at a non-zero angle;
a switching region operatively contacting the bottom electrode and the top electrode, the switching region defining a current path between the bottom electrode and the top electrode in an ON state; and
an oxygen-supplying layer operatively contacting a portion of the switching region, the oxygen-supplying layer being positioned orthogonally to the current path and to the switching region.

2. The resistive memory device as defined in claim 1 , further comprising an insulating layer sandwiching the oxygen-supplying layer to form a stack between the bottom electrode and the top electrode, the stack surrounding at least a portion of the switching region.

3. The resistive memory device as defined in claim 2 wherein the switching region includes:
an oxygen-rich film in contact with the stack, the top electrode, and the bottom electrode; and
a metal-rich film in contact with the oxygen-rich film and the top electrode.

4. The resistive memory device as defined in claim 2 wherein the switching region includes:
an oxygen-rich film in contact with the stack, the top electrode, and the bottom electrode; and
a metal-rich film in contact with the oxygen-rich film and the bottom electrode.

5. The resistive memory device as defined in claim 1 wherein:
the top electrode is part of a stack that further includes:
an insulating layer sandwiching the oxygen-supplying layer and having two opposed surfaces; and
a metal layer positioned between one of the two opposed surfaces of the insulating layer and the top electrode;
wherein another of the two opposed surfaces of the insulating layer contacts the bottom electrode; and
the switching region is positioned on the bottom electrode and has a surface that contacts an edge of the stack such that the switching region contacts an edge of each of the top electrode, the insulating layer, the oxygen-supplying layer, and the metal layer.

6. The resistive memory device as defined in claim 5 wherein the switching region is a metal oxide.

7. The resistive memory device as defined in claim 5 , further comprising a capping layer contacting another surface of the switching region.

8. The resistive memory device as defined in claim 1 , further comprising:
a second top electrode electrically isolated from the first top electrode and crossing the bottom electrode at a non-zero angle; and
a second switching region electrically isolated from the switching region and operatively contacting the bottom electrode and the second top electrode, the second switching region defining another current path between the bottom electrode and the second top electrode in an ON state;
wherein the oxygen-supplying layer operatively contacts a portion of the second switching region, and wherein the oxygen-supplying layer is positioned orthogonally to the other current path and to the second switching region.

9. A crossbar, comprising:
an array of parallel bottom electrodes;
an array of parallel top electrodes crossing the bottom electrodes at a non-zero angle;
a junction formed at each intersection of one of the bottom electrodes and one of the top electrodes;
a switching region at each junction, the switching region defining a current path between the one of the bottom electrodes and the one of the top electrodes in an ON state; and
an oxygen-supplying layer operatively contacting a portion of each switching region, the oxygen-supplying layer being positioned orthogonally to the current paths and to the switching regions.

10. A method for making a resistive memory device, the method comprising:
forming a bottom electrode;
forming an oxygen-supplying layer on the bottom electrode;
forming an insulating layer on the oxygen-supplying layer, wherein the oxygen-supplying layer is sandwiched between the insulating layer and the bottom electrode, the oxygen-supplying layer being substantially parallel to a contact surface of the bottom electrode;
forming a switching region such that the switching region operatively contacts the contact surface of the bottom electrode, and is orthogonal to the contact surface of the bottom electrode; and
forming a top electrode such that is crosses the bottom electrode at a non-zero angle and operatively contacts the switching region.

11. The method as defined in claim 10 wherein:
forming the oxygen-supplying layer sandwiched between the insulating layer includes:

depositing a portion of the insulating layer on the contact surface of the bottom electrode;
depositing the oxygen-supplying layer on the portion of the insulating layer; and
depositing another portion of the insulating layer on the oxygen-supplying layer;
forming the switching region includes:
forming a trench in the oxygen-supplying layer sandwiched between the insulating layer such that a portion of the contact surface of the bottom electrode is exposed;

conformally depositing an oxygen-rich film on exposed surfaces of the trench; and
selectively depositing a metal-rich film to fill the trench; and
the top electrode contacts the metal-rich film of the switching region.

12. The method as defined in claim 10 , further comprising exposing the switching region to electroforming or thermal annealing.

13. The method as defined in claim 10 wherein:
forming the switching region includes:
selectively depositing a metal-rich film on a portion of the contact surface of the bottom electrode such that the metal-rich film protrudes out from the contact surface; and
conformally depositing an oxygen-rich film on exposed surfaces of the metal-rich film;
forming the oxygen-supplying layer sandwiched between the insulating layer includes:
selectively depositing a portion of the insulating layer on the contact surface of the bottom electrode such that the portion surrounds the oxygen-rich film of the switching region;
directionally depositing the oxygen-supplying layer on the portion of the insulating layer; and
selectively depositing an other portion of the insulating layer on the oxygen-supplying layer; and

the top electrode contacts the oxygen-rich film of the switching region.

14. The method as defined in claim 10 wherein:
forming the oxygen-supplying layer sandwiched between the insulating layer includes:
depositing a portion of the insulating layer on the contact surface of the bottom electrode;
depositing the oxygen-supplying layer on the portion of the insulating layer; and
depositing another portion of the insulating layer on the oxygen-supplying layer;
the method further comprises forming a metal layer on the other portion of the insulating layer; and
the top electrode is formed on the metal layer.

15. The method as defined in claim 14 wherein:
the portion of the insulating layer, the oxygen-supplying layer, the other portion of the insulating layer, the metal layer, and the top electrode form a stack;
the method further comprises patterning the stack to expose a portion of the contact surface, and to expose an edge of each of the portion of the insulating layer, the oxygen-supplying layer, the other portion of the insulating layer, the metal layer, and the top electrode; and
forming the switching region includes selectively depositing a metal oxide on the exposed portion of the contact surface and along the edges of each of the portion of the insulating layer, the oxygen-supplying layer, the other portion of the insulating layer, the metal layer, and the top electrode.

Assignees

• Hewlett Packard Entpr Dev Lp

Inventors

• Cho Hans S

Classifications

• H01L45/146

  Electricity · mapped topic

• H01L45/1683 Primary

  Electricity · mapped topic

• H01L45/1266

  Electricity · mapped topic

• H01L45/1675

  Electricity · mapped topic

• H01L45/1633

  Electricity · mapped topic