PZT precursor solution, method for producing PZT precursor solution, method for producing PZT film, method for producing electromechanical transducer element, and method for producing liquid discharge head

US9834853B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9834853-B2
Application numberUS-201615382952-A
CountryUS
Kind codeB2
Filing dateDec 19, 2016
Priority dateJan 22, 2016
Publication dateDec 5, 2017
Grant dateDec 5, 2017

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Abstract

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A PZT precursor solution is used for forming a PZT film by a sol-gel method. The PZT precursor solution includes a solvent; a component that forms a crystal of PZT by crystallization, the component being dissolved in the solvent; and an element that inhibits crystal growth of PZT, the element being dissolved in the solvent.

First claim

Opening claim text (preview).

What is claimed is: 1. A lead zirconate titanate (PZT) precursor solution to be used for forming a PZT film by a sol-gel method, the PZT precursor solution comprising: a solvent; a component that forms PZT by crystallization, the component being dissolved in the solvent; and an element that inhibits crystal growth of PZT, the element being dissolved in the solvent. 2. The PZT precursor solution according to claim 1 , wherein the element contains at least one of chlorine, sulfur, and hafnium. 3. A method for producing a lead zirconate titanate (PZT) film, the method comprising: forming a coating film by applying a PZT precursor solution including a solvent, a component that forms PZT by crystallization, the component being dissolved in the solvent, and an element that inhibits crystal growth of PZT, the element being dissolved in the solvent; forming an amorphous film by heating the coating film at a predetermined temperature; and forming the PZT film by heating a multilayer amorphous film obtained by repeating the forming of the coating film and the forming of the amorphous film a first predetermined number of times at a temperature higher than the predetermined temperature to crystalize the multilayer amorphous film. 4. The method for producing the PZT film according to claim 3 , further comprising: thickening the crystalized PZT film by repeating the forming of the crystalized PZT film a second predetermined number of times. 5. A method for producing an electromechanical transducer element, the method comprising: forming a lower electrode; forming a lead zirconate titanate (PZT) film as an electromechanical transducer film on the lower electrode by the method for producing the PZT film according to claim 3 ; and forming an upper electrode on the PZT film. 6. A method for producing a liquid discharge head, the method comprising: forming an oscillation plate on a substrate; forming an electromechanical transducer element on the oscillation plate by the method for producing the electromechanical transducer element according to claim 5 ; forming a pressure chamber in the substrate; and bonding the substrate to a nozzle plate. 7. A method for producing a lead zirconate titanate (PZT) precursor solution to be used for forming a PZT film by a sol-gel method, the method comprising: dissolving a component that forms PZT by crystallization in a solvent; and adding an element that inhibits crystal growth of PZT to the solvent. 8. The method according to claim 7 , wherein the element is added to the solvent while a concentration of the element is controlled to be within a predetermined concentration range. 9. The method according to claim 7 , wherein the element is at least one of chlorine, sulfur, and hafnium. 10. The method according to claim 7 , wherein the component that forms PCT by crystallization includes lead carboxylate, a zirconium alkoxide compound, and a titanium alkoxide compound, and wherein the element is introduced through the zirconium alkoxide compound.

Assignees

Inventors

Classifications

  • Sol or sol-gel processing · CPC title

  • Metal oxides (C23C18/1212 takes precedence) · CPC title

  • thin film formation by spincoating · CPC title

  • thin film formation by sputtering · CPC title

  • Vacuum evaporation · CPC title

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What does patent US9834853B2 cover?
A PZT precursor solution is used for forming a PZT film by a sol-gel method. The PZT precursor solution includes a solvent; a component that forms a crystal of PZT by crystallization, the component being dissolved in the solvent; and an element that inhibits crystal growth of PZT, the element being dissolved in the solvent.
Who is the assignee on this patent?
Akiyama Yoshikazu, Shimofuku Akira, Ueda Keiji, and 1 more
What technology area does this patent fall under?
Primary CPC classification C30B1/023. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Dec 05 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).