Cleaning fluid for semiconductor, and cleaning method using the same

Patent metadata

Field	Value
Publication number	US-9834745-B2
Application number	US-201314415844-A
Country	US
Kind code	B2
Filing date	Jul 8, 2013
Priority date	Jul 19, 2012
Publication date	Dec 5, 2017
Grant date	Dec 5, 2017

Abstract

There is provided a cleaning fluid that effectively removes metal impurities and the like existing on a portion through which a chemical solution for lithography passes, before causing the chemical solution to pass through a semiconductor manufacturing equipment in a lithography process, in order to prevent defects caused by the metal impurities and the like found on a semiconductor substrate after forming a resist pattern or after processing a semiconductor substrate in a process for manufacturing semiconductor device. A cleaning fluid to clean a portion through which a chemical solution for lithography passes in a semiconductor manufacturing equipment used in a lithography process for manufacturing semiconductors, including: an inorganic acid; water; and a hydrophilic organic solvent. In the cleaning fluid, the concentration of the inorganic acid is preferably 0.0001% by mass to 60% by mass based on a total mass of the cleaning fluid.

First claim

The invention claimed is:

1. A cleaning fluid for cleaning a portion through which a chemical solution for lithography passes in a semiconductor manufacturing equipment used in a lithography process for manufacturing semiconductors, the cleaning fluid comprising:
0.0001% by mass to 60% by mass of an inorganic acid;
0.0006% by mass to 60% by mass of water; and
20% by mass to 99.999% by mass of a hydrophilic organic solvent,
based on a total mass of the cleaning fluid, wherein the inorganic acid is sulfuric acid or hydrochloric acid, and the portion through which the chemical solution for lithography passes is a pipe or a filter for filtration in the semiconductor manufacturing equipment.

2. The cleaning fluid according to claim 1 , wherein
the hydrophilic organic solvent is a glycol solvent or a lactone solvent.

3. The cleaning fluid according to claim 1 , wherein
the hydrophilic organic solvent is 1-methoxy-2-propanol or 1-ethoxy-2-propanol.

4. The cleaning fluid according to claim 1 , further comprising:
a surfactant.

5. The cleaning fluid according to claim 1 , further comprising:
a metal scavenger (a chelate compound).

6. A cleaning method comprising:
causing the cleaning fluid as claimed in claim 1 to pass through the portion through which the chemical solution for lithography passes in the semiconductor manufacturing equipment used in the lithography process.

7. A semiconductor device formed by a semiconductor manufacturing equipment used in a lithography process, wherein the device is cleaned with the cleaning fluid as claimed in claim 1 .

8. A method for manufacturing a semiconductor device, the method comprising:
processing a semiconductor substrate by using a resist pattern that is used for manufacturing the semiconductor device and is formed by a semiconductor manufacturing equipment used in a lithography process, wherein the device is cleaned with the cleaning fluid as claimed in claim 1 .

9. The cleaning fluid according to claim 1 , wherein
the cleaning fluid comprises 90% by mass to 99.999% by mass of the hydrophilic organic solvent,
based on the total mass of the cleaning fluid.

10. A cleaning fluid for cleaning a portion through which a chemical solution for lithography passes in a semiconductor manufacturing equipment used in a lithography process for manufacturing semiconductors, the cleaning fluid comprising:
0.001% by mass to 1% by mass of an inorganic acid;
0.0006% by mass to 10% by mass of water; and
90% by mass to 99.999% by mass of a hydrophilic organic solvent,
based on a total mass of the cleaning fluid.

11. A cleaning fluid for cleaning a portion through which a chemical solution for lithography passes in a semiconductor manufacturing equipment used in a lithography process for manufacturing semiconductors, the cleaning fluid comprising:
0.001% by mass to 1% by mass of an inorganic acid;
0.0006% by mass to 60% by mass of water; and
20% by mass to 99.999% by mass of a hydrophilic organic solvent,
based on the total mass of the cleaning fluid.

12. The cleaning fluid according to claim 11 , wherein the inorganic acid is sulfuric acid, hydrochloric acid, or nitric acid.

13. The cleaning fluid according to claim 11 , wherein the hydrophilic organic solvent is a glycol solvent or a lactone solvent.

14. The cleaning fluid according to claim 11 , wherein
the hydrophilic organic solvent is 1-methoxy-2-propanol or 1-ethoxy-2-propanol.

15. The cleaning fluid according to claim 11 , further comprising:
a surfactant.

16. The cleaning fluid according to claim 11 , further comprising:
a metal scavenger (a chelate compound).

17. A cleaning method comprising:
causing the cleaning fluid as claimed in claim 11 to pass through the portion through which the chemical solution for lithography passes in the semiconductor manufacturing equipment used in the lithography process.

18. A semiconductor device formed by a semiconductor manufacturing equipment used in a lithography process, wherein the device is cleaned with the cleaning fluid as claimed in claim 11 .

19. A method for manufacturing a semiconductor device, the method comprising:
processing a semiconductor substrate by using a resist pattern that is used for manufacturing the semiconductor device and is formed by a semiconductor manufacturing equipment used in a lithography process, wherein the device is cleaned with the cleaning fluid as claimed in claim 11 .

Assignees

• Nissan Chemical Ind Ltd

Inventors

• Sassa Suguru
• Shigaki Shuhei

Classifications

• H10P72/0411 Primary

  for wet cleaning or washing · CPC title

• H10P70/23

  during, before or after processing of insulating materials · CPC title

• H10P14/60

  of insulating materials · CPC title

• C11D7/5004

  Organic solvents · CPC title

• C11D3/2096

  Heterocyclic compounds · CPC title