Symmetric VHF source for a plasma reactor

US9824862B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9824862-B2
Application numberUS-201414548692-A
CountryUS
Kind codeB2
Filing dateNov 20, 2014
Priority dateAug 20, 2010
Publication dateNov 21, 2017
Grant dateNov 21, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.

First claim

Opening claim text (preview).

What is claimed is: 1. A plasma reactor comprising: a vacuum chamber enclosure comprising a ceiling and a cylindrical side wall, said ceiling comprising a center electrode and a dielectric support ring around said center electrode; a workpiece support having a support surface facing said ceiling; a coaxial resonator comprising: (a) a hollow outer conductive cylinder coaxial with said cylindrical side wall and having a bottom edge on said dielectric support ring; (b) a hollow center conductive cylinder coaxial with said outer conductive cylinder and having a bottom edge contacting said center electrode; (c) an annular conductor contacting a top edge of said hollow outer conductive cylinder and contacting a top edge of said hollow center conductive cylinder; a VHF power generator; a power coupler comprising: an axial center conductor connected at a first end to said VHF generator and extending through an interior of said hollow center conductive cylinder to a second end thereof at a selected axial location; and plural respective spoke conductors extending radially from said second end of said axial center conductor and terminating at and contacting said center conductive cylinder in a circular plane at said selected axial location, said plural respective spoke conductors being symmetrically distributed. 2. The reactor of claim 1 wherein said selected axial location corresponds to an impedance presented to said power coupler matching an output impedance of said VHF generator. 3. The reactor of claim 1 wherein said power coupler further comprises: an axial grounded outer conductor coaxial with and surrounding said axial center conductor of said power coupler; and plural respective grounded spoke outer conductors coaxial with and around respective ones of said plural spoke conductors, said axial grounded outer conductor and said plural grounded spoke outer conductors being joined together near said second end of said axial center conductor. 4. The reactor of claim 1 wherein said power coupler further comprises: an axial grounded outer conductor coaxial with and surrounding said axial conductor of said power coupler; and a grounded conductive plane extending parallel to and facing said plural spoke conductors. 5. A plasma reactor comprising: a vacuum chamber enclosure and a center electrode; a coaxial resonator comprising: (a) a hollow inner conductive cylinder coaxial with said center electrode and having a bottom edge contacting said center electrode; (b) a hollow outer conductive cylinder coaxial with and surrounding said inner conductive cylinder and having a bottom edge insulated from said center electrode, said inner and outer conductive cylinders having respective circular top edges; (c) an annular conductor extending between and electrically contacting said respective circular top edges of said inner and outer conductive cylinders; (d) a hollow center conductive cylinder coaxial with said inner and outer conductive cylinders and located between said inner and outer conductive cylinders, and having a bottom edge contacting said center electrode, said center conductive cylinder having a top edge facing and spaced from said annular conductor by an axial gap length; a VHF power generator coupled to said center conductive cylinder; wherein said VHF generator is coupled to said center conductive cylinder by a power coupler extending from said VHF power generator to said center conductive cylinder, wherein said power coupler comprises: an axial center conductor connected at a first end to said VHF generator and extending through an interior of said hollow inner conductive cylinder to a second end thereof at a selected axial location; plural respective openings through said inner conductive cylinder and coinciding with a circular plane at said selected axial location; and plural respective spoke conductors extending radially from said second end of said axial center conductor through said plural respective openings and terminating at and contacting said center conductive cylinder, said plural respective spoke conductors being symmetrically distributed; an axial grounded outer conductor coaxial with and surrounding said axial conductor of said power coupler; and plural respective grounded spoke outer conductors coaxial with and around respective ones of said plural spoke conductors, and terminating at said inner conductive cylinder, said axial grounded outer conductor and said plural grounded spoke outer conductors being joined together near said second end of said axial center conductor. 6. A plasma reactor comprising: a vacuum chamber enclosure and a center electrode; a coaxial resonator comprising: (a) a hollow inner conductive cylinder coaxial with said center electrode and having a bottom edge contacting said center electrode; (b) a hollow outer conductive cylinder coaxial with and surrounding said inner conductive cylinder and having a bottom edge insulated from said center electrode, said inner and outer conductive cylinders having respective circular top edges; (c) an annular conductor extending between and electrically contacting said respective circular top edges of said inner and outer conductive cylinders; (d) a hollow center conductive cylinder coaxial with said inner and outer conductive cylinders and located between said inner and outer conductive cylinders, and having a bottom edge contacting said center electrode, said center conductive cylinder having a top edge facing and spaced from said annular conductor by an axial gap length; a VHF power generator coupled to said center conductive cylinder; wherein said VHF generator is coupled to said center conductive cylinder by a power coupler extending from said VHF power generator to said center conductive cylinder, wherein said power coupler comprises: an axial center conductor connected at a first end to said VHF generator and extending through an interior of said hollow inner conductive cylinder to a second end thereof at a selected axial location; plural respective openings through said inner conductive cylinder and coinciding with a circular plane at said selected axial location; and plural respective spoke conductors extending radially from said second end of said axial center conductor through said plural respective openings and terminating at and contacting said center conductive cylinder, said plural respective spoke conductors being symmetrically distributed; an axial grounded outer conductor coaxial with and surrounding said axial conductor of said power coupler; and a grounded conductive plane extending parallel to and facing said plural spoke conductors.

Assignees

Inventors

Classifications

  • Electrical connecting means · CPC title

  • Hollow cathodes · CPC title

  • the radio frequency energy being capacitively coupled to the plasma · CPC title

  • Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence) · CPC title

  • Shape · CPC title

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Frequently asked questions

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What does patent US9824862B2 cover?
The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H01J37/32091. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Nov 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).