Substrate processing apparatus

Patent metadata

Field	Value
Publication number	US-9816183-B2
Application number	US-201615259944-A
Country	US
Kind code	B2
Filing date	Sep 8, 2016
Priority date	Sep 8, 2015
Publication date	Nov 14, 2017
Grant date	Nov 14, 2017

Abstract

A substrate processing apparatus includes: a process container where a substrate is processed; a process gas supply unit configured to supply a process gas into the process container; a substrate placing table installed in the process container; a shaft penetrating a hole at a bottom portion of the process container and coupled to the substrate placing table; a bellows surrounding the shaft and disposed outside of the process container wherein an inner space thereof is in communication with a space of the process container; an inert gas supply system configured to supply an inert gas into the inner space of the bellows disposed outside of the process container; and a component falling prevention unit including at least a first structure disposed along a first portion of the hole at the bottom of the process container and a second structure disposed along a second portion of the hole adjacent to the first structure.

First claim

What is claimed is:

1. A substrate processing apparatus comprising:
a process container where a substrate is processed;
a process gas supply unit configured to supply a process gas into the process container;
a shaft penetrating a hole at a bottom portion of the process container;
a substrate support installed in the process container and coupled to an upper end of the shaft;
a bellows surrounding the shaft and disposed outside of the process container wherein an inner space thereof is in communication with a space of the process container;
an inert gas supply system configured to supply an inert gas into the inner space of the bellows disposed outside of the process container; and
a component falling prevention unit comprising a first structure disposed along a first portion of the hole at the bottom of the process container and a second structure disposed along a second portion of the hole adjacent to the first structure, wherein each of the first structure and the second structure comprises: a lower member supported by the bottom portion; a cover covering the lower member to define an inert gas channel between the a lower member and the cover; and an exhaust hole disposed at an end of the inert gas channel along an entire outer circumference of each of the first structure and the second structure to exhaust the inert gas supplied into the inner space in a radial direction.

2. The substrate processing apparatus of claim 1 , wherein each of the first structure and the second structure is L-shaped to define the inert gas channel having a L-shape, and a vertical portion of each of the first structure and the second structure extends downward into the hole along a circumference of the hole.

3. The substrate processing apparatus of claim 2 , wherein the first structure is adjacent to the shaft with a gap there between.

4. The substrate processing apparatus of claim 2 , wherein an inner circumference of the first structure runs along a circumference of the shaft.

5. The substrate processing apparatus of claim 2 , wherein the inert gas supply unit is further configured to supply the inert gas into the inner space of the bellows while the process gas supply unit supplies the process gas.

6. The substrate processing apparatus of claim 2 , wherein a height of the component falling prevention unit increases toward the shaft.

7. The substrate processing apparatus of claim 2 , further comprising a shower head disposed over the substrate placing table, wherein the shower head comprises a detachable dispersion plate.

8. The substrate processing apparatus of claim 2 , further comprising a detachable floating pin disposed at the substrate placing table.

9. The substrate processing apparatus of claim 1 , wherein the first structure is adjacent to the shaft with a gap therebetween.

10. The substrate processing apparatus of claim 9 , wherein an inner circumference of the first structure runs along a circumference of the shaft.

11. The substrate processing apparatus of claim 9 , wherein the inert gas supply unit is further configured to supply the inert gas into the inner space of the bellows while the process gas supply unit supplies the process gas.

12. The substrate processing apparatus of claim 9 , wherein a height of the component falling prevention unit increases toward the shaft.

13. The substrate processing apparatus of claim 9 , further comprising a shower head disposed over the substrate placing table, wherein the shower head comprises a detachable dispersion plate.

14. The substrate processing apparatus of claim 9 , further comprising a detachable floating pin disposed at the substrate placing table.

15. The substrate processing apparatus of claim 1 , wherein the inert gas supply unit is further configured to supply the inert gas into the inner space of the bellows while the process gas supply unit supplies the process gas.

16. The substrate processing apparatus of claim 15 , wherein a height of the component falling prevention unit increases toward the shaft.

17. The substrate processing apparatus of claim 15 , further comprising a shower head disposed over the substrate placing table, wherein the shower head comprises a detachable dispersion plate.

18. The substrate processing apparatus of claim 15 , further comprising a detachable floating pin disposed at the substrate placing table.

Assignees

• Hitachi Int Electric Inc

Inventors

• Ashihara Hiroshi
• Sawada Motoshi

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• C23C16/4583

  the substrate being supported substantially horizontally · CPC title

• C23C16/4408

  by purging residual gases from the reaction chamber or gas lines · CPC title

• H01J37/32871

  Means for trapping or directing unwanted particles · CPC title