Method for processing a part with an energy beam

US9815139B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9815139-B2
Application numberUS-201414161096-A
CountryUS
Kind codeB2
Filing dateJan 22, 2014
Priority dateJan 22, 2014
Publication dateNov 14, 2017
Grant dateNov 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for processing a part ( 10 ) with an energy beam A mask ( 70, 80 ) is arranged between a source of the energy beam and the part. The mask is configured with a beam-transmissive portion ( 71 ) in correspondence with mutually opposed portions ( 12, 14 ) of the part. Simultaneously heating the mutually opposed portions of the part is performed with energy beamlets passing through the beam-transmissive portions of the mask This simultaneous heating is configured to keep a thermally-induced distortion of the part within a predefined tolerance. Scanning of the mask with the energy beam may be performed without precisely tracking the mutually opposed portions of the part, thereby avoiding a need for complicated numerical programming for tracking a relatively complex geometry defined by the mutually opposed portions of the part.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for processing a part with an energy beam, the method comprising: arranging a mask between a source of the energy beam and the part; configuring the mask with a beam-transmissive portion in correspondence with mutually opposed portions of the part; simultaneously heating the mutually opposed portions of the part with energy beamlets passing through the beam-transmissive portion of the mask, wherein the simultaneous heating is configured to keep a thermally-induced distortion of the part within a predefined tolerance; and forming the energy beamlets passing through the beam-transmissive portion of the mask from at least one point energy beam rastered along a width dimension of the mask, and having a predefined variable width. 2. The method of claim 1 , wherein the predefined variable width of the rastered energy beam is chosen to overshoot by a predefined margin a varying width of a profile defined by the beam-transmissive portion in correspondence with the mutually opposed portions of the part. 3. The method of claim 1 , wherein the mask comprises a plurality of masking elements arranged side-by-side on at least one common plane, wherein the configuring of the mask comprises adjusting respective positions of at least some of the plurality of masking elements to define the beam-transmissive portion to be in correspondence with the mutually opposed portions of the part. 4. A method for processing a part with an energy beam, the method comprising: arranging a mask between a source of the energy beam and the part; configuring the mask with a beam-transmissive portion in correspondence with mutually opposed portions of the part; and scanning the mask with the energy beam so that energy beamlets pass through the beam-transmissive portion of the mask for simultaneously heating the mutually opposed portions of the part, wherein the simultaneous heating is configured to keep a thermally-induced distortion of the part within a predefined tolerance, wherein the scanning is performed without precisely tracking the mutually opposed portions of the part. 5. The method of claim 4 , wherein the scanning is arranged to scan the mask with an area energy beam having a fixed width to form the energy beamlets that pass through the beam-transmissive portion of the mask. 6. The method of claim 5 , wherein the fixed width of the area beam is chosen to encompass at least a maximum width of a profile defined by the beam-transmissive portion in correspondence with the mutually opposed portions of the part. 7. The method of claim 4 , wherein the scanning is configured to scan the mask with at least one point energy beam rastered along a width dimension of the mask, the rastered energy beam having a predefined variable width to form the energy beamlets that pass through the beam-transmissive portions of the mask. 8. The method of claim 4 , wherein the predefined variable width of the beam is chosen to overshoot by a predefined margin a varying width of a profile defined by the beam-transmissive portion in correspondence with the mutually opposed portions of the part. 9. The method of claim 4 , wherein the mask comprises a plurality of masking elements arranged side-by-side on at least one common plane, wherein the configuring of the mask comprises adjusting respective positions of at least some of the plurality of masking elements to define the beam-transmissive portion to be in correspondence with the mutually opposed portions of the part.

Assignees

Inventors

Classifications

  • F01D15/10Primary

    Adaptations for driving, or combinations with, electric generators · CPC title

  • disposed on the workpiece · CPC title

  • Scanning parameters, e.g. hatch distance or scanning strategy · CPC title

  • Direct deposition of metal particles, e.g. direct metal deposition [DMD] or laser engineered net shaping [LENS] · CPC title

  • Powder bed fusion, e.g. selective laser melting [SLM] or electron beam melting [EBM] · CPC title

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What does patent US9815139B2 cover?
A method for processing a part ( 10 ) with an energy beam A mask ( 70, 80 ) is arranged between a source of the energy beam and the part. The mask is configured with a beam-transmissive portion ( 71 ) in correspondence with mutually opposed portions ( 12, 14 ) of the part. Simultaneously heating the mutually opposed portions of the part is performed with energy beamlets passing through the beam…
Who is the assignee on this patent?
Siemens Energy Inc
What technology area does this patent fall under?
Primary CPC classification F01D15/10. Mapped technology areas include Mechanical Engineering.
When was this patent published?
Publication date Tue Nov 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).