Configurable variable position closed track magnetron

Patent metadata

Field	Value
Publication number	US-9812303-B2
Application number	US-201414182740-A
Country	US
Kind code	B2
Filing date	Feb 18, 2014
Priority date	Mar 1, 2013
Publication date	Nov 7, 2017
Grant date	Nov 7, 2017

Abstract

Methods and apparatus for a magnetron assembly are provided herein. In some embodiments, a magnetron assembly includes a first base plate; a second base plate movable with respect to the first base plate between a first position and a second position; an outer magnetic pole in the shape of a loop and comprising an outer magnetic pole section coupled to the first base plate and an outer magnetic pole section coupled to the second base plate; and an inner magnetic pole disposed within the outer magnetic pole, wherein the outer and inner magnetic poles define a closed loop magnetic field, and wherein the closed loop magnetic field is maintained when the second base plate is disposed in both the first position and a second position.

First claim

The invention claimed is:

1. A magnetron assembly, comprising:
a first base plate;
a second base plate having a limited range of motion with respect to the first base plate between a first position and a second position;
an outer magnetic pole in the shape of a loop and comprising an outer magnetic pole section coupled to the first base plate and an outer magnetic pole section coupled to the second base plate; and
an inner magnetic pole disposed within the outer magnetic pole, wherein the outer and inner magnetic poles define a closed loop magnetic field, and wherein the closed loop magnetic field is maintained when the second base plate is disposed in both the first position and the second position.

2. The magnetron assembly of claim 1 , wherein the closed loop magnetic field has a first geometric configuration when the second base plate is disposed in the first position and a second geometric configuration, different than the first geometric configuration, when the second base plate is disposed in the second position.

3. The magnetron assembly of claim 1 , further comprising:
a support member coupled to the first base plate and the second base plate, the support member having a central axis about which the magnetron assembly rotates.

4. The magnetron assembly of claim 3 , wherein the first base plate is fixedly coupled to the support member and the second base plate is movably coupled to the support member.

5. The magnetron assembly of claim 1 , wherein the inner magnetic pole comprises:
an inner magnetic pole section coupled to the first base plate and an inner magnetic pole section coupled to the second base plate.

6. The magnetron assembly of claim 1 , wherein each of the inner and outer magnetic poles are formed by a plurality of magnets.

7. The magnetron assembly of claim 6 , further comprising:
a plurality of pole plates, one each coupled to tops of the pluralities of magnets of each of the magnetic poles or magnetic pole sections to provide a more uniform magnetic field.

8. The magnetron assembly of claim 6 , wherein each of the magnets in a respective inner or outer magnetic pole has the same polarity, and wherein a polarity of the outer magnetic pole is opposite the polarity of the inner magnetic pole.

9. The magnetron assembly of claim 6 , wherein less than half of any plurality of magnets that form a given magnetic pole have a polarity opposite the polarity of remaining magnets of the plurality of magnets that form the given magnetic pole.

10. A magnetron assembly, comprising:
a first base plate;
a second base plate movable with respect to the first base plate between a first position and a second position;
an outer magnetic pole in the shape of a loop and comprising an outer magnetic pole section coupled to the first base plate and an outer magnetic pole section coupled to the second base plate; and
an inner magnetic pole disposed within the outer magnetic pole, wherein the outer and inner magnetic poles define a closed loop magnetic field, and wherein the closed loop magnetic field is maintained when the second base plate is disposed in both the first position and a second position, wherein each of the inner and outer magnetic poles are formed by a plurality of magnets, and wherein about 15% to about 25% of individual magnets of any plurality of magnets that form a given magnetic pole have a polarity opposite the polarity of remaining magnets of the plurality of magnets that form the given magnetic pole.

11. The magnetron assembly of claim 1 , wherein each of the outer magnetic pole sections have a first polarity, and wherein the inner magnetic pole has a second polarity opposite of the first polarity.

12. The magnetron assembly of claim 1 , further comprising:
a supplemental magnetic pole disposed adjacent to the outer magnetic pole on a side opposite the inner magnetic pole.

13. The magnetron assembly of claim 12 , wherein the supplemental magnetic pole and the outer magnetic pole section together provide an open loop magnetic field.

14. The magnetron assembly of claim 1 , further comprising:
a position sensor to monitor the position of the second base plate with respect to the first base plate.

15. A magnetron assembly, comprising:
a support member having a central axis about which the magnetron assembly rotates;
a first base plate fixedly coupled to the support member;
a second base plate movably coupled to the support member with a limited range of motion between a first position and a second position;
an outer magnetic pole in the shape of a loop and comprising an outer magnetic pole section coupled to the first base plate and an outer magnetic pole section coupled to the second base plate; and
an inner magnetic pole disposed within the outer magnetic pole, wherein the outer and inner magnetic poles define a closed loop magnetic field, and wherein the closed loop magnetic field is maintained when the second base plate is disposed in both the first position and a second position, wherein the closed loop magnetic field has a first geometric configuration when the second base plate is disposed in the first position and a second geometric configuration, different than the first geometric configuration, when the second base plate is disposed in the second position.

16. The magnetron assembly of claim 15 , further comprising:
a bracket rotatably coupling the second base plate to the support member between the first position and the second position.

17. A substrate processing system, comprising:
a chamber;
a lid removably disposed atop the chamber;
a target assembly coupled to the lid, the target assembly including a target material to be sputtered from the target assembly and deposited on a substrate;
a substrate support disposed within the chamber for supporting a substrate during processing; and
the magnetron assembly of claim 1 disposed proximate the target assembly.

18. The substrate processing system of claim 17 , further comprising:
a DC power source coupled to the target assembly; and
an RF power source coupled to the target assembly.

19. The substrate processing system of claim 17 , further comprising:
an RF bias power source coupled to the substrate support.

20. The substrate processing system of claim 17 , wherein the target material comprises titanium.

Assignees

• Applied Materials Inc

Inventors

• Ritchie Alan
• Hanson Ryan
• Zhao Xianwei

Classifications

• H01J37/3452

  Magnet distribution · CPC title

• H01J37/3461

  Means for shaping the magnetic field, e.g. magnetic shunts · CPC title

• H01J37/3455 Primary

  Movable magnets · CPC title

• H01J37/3405

  Magnetron sputtering · CPC title