Method for producing oxynitride film by atomic layer deposition process

Patent metadata

Field	Value
Publication number	US-9809490-B2
Application number	US-201615188060-A
Country	US
Kind code	B2
Filing date	Jun 21, 2016
Priority date	Jul 2, 2015
Publication date	Nov 7, 2017
Grant date	Nov 7, 2017

Abstract

A method for producing an oxynitride film includes: (A) supplying a first precursor containing a network former into a reactor in which a substrate is placed; (B) supplying at least one of an oxygen gas and an ozone gas into the reactor; (C) supplying a second precursor containing at least one of an alkali metal element and an alkaline-earth metal element into the reactor; (D) supplying at least one of a nitrogen gas and an ammonia gas into the reactor; and (E) supplying a purge gas into the reactor.

First claim

What is claimed is:

1. A method for producing an oxynitride film, comprising:
(A) supplying a first precursor containing a network former into a reactor in which a substrate is placed;
(B) supplying at least one selected from the group consisting of an oxygen gas and an ozone gas into the reactor;
(C) supplying a second precursor containing at least one selected from the group consisting of an alkali metal element and an alkaline-earth metal element into the reactor;
(D) supplying an ammonia gas into the reactor; and
(E) supplying a purge gas into the reactor,
wherein a process cycle including (A), (B), (C), and (E) is repeated a plurality of times while (D) is continuously performed.

2. The method according to claim 1 , wherein, in one process cycle, (E) is performed each time after (A), (B), or (C) is performed once.

3. The method according to claim 1 , wherein, in one process cycle, (A) is performed before (B).

4. The method according to claim 1 , wherein, in one process cycle, (A) and (C) are performed in different periods.

5. The method according to claim 1 , wherein the second precursor contains at least one selected from the group consisting of Li, Na, Mg, and Ca.

6. The method according to claim 1 , wherein the network former contains at least one selected from the group consisting of P, B, Si, and V.

7. The method according to claim 1 , wherein the oxynitride film contains the network former and at least one selected from the group consisting of the alkali metal element and the alkaline-earth metal element.

8. The method according to claim 1 , wherein
the second precursor contains Li, the network former contains P, and
the oxynitride film contains Li, P, O, and N.

9. The method according to claim 1 , wherein the oxynitride film has a thickness of 200 nm or less.

10. The method according to claim 1 , wherein, in one process cycle, (A), (B), and (C) are separately performed.

11. The method according to claim 1 , wherein (E) is continuously performed over the process cycle.

Assignees

• Panasonic Ip Man Co Ltd

Inventors

• Nakai Miyuki
• Shibata Satoshi

Classifications

• H01M10/0562

  Solid materials · CPC title

• C03C2217/28

  Other inorganic materials · CPC title

• C03C2218/152

  by cvd · CPC title

• H01M10/0525

  Rocking-chair batteries, i.e. batteries with lithium insertion or intercalation in both electrodes; Lithium-ion batteries · CPC title

• C23C16/45527

  characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations · CPC title