Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion

Patent metadata

Field	Value
Publication number	US-9797064-B2
Application number	US-201314058167-A
Country	US
Kind code	B2
Filing date	Oct 18, 2013
Priority date	Feb 5, 2013
Publication date	Oct 24, 2017
Grant date	Oct 24, 2017

Abstract

A method of forming an SiC crystal including placing in an insulated graphite container a seed crystal of SiC, and supporting the seed crystal on a shelf, wherein cushion rings contact the seed crystal on a periphery of top and bottom surfaces of the seed crystal, and where the graphite container does not contact a side surface of the seed crystal; placing a source of Si and C atoms in the insulated graphite container, where the source of Si and C atoms is for transport to the seed crystal to grow the SiC crystal; placing the graphite container in a furnace; heating the furnace; evacuating the furnace; filling the furnace with an inert gas; and maintaining the furnace to support crystal growth to thereby form the SiC crystal.

First claim

The invention claimed is:

1. A method of forming an SiC crystal by vapor transport onto a seed crystal, the method comprising:
a. providing a graphite container having a cylindrical shelf formed on an upper part of an interior sidewall of the graphite container and having an interior diameter smaller than the diameter of the seed crystal, the cylindrical shelf being formed at a defined distance below an open top of the graphite container, and placing a source of silicon and carbon atoms in the graphite container, wherein the source of silicon and carbon atoms is for transport to the seed crystal to grow the SiC crystal;
b. placing the seed crystal in the graphite container, and supporting the seed crystal on the cylindrical shelf within the graphite container without physically attaching the seed crystal to any part, wherein no clamping, bonding or mechanical attachments are used to retain the seed, and wherein the seed is contacted only at its periphery;
c. placing a lid over the container such that the lid does not contact the seed crystal, and without physically attaching the seed to the lid, so as to allow free movement of the seed in the horizontal direction such that the seed is free to expand and contract upon heating and cooling, and placing the graphite container in a vacuum furnace;
d. evacuating the furnace and establishing a flow of inert gas, and controlling the pressure at a value>600 torr
e. heating the furnace to a temperature from 2,000° C. to about 2,500° C.;
f. evacuating the furnace to a pressure from 10 Torr to about 100 Torr;
g. controlling the pressure from 0.1 and 100 torr
h. maintaining the furnace to support crystal growth to thereby form the SiC crystal, while preventing the seed from contacting the lid throughout the crystal growth process.

2. The method of claim 1 , further comprising flowing nitrogen gas into the furnace.

3. The method of claim 2 , wherein the furnace is maintained to support crystal growth to thereby form the SiC crystal having a thickness of about 0.1 mm to about 50 mm, and wherein nitrogen flow is maintained such that nitrogen concentration of the grown SiC crystal is from 1×10 15 /cm 3 to 1×10 19 /cm 3 .

4. The method of claim 1 , wherein the seed crystal is a 4H-SiC crystal having an offcut of 0 to 4 degrees toward (11-20) crystal orientation and wherein the nitrogen concentration of the seed crystal is from 1×10 16 /cm 3 to 8×10 18 /cm 3 .

5. The method of claim 1 , further comprising placing a cushion ring between the shelf and the seed.

6. The method of claim 1 , further comprising placing a cushion ring between the seed and the lid.

7. The method of claim 1 , wherein preventing the seed from contacting the lid comprises placing a retaining ring between the seed and the lid.

8. The method of claim 1 , further comprising placing a bottom cushion ring between the shelf and the seed, placing an upper cushion ring between the seed and the lid, and placing a retaining ring between the upper cushion ring and the lid.

9. The method of claim 8 , wherein the upper cushion ring is thicker than the bottom cushion ring.

Assignees

• Dow Corning

Inventors

• Loboda Mark
• Drachev Roman
• Hansen Darren
• Sanchez Edward

Classifications

• H10P90/12

  Preparing bulk and homogeneous wafers · CPC title

• C23C14/243

  Crucibles for source material (C23C14/28, C23C14/30 take precedence) · CPC title

• Y10T428/24273

  including aperture · CPC title

• C23C14/542

  Controlling the film thickness or evaporation rate · CPC title

• C30B23/025 Primary

  characterised by the substrate · CPC title