Plated material and manufacturing method therefor
US-11072866-B2 · Jul 27, 2021 · US
US9797057B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9797057-B2 |
| Application number | US-54649909-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 24, 2009 |
| Priority date | Aug 24, 2009 |
| Publication date | Oct 24, 2017 |
| Grant date | Oct 24, 2017 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
The present disclosure generally relates to techniques for magnetic electro-plating or electro-deposition. Example methods may include utilizing a magnet during electro-deposition to modify kinetics of deposition of plating material on a substrate.
Opening claim text (preview).
What is claimed is: 1. A method for electro-depositing a plating material on a surface of a substrate, the method comprising: at least partially submerging the substrate in an electrolyte solution including the plating material, wherein the plating material includes ferrous species, and wherein the substrate includes a first surface on which the plating material is to be deposited; positioning an electrode to face the first surface of the substrate; positioning one or more permanent magnets to face a second surface of the substrate, the second surface being opposite to the first surface; positioning a first electromagnet to face the second surface of the substrate, wherein the first electromagnet, by virtue of its position, enhances kinetics of deposition of the plating material on the first surface of the substrate; positioning a second electromagnet to face the first surface of the substrate, wherein the second electromagnet, by virtue of its position, reduces the kinetics of deposition of the plating material on the first surface of the substrate; applying an electrical signal to the electrode to cause the plating material to deposit on the first surface of the substrate, wherein the electrical signal varies over time in a pre-determined pattern, and wherein the pre-determined pattern over time is controlled by a signal generator; and alternately turning on the first electromagnet and the second electromagnet to speed up and slow down the deposition of the plating material on the first surface of the substrate. 2. The method of claim 1 , wherein alternately turning on the first electromagnet and the second electromagnet comprises turning on the second electromagnet for adhesion of the plating material on the first surface of the substrate, followed by turning off the second electromagnet and turning on the first electromagnet, followed by turning off the first electromagnet and turning on the second electromagnet for surface finishing of the deposited plating material. 3. The method of claim 1 , wherein each magnet of the one or more permanent magnets is 1 mm in diameter. 4. The method of claim 1 , further comprising preparing the substrate before at least partially submerging material the substrate in the electrolyte solution. 5. The method of claim 4 , wherein preparing the substrate includes at least one of cleaning the substrate, coating the substrate with a conductive coating, coating the substrate with a hydrophilic coating, or coating the substrate with an electro-plating seed layer. 6. A method for electro-depositing a plating material on a surface of a substrate, the method comprising: at least partially submerging the substrate in an electrolyte solution including the plating material, wherein the plating material includes ferrous species, and wherein the substrate includes a first surface on which the plating material is to be deposited, and a second surface opposite to the first surface; positioning an electrode to face the first surface of the substrate; positioning one or more permanent magnets underneath the substrate; positioning a first electromagnet to face the second surface of the substrate, wherein the first electromagnet, by virtue of its position, enhances kinetics of deposition of the plating material on the first surface of the substrate; positioning a second electromagnet to face the first surface of the substrate, wherein the second electromagnet, by virtue of its position, reduces the kinetics of deposition of the plating material on the first surface of the substrate; applying an electrical signal to the electrode to cause the plating material to deposit on the surface of the substrate; and alternately turning on the first electromagnet and the second electromagnet to speed up and slow down the deposition of the plating material on the first surface of the substrate. 7. The method of claim 6 , wherein alternately turning on the first electromagnet and the second electromagnet comprises turning on the second electromagnet for adhesion of the plating material on the first surface of the substrate, followed by turning off the second electromagnet and turning on the first electromagnet, followed by turning off the first electromagnet and turning on the second electromagnet for surface finishing of the deposited plating material.
Related publications grouped by family.
Answers are generated from the same data shown on this page.