Metal coating film formation device and method

US9797055B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9797055-B2
Application numberUS-201514976572-A
CountryUS
Kind codeB2
Filing dateDec 21, 2015
Priority dateDec 26, 2014
Publication dateOct 24, 2017
Grant dateOct 24, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided is a metal coating film formation device capable of forming a film using a simple device configuration and in a short time, and capable of performing the formation of a film of metal coating continuously for a long period. A film formation device 1 A is provided with an anode 11 , a solid electrolyte film 13 disposed between the anode 11 and the base material B, and a power supply unit 16 that applies a voltage between the anode 11 and the base material B. The anode 11 is a non-porous anode comprising the same metal as the metal of the metal coating. Between the anode 11 and the solid electrolyte film 13 , a porous material 14 is disposed in contact with the anode 11 and the solid electrolyte film 13 . The porous material 14 includes a plurality of pores providing communication between the anode 11 and the solid electrolyte film 13 and being supplied with a metal solution L.

First claim

Opening claim text (preview).

What is claimed is: 1. A metal coating film formation device comprising at least: an anode; a solid electrolyte film disposed between the anode and a base material providing a cathode; and a power supply unit that applies a voltage between the anode and the base material, the device being configured to form a film of metal coating on a surface of the base material by applying the voltage between the anode and the base material with the solid electrolyte film being pressed onto the base material, and by reducing a metal ion contained in the solid electrolyte film, wherein the anode is a non-porous anode comprising the same metal as the metal of the metal coating, between the anode and the solid electrolyte film, a porous material is disposed in contact with the anode and the solid electrolyte film, and the porous material includes a plurality of pores providing communication between the anode and the solid electrolyte film and configured to be supplied with a solution containing the metal ion. 2. The metal coating film formation device according to claim 1 , wherein the porous material comprises a resin material. 3. The metal coating film formation device according to claim 1 , comprising a bias member disposed on the anode that elastically biases the anode toward the solid electrolyte film via the porous material. 4. The metal coating film formation device according to claim 1 , wherein the film formation device is configured to allow the solution to flow in the porous material, the film formation device comprising a circulation mechanism that circulates the solution that flows in the porous material. 5. A metal coating film formation method comprising disposing a solid electrolyte film between an anode and a base material providing a cathode, pressing the solid electrolyte film onto the base material, applying a voltage between the anode and the base material, and form a film of metal coating on a surface of the base material by reducing a metal ion contained in the solid electrolyte film, the method further comprising: using, for the anode, a non-porous anode comprising the same metal as the metal of the metal coating; disposing a porous material between the anode and the solid electrolyte film in contact with the anode and the solid electrolyte film; using, for the porous material, a porous material having a plurality of pores providing communication between the anode and the solid electrolyte film; and forming the film of metal coating by applying the voltage between the anode and the base material, with the plurality of pores being supplied with a solution containing the metal ion. 6. The metal coating film formation method according to claim 5 , wherein the porous material comprises a resin material. 7. The metal coating film formation method according to claim 5 , comprising performing the forming of the film of metal coating while the anode is elastically biased toward the solid electrolyte film via the porous material. 8. The metal coating film formation method according to claim 5 , comprising causing the solution to flow in the porous material, and performing the forming of the metal coating film while the solution flowing in the porous material is circulated.

Assignees

Inventors

Classifications

  • of nickel or cobalt · CPC title

  • C25D3/02Primary

    from solutions (C25D5/34 - C25D5/46 take precedence) · CPC title

  • Shape or form (C25D17/14 takes precedence) · CPC title

  • for pad-plating · CPC title

  • Electroplating: Baths therefor · CPC title

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What does patent US9797055B2 cover?
Provided is a metal coating film formation device capable of forming a film using a simple device configuration and in a short time, and capable of performing the formation of a film of metal coating continuously for a long period. A film formation device 1 A is provided with an anode 11 , a solid electrolyte film 13 disposed between the anode 11 and the base material B, and a power suppl…
Who is the assignee on this patent?
Toyota Motor Co Ltd
What technology area does this patent fall under?
Primary CPC classification C25D3/02. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 24 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).