Lithography process on high topology features

Patent metadata

Field	Value
Publication number	US-9791775-B2
Application number	US-201615067937-A
Country	US
Kind code	B2
Filing date	Mar 11, 2016
Priority date	Mar 12, 2013
Publication date	Oct 17, 2017
Grant date	Oct 17, 2017

Abstract

A method includes forming a first photo resist layer over a base structure and a target feature over the base structure, performing an un-patterned exposure on the first photo resist layer, and developing the first photo resist layer. After the step of developing, a corner portion of the first photo resist layer remains at a corner between a top surface of the base structure and an edge of the target feature. A second photo resist layer is formed over the target feature, the base structure, and the corner portion of the first photo resist layer. The second photo resist layer is exposed using a patterned lithography mask. The second photo resist layer is patterned to form a patterned photo resist.

First claim

What is claimed is:

1. A method comprising:
forming a target feature over a planar top surface of a base structure, wherein the target feature comprises a first sidewall having a bottom end contacting the planar top surface;
coating a first photo resist layer, wherein the first photo resist layer comprises:
a first portion having a bottom surface contacting the planar top surface;
a second portion having a bottom surface contacting a top surface of the target feature; and
a corner portion having a second sidewall and an additional bottom surface, wherein the second sidewall contacts the first sidewall, and the additional bottom surface contacts the planar top surface;

performing an un-patterned exposure on the first photo resist layer, wherein partial-cross links are generated in the corner portion of the first photo resist layer, and no cross-link is generated in the first portion and the second portion;
developing the first photo resist layer, wherein after the developing, the first portion and the second portion of the first photo resist layer are removed, and the corner portion remains; and
coating a second photo resist layer over the target feature, the base structure, and the corner portion of the first photo resist layer.

2. The method of claim 1 further comprising;
exposing the second photo resist layer using a patterned lithography mask; and
developing the second photo resist layer to form a patterned photo resist.

3. The method of claim 2 further comprising:
etching the target feature using the patterned photo resist and the corner portion as an etching mask; and
removing the patterned photo resist and the corner portion of the first photo resist layer.

4. The method of claim 1 , wherein the first photo resist layer comprises a positive tone photo resist.

5. The method of claim 4 , wherein the un-patterned exposure comprises an over exposure.

6. The method of claim 1 , wherein the first photo resist layer comprises a negative tone photo resist.

7. The method of claim 6 , wherein the un-patterned exposure comprises an under exposure.

8. A method comprising:
forming a target feature protruding above a base structure;
forming a first photo resist layer over both the base structure and the target feature, wherein the first photo resist layer comprises:
a corner portion having a sidewall contacting a sidewall of the target feature, and a bottom surface contacting a top surface of the base structure; and
additional portions over and contacting top surfaces of the target feature and the base structure;

performing a first exposure on the first photo resist layer, wherein during the first exposure, no lithography mask is placed in a light path of a light used for the first exposure, and partial cross-links are generated in the corner portion of the first photo resist layer;
developing the first photo resist layer, wherein the partial-cross linked corner portion of the first photo resist layer remain after the developing the first photo resist layer;
forming a second photo resist layer over the target feature, the base structure, and the remaining corner portion of the first photo resist layer;
performing a second exposure on the second photo resist layer, wherein during the second exposure, a patterned lithography mask is placed in a light path of a light used for the second exposure; and
developing the second photo resist layer to form a patterned photo resist.

9. The method of claim 8 further comprising:
etching the target feature using the patterned photo resist as an etching mask; and
removing the patterned photo resist and the corner portion of the first photo resist layer.

10. The method of claim 8 , wherein the first photo resist layer comprises a positive tone photo resist, and wherein the first exposure comprises an over exposure.

11. The method of claim 8 , wherein the first photo resist layer comprises a negative tone photo resist, and wherein the first exposure comprises an under exposure.

12. The method of claim 8 , wherein the additional portions of the first photo resist layer are removed after the first photo resist layer is developed.

13. The method of claim 8 , wherein the base structure comprises a silicon substrate, and the target feature comprises polysilicon.

14. A method comprising:
forming a first photo resist layer over a base structure and a target feature, with the target feature protruding over the base structure, wherein the first photo resist layer comprises:
a first portion over and contacting the base structure;
a second portion over and contacting the target feature; and
a corner portion at a corner formed between a top surface of the base structure and an edge of the target feature;

performing a first exposure on the first photo resist layer, wherein during the first exposure, an un-patterned lithography mask is placed on a light path of a light used for the first exposure, and partial cross-links are generated in the corner portion of the first photo resist layer;
developing the first photo resist layer, wherein the partial-cross linked corner portion of the first photo resist layer remain after the developing the first photo resist layer;
forming a second photo resist layer over the target feature, the base structure, and the remaining corner portion of the first photo resist layer;
performing a second exposure on the second photo resist layer using a patterned lithography mask;
developing the second photo resist layer to form a patterned photo resist; and
etching the target feature using the patterned photo resist as an etching mask.

15. The method of claim 14 , wherein the base structure comprises a silicon substrate, and the target feature comprises polysilicon.

16. The method of claim 14 , wherein the first photo resist layer is a positive tone photo resist layer, and the first exposure is performed using a first energy, and the second exposure is performed using a second energy, and wherein the first energy is greater than about two times the second energy.

17. The method of claim 16 , wherein the first photo resist layer is a positive tone photo resist layer, and the first exposure is an over exposure, and wherein the first exposure results in partial cross-links to be generated in the corner portion.

18. The method of claim 17 , wherein substantially no cross-link is generated in the first portion and the second portion of the first photo resist layer, and the first portion and the second portion are removed in the developing the first photo resist layer.

19. The method of claim 14 further comprising, after the developing the first photo resist layer and before the forming the second photo resist layer, forming a Bottom Anti-Reflective Coating (BARC) over the corner portion of the first photo resist layer and the target feature.

20. The method of claim 14 further comprising, after etching the target feature, removing the first and the second photo resist layers.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Chang Chun-Wei
• Lin hong-da
• Wang Chih-Chien
• Chen Chun-Chang
• Mo Wang-Pen
• Hsieh Hung-Chang

Classifications

• G03F7/32

  Liquid compositions therefor, e.g. developers · CPC title

• G03F7/091

  characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title

• G03F7/16

  Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74) · CPC title

• G03F7/0035 Primary

  Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface · CPC title