Mirror array

Patent metadata

Field	Value
Publication number	US-9791691-B2
Application number	US-201314031464-A
Country	US
Kind code	B2
Filing date	Sep 19, 2013
Priority date	Mar 25, 2011
Publication date	Oct 17, 2017
Grant date	Oct 17, 2017

Abstract

A mirror array having a total surface extending perpendicularly to a surface normal, comprises a multiplicity of mirror elements each having a reflection surface and at least one degree of freedom of displacement, wherein the totality of the mirror elements form a parqueting of a total reflection surface of the mirror array, and wherein the mirror array is embodied modularly as a tile element in such a way that the parqueting of the total reflection surface can be extended by a tiling of a plurality of such mirror arrays.

First claim

The invention claimed is:

1. A mirror array having a surface normal and a total surface which extends perpendicular to the surface normal, the mirror array comprising:
a multiplicity of mirror elements, each mirror element comprising a reflection surface, each mirror element having at least one degree of freedom of displacement,
wherein:
a totality of the multiplicity of mirror elements define a parqueting of a total reflection surface of the mirror array;
the mirror array is embodied modularly as a tile element so that the parqueting of the total reflection surface is extendable via tiling of a plurality of such mirror arrays; and
a ratio of the total reflection surface to the total surface is at least 0.75.

2. The mirror array of claim 1 , wherein the total surface extends beyond the total reflection surface by at most 5 mm in a direction perpendicular to the surface normal.

3. A method, comprising:
using a batch method to connect a carrier substrate to a wafer stack which comprises a mirror array according to claim 1 covering a substrate.

4. The optical component of claim 1 , wherein the ratio of the total reflection surface to the total surface is at least 0.85.

5. The mirror array of claim 1 , wherein the ratio of the total reflection surface to the total surface is at least 0.95.

6. The mirror array of claim 1 , wherein the totality of the multiplicity of mirror elements define a tessalation of the total reflection surface of the mirror array.

7. An optical component, comprising:
a mirror array having a surface normal and a total surface which extends perpendicular to the surface normal, the mirror array comprising a multiplicity of mirror elements; and
a carrying structure which is offset with respect to the mirror array in a direction of the surface normal,
wherein:
each mirror element comprises a reflection surface;
each mirror element has at least one degree of freedom of displacement;
a totality of the multiplicity of mirror elements define a parqueting of a total reflection surface of the mirror array;
the mirror array is embodied modularly as a tile element so that the parqueting of the total reflection surface is extendable via tiling of a plurality of such mirror arrays; and
the carrying structure projects beyond the total surface of the mirror array by at most 1 mm in a direction perpendicular to the surface normal.

8. The optical component of claim 7 , wherein the carrying structure is mechanically connected to the mirror array exclusively in an edge region.

9. The optical component of claim 7 , further comprising a control device configured to control displacement of the mirror elements, wherein the control device is integrated into the carrying structure.

10. The optical component of claim 7 , further comprising an electrical interface on an opposite side of the carrying structure relative to the mirror array.

11. The optical component of claim 7 , wherein the carrying structure comprises a ferromagnetic element.

12. An optical assembly, comprising:
a baseplate configured to arrange optical components;
an optical component according to claim 7 ; and
a fixing device which fixes the optical component, the fixed device being connected to the baseplate.

13. The assembly of claim 12 , comprising at least five optical components, wherein each optical element comprises:
a mirror array; and
a carrying structure which is offset with respect to the mirror array in a direction of the surface normal, the carrying structure projecting beyond the total surface of the mirror array by at most 1 mm in a direction perpendicular to the surface normal.

14. The assembly of claim 12 , wherein the optical component is exchangeably fixed to the baseplate.

15. The assembly of claim 12 , wherein the fixing device comprises a magnetic mechanism.

16. The assembly of claim 12 , further comprising sprung contact pins defining an electrical contact with an interface of the component.

17. A tool, comprising:
an electromagnet configured to generate a holding force; and
a spacer element configured to define a predetermined mechanical contact region between the tool and an optical component according to claim 7 so that the tool is configured to hold the optical component.

18. A method, comprising:
using a magnetic force to arrange an optical component according to claim 7 on a baseplate while at least partially compensating for the magnetic force via an additional magnetic field.

19. An optical unit, comprising:
an optical assembly, comprising:
a baseplate configured to arrange optical components;
an optical component according to claim 7 ; and
a fixing device which fixes the optical component, the fixed device being connected to the baseplate,

wherein the optical unit is a projection exposure optical unit.

20. An illumination system, comprising:
an EUV radiation source; and
a projection exposure optical unit, comprising:
an optical assembly, comprising:
a baseplate configured to arrange optical components;
an optical component according to claim 7 ; and
a fixing device which fixes the optical component, the fixing device being connected to the baseplate.

21. An apparatus, comprising:
an illumination system, comprising:
an optical assembly, comprising:
a baseplate configured to arrange optical components;
an optical component according to claim 7 ; and

a fixing device which fixes the optical component, the fixing device being connected to the baseplate,

wherein the optical unit is a projection exposure apparatus.

22. The apparatus of claim 21 , further comprising a projection optical unit.

23. A method, comprising:
using a projection exposure apparatus to project at least a part of a reticle onto a region of a light-sensitive layer, the projection exposure apparatus comprising:
an illumination system, comprising:
an optical assembly, comprising:
a baseplate configured to arrange optical components;
an optical component according to claim 7 ; and

a fixing device which fixes the optical component, the fixed device being connected to the baseplate.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Waldis Severin
• Lani Sebastian
• Knauf Benedikt
• Deng Jian
• Bostock Roger Marc

Classifications

• Y10T29/49117

  Conductor or circuit manufacturing · CPC title

• G03F7/70825

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title

• G03F7/70075

  Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection · CPC title

• G02B26/0833

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G03F7/702

  Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems · CPC title