Substrate treatment method and substrate treatment apparatus

US9786522B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9786522-B2
Application numberUS-201514659701-A
CountryUS
Kind codeB2
Filing dateMar 17, 2015
Priority dateMar 17, 2014
Publication dateOct 10, 2017
Grant dateOct 10, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate treatment method is performed by a substrate treatment apparatus including a substrate holding unit which holds a substrate, and a hot plate which heats the substrate from below. The method includes: a treatment liquid supplying step of locating the hot plate at a retracted position at which the hot plate is retracted below the substrate holding unit and, in this state, supplying a treatment liquid to an upper surface of the substrate held by the substrate holding unit; a protection liquid film forming step of forming a liquid film of a protection liquid to cover an upper surface of the hot plate in the treatment liquid supplying step; and a substrate heating step of heating the substrate by the hot plate with the hot plate being located adjacent to a lower surface of the substrate or in contact with the lower surface of the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate treatment method to be performed by a substrate treatment apparatus including a substrate holding unit which holds a substrate, and a hot plate which heats the substrate from below, the substrate treatment method comprising: a treatment liquid supplying step of locating the hot plate at a retracted position at which the hot plate is retracted below the substrate holding unit and, in this state, supplying a treatment liquid to an upper surface of the substrate held by the substrate holding unit; a protection liquid film forming step of forming a liquid film of a protection liquid on an upper surface of the hot plate to cover the upper surface of the hot plate during the treatment liquid supplying step; a substrate heating step of heating the substrate by the hot plate with the hot plate being located adjacent to a lower surface of the substrate or in contact with the lower surface of the substrate, wherein the treatment liquid is a liquid containing at least one of sulfuric acid, acetic acid, nitric acid, hydrochloric acid, hydrofluoric acid, ammonia water, hydrogen peroxide water, organic acids, organic alkalis, a surfactant and an anti-corrosion agent, and wherein the protection liquid is one of pure water, carbonated water, electrolytic ion water, hydrogen water, ozone water, and a hydrochloric acid aqueous solution. 2. The substrate treatment method according to claim 1 , wherein the protection liquid film forming step includes the step of continuously supplying the protection liquid to the upper surface of the hot plate. 3. The substrate treatment method according to claim 1 , wherein the protection liquid film forming step includes the step of spouting the protection liquid from a protection liquid outlet port provided in the upper surface of the hot plate. 4. The substrate treatment method according to claim 1 , wherein the protection liquid film forming step includes the step of spouting the protection liquid to the upper surface of the hot plate from a protection liquid nozzle. 5. The substrate treatment method according to claim 1 , wherein the treatment liquid supplying step includes the steps of supplying a chemical liquid or a rinse liquid to the upper surface of the substrate, and supplying an organic solvent to the upper surface of the substrate to replace the chemical liquid or the rinse liquid with a liquid film of the organic solvent on the upper surface of the substrate, wherein the organic solvent liquid film formed on the upper surface of the substrate in the organic solvent supplying step is heated on the upper surface of the substrate in the substrate heating step.

Assignees

Inventors

Classifications

  • characterised by a plurality of individual support members, e.g. support posts or protrusions · CPC title

  • characterised by lifting arrangements, e.g. lift pins · CPC title

  • characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

  • characterised by the construction of the load-lock chamber · CPC title

  • mainly by convection · CPC title

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What does patent US9786522B2 cover?
A substrate treatment method is performed by a substrate treatment apparatus including a substrate holding unit which holds a substrate, and a hot plate which heats the substrate from below. The method includes: a treatment liquid supplying step of locating the hot plate at a retracted position at which the hot plate is retracted below the substrate holding unit and, in this state, supplying a …
Who is the assignee on this patent?
Screen Holdings Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10P72/0406. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 5 related publications on this page (citations in our corpus or others sharing the same primary CPC).