Determination of local contact potential difference by noncontact atomic force microscopy

Patent metadata

Field	Value
Publication number	US-9784762-B2
Application number	US-201615059371-A
Country	US
Kind code	B2
Filing date	Mar 3, 2016
Priority date	Oct 31, 2013
Publication date	Oct 10, 2017
Grant date	Oct 10, 2017

Abstract

A method for determining a value of a local contact potential difference by noncontact atomic force microscopy. For one or more cantilever positions above a surface of a sample: i) determining two distinct voltage values of DC voltage applied between an oscillating cantilever and the sample, and ii) determining, by one or more processors, a value of a local contact potential difference based, at least in part, on the two distinct voltage values that were determined.

First claim

The invention claimed is:

1. A method for determining a value of a local contact potential difference by noncontact atomic force microscopy, the method comprising:
for one or more cantilever positions above a surface of a sample:
determining two distinct voltage values of DC voltage applied between an oscillating cantilever and the sample; and
determining, by one or more processors, a value of a local contact potential difference based, at least in part, on the two distinct voltage values that were determined.

2. The method of claim 1 , the method comprising:
performing two atomic force microscopy measurements, using an oscillating cantilever to generate the two distinct voltage values of DC voltage applied between the cantilever and the sample.

3. The method of claim 1 , wherein substantially similar distinct voltage values indicate substantially similar values of frequency shifts of cantilever oscillation.

4. The method of claim 1 , wherein determining the two distinct voltage values further comprises:
during a first AFM measurement:
selecting and storing a first voltage value of DC voltage applied between the oscillating cantilever and the sample;
measuring a first frequency shift corresponding to said first voltage value; and
storing a corresponding first voltage value of DC voltage applied between the oscillating cantilever and the sample; and

during a second AFM measurement:
measuring a second frequency shift;
adjusting a DC voltage applied between the cantilever and the sample, to obtain a second voltage value distinct from the first voltage value, such that the second frequency shift measured is the same as said first measured frequency shift; and

storing the second voltage value.

5. The method of claim 4 , wherein a constant value of DC voltage is used during the first AFM measurement, for each of said one or more positions.

6. The method of claim 5 , further comprising:
prior to using said constant value of DC voltage for the first AFM measurement, selecting said constant value such that a corresponding frequency shift of cantilever oscillation shall be on a same branch of the curve representing the frequency shift vs. an applied DC voltage, where said branch terminates at a principal vertex of the curve, for each of said one or more positions.

7. The method of claim 4 , wherein generation of the first AFM measurement comprises:
adjusting a DC voltage applied between the oscillating cantilever and the sample to obtain the first voltage value, such that the first measured frequency shift is the same as a predefined frequency shift.

8. The method of claim 1 , wherein determining two distinct voltage values of DC voltage applied between an oscillating cantilever and the sample comprises:
adjusting a DC voltage during a first measurement or each of the first measurement and a second measurement, via a feedback circuit using a frequency shift signal as a feedback signal, for determining a value of DC voltage corresponding to a given value of frequency shift, while in constant height mode.

9. The method of claim 1 , wherein the value of the local contact potential difference is an average of the two distinct voltage values stored.

10. The method of claim 1 , wherein the one or more cantilever positions above the surface of the sample respectively span a subset of a volume above the sample surface, wherein the subset is one of: a 3D, a 2D, or a 1D portion of said volume.

11. The method of claim 4 , the method further comprising:
acquiring a frequency shift map by performing a third AFM measurement for each of the one or more cantilever positions above the surface of the sample, using the local contact potential difference as determined for each of the one or more oscillating cantilever positions;
wherein, the first AFM measurement is performed for each of the one or more oscillating cantilever positions above the surface of the sample, and then the second AFM measurement is performed for each of the one or more oscillating cantilever positions, and then the third AFM measurement is performed for each of the one or more oscillating cantilever positions.

12. An atomic force microscopy apparatus, configured for performing atomic force microscopy measurements using an oscillating cantilever, the apparatus comprising:
a frequency shift measurement unit configured for measuring a frequency shift of cantilever oscillation;
a circuit connected to the frequency shift measurement unit, the circuit being configured to determine a DC voltage to be applied by the apparatus between a cantilever and a sample for an AFM measurement; and
a processor connected to the memory to access said one or more pairs of voltage values, the processor being configured to determine values of local contact potential differences based, at least in part, on said one or more pairs.

13. The apparatus of claim 12 , the apparatus comprising:
a memory that is configured to store one or more pairs of distinct values of DC voltages that correspond to a same value of frequency shift of cantilever oscillation.

14. The apparatus of claim 12 , wherein the processor is configured to determine a value of the local contact potential difference as an average of two distinct DC voltage values in a given one of said one or more pairs.

15. The apparatus of claim 12 , wherein the apparatus is at least one of a Kelvin probe force microscopy apparatus or an electrostatic force microscopy apparatus.

16. The apparatus of claim 12 , wherein the apparatus is further configured to acquire a frequency shift map by performing one or both of AFM measurement and constant height AFM measurements, using local contact potential differences.

17. The apparatus of claim 12 , wherein the circuit connected to the frequency shift measurement unit is configured to adjust such a DC voltage such that a value of a frequency shift, as measured by the frequency shift measurement unit, matches a reference frequency shift.

18. The apparatus of claim 17 , wherein the circuit is i) configured as a feedback circuit; ii) connected to the frequency shift measurement unit; iii) configured to use a frequency shift signal as a feedback signal; and iv) configured to adjust a DC voltage such that a value of frequency shift measured by the frequency shift measurement unit is the same as a reference frequency shift.

19. The apparatus of claim 17 , wherein the circuit has two selectable modes, wherein:
in a first selectable mode, the circuit does not adjust the DC voltage to be applied; and
in a second the selectable mode, the circuit adjusts the DC voltage to be applied, such that a value of frequency shift measured by the frequency shift measurement unit matches a reference frequency shift.

Assignees

• IBM

Inventors

• Gross Leo
• Meyer Gerhard
• Schuler Bruno
• Steurer Wolfram

Classifications

• G01Q60/30 Primary

  Scanning potential microscopy · CPC title

• G01Q60/32

  AC mode · CPC title

• G01R19/0084

  Measuring voltage only · CPC title

• G01Q30/06

  for error compensation · CPC title