Tuning nano-scale grain size distribution in multilayered alloys electrodeposited using ionic solutions, including Al—Mn and similar alloys

US9783907B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9783907-B2
Application numberUS-201214235834-A
CountryUS
Kind codeB2
Filing dateAug 2, 2012
Priority dateAug 2, 2011
Publication dateOct 10, 2017
Grant dateOct 10, 2017

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  2. Abstract

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  5. First independent claim

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Abstract

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Al—Mnx/Al—Mny multilayers with a wide range of structures ranging from microcrystalline to nanocrystalline and amorphous were electrodeposited using a single bath method under galvanostatic control from room temperature ionic liquid. By varying the Mn composition by −1-3 at. % between layers, the grain sizes in one material can be systematically modulated between two values. For example, one specimen alternates between grain sizes of about 21 and 52 nm, in an alloy of average composition of 10.3 at. % Mn. Nanoindentation testing revealed multilayers with finer grains and higher Mn content exhibited better resistance to plastic deformation. Other alloy systems also are expected to be electrodeposited under similar circumstances.

First claim

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The invention claimed is: 1. A method for depositing an alloy comprising at least two metal constituents, the method comprising the steps of: a. providing an ionic liquid comprising dissolved species of at least two metal constituents, which electrodeposit in different proportions from each other at different electrical power levels; b. providing a first electrode and a second electrode in the liquid, coupled to a power supply configured to supply electrical power having periods of a first constant level and periods of a second, different constant level; c. driving the power supply with the first electrical power level for a first duration to deposit a first type of an alloy of the at least two metal constituents on a substrate, the deposit of the first type having a first thickness based on the first duration; and d. driving the power supply with the second electrical power level for a second duration to deposit a second type of an alloy of the at least two metal constituents on the previously deposited alloy on the substrate, the deposit of the second type having a second thickness based on the second duration. 2. The method of claim 1 , further comprising repeating each of steps c and d at least one additional time to deposit an alloy of a first type and to deposit an alloy of a second type. 3. The method of claim 1 , further wherein a first property of the deposits of the first type and the second type arises due to the electrical power level by which the deposit was deposited. 4. The method of claim 1 , further wherein a first property of the deposits of the first type and the second type arises due to the electrical power level by which the deposit was deposited, further comprising the step of driving the power supply to achieve a power level that corresponds to a desired instance of the first property. 5. The method of claim 3 , the first property comprising grain size. 6. The method of claim 3 , the first property comprising alloy composition. 7. The method of claim 5 , further wherein a second property of the combined deposits of the first type and the second type, arises due to a thickness wavelength of the set of the first and second deposits and the grain size of the deposits of the first and the second types. 8. The method of claim 5 , further wherein a second property of the combined deposits of the first type and the second type arises due to a thickness wavelength of the set of the first and second deposits and the grain size of the deposits of the first and the second types, further comprising the step of driving the power supply to achieve a power level that corresponds to a desired grain size and driving the power supply for a first duration and a second duration to achieve a wavelength that corresponds to a desired instance of the second property. 9. The method of claim 5 , wherein the steps of driving the power supply with the first electric power level for a first duration and driving the power supply with the second electric power level for a second duration are conducted so that the average grain size of the first and second deposits is larger than a thickness wavelength of the set of the first and second deposits. 10. The method of claim 5 , wherein the steps of driving the power supply with the first electric power level for a first duration and driving the power supply with the second electric power level for a second duration are conducted so that the average grain size of the first and second deposits is smaller than a thickness wavelength of the set of the first and second deposits. 11. The method of claim 5 , wherein the steps of driving the power supply with the first electric power level for a first duration and driving the power supply with the second electric power level for a second duration are conducted so that the smallest grain size of the first and second deposits is larger than a thickness wavelength of the set of the first and second deposits. 12. The method of claim 5 , wherein the steps of driving the power supply with the first electric power level for a first duration and driving the power supply with the second electric power level for a second duration are conducted so that the largest grain size of the first and second deposits is smaller than a thickness wavelength of the set of the first and second deposits. 13. The method of claim 5 , wherein the steps of driving the power supply with the first electric power level for a first duration and driving the power supply with the second electric power level for a second duration are conducted so that in some portions of the deposit, the average grain size of the first and second deposits is larger than a thickness wavelength of the set of the first and second deposits and in an adjacent portion of the deposit, the average grain size of the first and second deposits is smaller than the thickness wavelength. 14. The method of claim 1 , further comprising repeating each of steps 1a, b, c and d using a second ionic liquid that differs in composition from the first ionic liquid, to provide a deposit of a third and fourth types upon the deposit of the first and second types. 15. The method of claim 1 , wherein the step of driving the power supply with the first electrical power level comprises driving the power supply to deliver a first constant current density and wherein the step of driving the power supply with the second electrical power level comprises driving the power supply to deliver a second constant current density. 16. The method of claim 1 , wherein the step of driving the power supply with the first electrical power level comprises driving the power supply to deliver a first constant voltage and wherein the step of driving the power supply with the second electrical power level comprises driving the power supply to deliver a second constant voltage. 17. The method of claim 5 , further comprising repeating each of steps c and d at least one additional time to deposit an alloy of a first type and to deposit an alloy of a second type, wherein the steps of repeating the step of driving the power supply with the first electrical power level and the step of driving the power supply with the second electrical power level comprises driving the power supply to deliver a series of different electrical power levels so that grain size varies from a first grain size at the first deposit through a plurality of grain sizes at subsequent deposits. 18. The method of claim 17 , wherein the grain size varies such that the grain size increases from the first deposit to a last deposit. 19. A method for depositing an alloy comprising at least two metal constituents, the method comprising the steps of: a. providing a first ionic liquid comprising dissolved species of at least two metal constituents, which electrodeposit in different proportions from each other at different electrical power levels; b. providing a first electrode and a second electrode in the liquid, coupled to a power supply configured to supply electrical power having periods of a first constant level and periods of a second, different constant level; c. driving the power supply with the first electrical power level for a first duration to deposit a first type of an alloy of the at least two metal constituents on a substrate, the deposit of the first type having a first thickness based on the first duration; d. driving the power supply with the second electrical power level for a second duration to deposit a second type of an alloy of the at least two metal constituents on the previously deposited a

Assignees

Inventors

Classifications

  • from melts · CPC title

  • from ionic liquids · CPC title

  • Electrodes {, e.g. composition, counter electrode} · CPC title

  • Electroplating with more than one layer of the same or of different metals (for bearings C25D7/10) · CPC title

  • C25D21/12Primary

    Process control or regulation (controlling or regulating in general G05) · CPC title

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What does patent US9783907B2 cover?
Al—Mnx/Al—Mny multilayers with a wide range of structures ranging from microcrystalline to nanocrystalline and amorphous were electrodeposited using a single bath method under galvanostatic control from room temperature ionic liquid. By varying the Mn composition by −1-3 at. % between layers, the grain sizes in one material can be systematically modulated between two values. For example, one sp…
Who is the assignee on this patent?
Cai Wenjun, Schuh Christopher A, Massachusetts Inst Technology
What technology area does this patent fall under?
Primary CPC classification C25D21/12. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).