System and method for purification of electrolytic salt

US9783898B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9783898-B2
Application numberUS-201514933274-A
CountryUS
Kind codeB2
Filing dateNov 5, 2015
Priority dateJun 14, 2013
Publication dateOct 10, 2017
Grant dateOct 10, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods and systems for removing impurities from an electrolytic salt are disclosed. After removal of impurities from the salt, the salt can be subjected to electrorefining to produce high-purity materials, for example silicon. Impurities are removed from the salt using a system that includes a first working electrode, a counter electrode, and at least one reference electrode. A second working electrode can also be utilized. The salt may be utilized in an electrorefining system, for example a system operated in a single phase or multiple phase operation to produce high-purity materials, such as solar-grade silicon.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for purifying a salt having multiple impurities, the method comprising: providing a system comprising a first working electrode, a counter electrode, a reference electrode, and a system control, wherein the first working electrode, the counter electrode, and the reference electrode are electrically coupled to the salt; setting, via the system control, a desired electrical potential between the reference electrode and the first working electrode; applying sufficient electrical energy to the system to cause a negatively-charged first targeted impurity within the salt to deposit on the surface of the first working electrode; removing the first working electrode from the salt; electrically coupling a second working electrode to the salt; setting, via the system control, a desired electrical potential between the reference electrode and the second working electrode; and applying sufficient electrical energy to the system to cause a positively-charged second targeted impurity within the salt to deposit on the surface of the second working electrode. 2. The method of claim 1 , wherein the salt comprises LiCl. 3. The method of claim 1 , wherein the applying sufficient electrical energy to the system to cause the negatively-charged first targeted impurity within the salt to deposit on the surface of the first working electrode comprises applying a positive voltage to the first working electrode by the system control. 4. The method of claim 1 , wherein the applying sufficient electrical energy to the system to cause the positively-charged second targeted impurity within the salt to deposit on the surface of the second working electrode comprises applying a negative voltage to the second working electrode by the system control. 5. A method, comprising: in a vessel, removing a positively-charged impurity from a salt via operation of a purification system comprising a working electrode, a counter electrode, and a reference electrode by applying a sufficient electrical energy to the system between the reference electrode and the working electrode to cause the positively-charged impurity to deposit on the working electrode, wherein the salt comprises a non-oxygen anion and a metal cation having a more negative standard reduction potential than silicon; replacing the working electrode with a second working electrode; in the vessel, removing a negatively-charged impurity from the salt via the purification system by applying a sufficient electrical energy between the reference electrode and the second working electrode to cause the negatively-charged impurity to deposit on the second working electrode; and in the vessel, electrorefining silicon using the salt as an electrolyte. 6. The method of claim 5 , wherein the salt comprises LiCl. 7. The method of claim 5 , wherein the silicon produced by the step of electrorefining comprises solar-grade silicon. 8. The method of claim 5 , wherein a system control provides an electrical potential between the reference electrode and the second working electrode operated as an anode. 9. The method of claim 5 , wherein a control system provides an electrical potential between the reference electrode and the working electrode operated as a cathode.

Assignees

Inventors

Classifications

  • Chemistry & Metallurgy · mapped topic

  • Supplying or removing reactants or electrolytes; Regeneration of electrolytes · CPC title

  • Chemistry & Metallurgy · mapped topic

  • Chlorine; Compounds thereof (by simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine C25B1/34) · CPC title

  • C25B1/14Primary

    Alkali metal compounds · CPC title

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What does patent US9783898B2 cover?
Methods and systems for removing impurities from an electrolytic salt are disclosed. After removal of impurities from the salt, the salt can be subjected to electrorefining to produce high-purity materials, for example silicon. Impurities are removed from the salt using a system that includes a first working electrode, a counter electrode, and at least one reference electrode. A second working …
Who is the assignee on this patent?
Tao Meng, Han Xiaofei, Univ Arizona State
What technology area does this patent fall under?
Primary CPC classification C25B1/14. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 10 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).