Apparatus and method for fine-tuning magnet arrays with localized energy delivery

US9779872B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9779872-B2
Application numberUS-201414565166-A
CountryUS
Kind codeB2
Filing dateDec 9, 2014
Priority dateDec 23, 2013
Publication dateOct 3, 2017
Grant dateOct 3, 2017

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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One embodiment relates to an apparatus for adjustment of local magnetic strength in a magnetic device. A stage holds the magnetic device, and a sensor measures a magnetic field at locations above the magnetic device so as to generate magnetic field data. A computer system detects a non-uniformity in the magnetic field from the magnetic field data and determines a location and a duration for application of a pulsed laser beam to correct the non-uniformity. A laser device applies the pulsed laser beam at said location for said duration. Another embodiment relates to a method of adjusting local magnetic strength in a magnetic device. Another embodiment relates to a system for fine-tuning a magnet array with localized energy delivery. Other embodiments, aspects and features are also disclosed.

First claim

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What is claimed is: 1. An apparatus for adjustment of local magnetic strength in a magnetic device, the apparatus comprising: a stage for holding the magnetic device; a sensor that measures a magnetic field at locations above the magnetic device so as to generate magnetic field data; a computer system that detects a non-uniformity in the magnetic field from the magnetic field data, wherein the non-uniformity comprises a shift in a position of a peak in the magnetic field, and determines a location and a duration for application of a pulsed laser beam to correct the non-uniformity; and a laser device that applies the pulsed laser beam at a section on one side of the peak for said duration to correct the position of the peak. 2. The apparatus of claim 1 , wherein the stage comprises a translatable stage that is controlled by the computer system. 3. The apparatus of claim 2 , wherein translatable stage controllably moves the magnetic device in three dimensions. 4. The apparatus of claim 1 , wherein the sensor comprises a Hall sensor that measures the magnetic field using the Hall effect. 5. The apparatus of claim 1 , wherein the sensor comprises a magnetoresistive sensor. 6. The apparatus of claim 1 , wherein the sensor comprises a giant magnetoresistive sensor. 7. The apparatus of claim 1 , wherein the sensor comprises a magneto optical Kerr effect sensor. 8. The apparatus of claim 1 , wherein non-uniformities in the magnetic field comprise deviations from an expected magnetic field. 9. The apparatus of claim 1 , wherein the laser device has a controllable orientation so as to controllably change an incident angle of the pulsed laser beam onto the magnetic device. 10. The apparatus of claim 1 , further comprising: an inspection microscope for aligning the magnetic device for targeted application of the pulsed laser beam. 11. The apparatus of claim 10 , wherein the inspection microscope comprises an optical microscope. 12. The apparatus of claim 1 , wherein the magnetic device comprises a magnetic lens, and wherein the non-uniformity causes astigmatism of the magnetic lens. 13. A method of adjusting local magnetic strength in a magnetic device, the method comprising: holding the magnetic device using a translatable stage; measuring a magnetic field using a sensor at locations above the magnetic device so as to generate magnetic field data; detecting a deviation in the magnetic field from the magnetic field data, wherein the deviation comprises a shift in a position of a peak in the magnetic field; determining a location and a duration for application of a pulsed laser beam to correct the deviation; and applying the pulsed laser beam at a section on one side of the peak for said duration for adjustment of the local magnetic strength to correct the position of the peak. 14. The method of claim 13 , further comprising: measuring the magnetic field using the sensor after said applying to check a result of said adjustment of the local magnetic strength. 15. The method of claim 14 , further comprising: detecting a remaining deviation in the magnetic field from said check; determining a second location and a second duration for application of the pulsed laser beam to correct the remaining deviation; and applying the pulsed laser beam at said second location for said second duration for further adjustment of the local magnetic strength. 16. A system for fine-tuning a magnet array with localized energy delivery, the system comprising: a translatable stage for holding and translating the magnet array; an inspection microscope for aligning a position of the magnet array; a sensor that measures a magnetic field at locations above the magnet array so as to generate magnetic field data; a computer apparatus that detects a deviation in the magnetic field from the magnetic field data, wherein the deviation comprises a shift in a position of a peak in the magnetic field; and a laser device that applies the pulsed laser beam a section on one side of the peak to correct the position of the peak. 17. The system of claim 16 , wherein the magnet array comprises an array of magnetic lenses. 18. The system of claim 17 , wherein the deviation causes astigmatism or variation in peak strength in focusing of a magnetic lens of the array. 19. The system of claim 16 , wherein the system is automated under control of the computer apparatus so as to fine-tune the magnetic field generated by the magnet array. 20. The system of claim 19 , wherein a control module of the computer apparatus is configured to perform steps comprising: using the sensor and translation of the stage to measure the magnetic field at multiple locations above the magnet array so as to generate the magnetic field data; detecting the deviation in the magnetic field from the magnetic field data; determining a location and a duration for application of the pulsed laser beam to mitigate the deviation; and applying the pulsed laser beam at said location for said duration.

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What does patent US9779872B2 cover?
One embodiment relates to an apparatus for adjustment of local magnetic strength in a magnetic device. A stage holds the magnetic device, and a sensor measures a magnetic field at locations above the magnetic device so as to generate magnetic field data. A computer system detects a non-uniformity in the magnetic field from the magnetic field data and determines a location and a duration for app…
Who is the assignee on this patent?
Kla Tencor Corp
What technology area does this patent fall under?
Primary CPC classification H01F41/0286. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Oct 03 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).