Electromechanical system having a controlled atmosphere, and method of fabricating same

Patent metadata

Field	Value
Publication number	US-9771257-B2
Application number	US-201113213709-A
Country	US
Kind code	B2
Filing date	Aug 19, 2011
Priority date	Mar 20, 2003
Publication date	Sep 26, 2017
Grant date	Sep 26, 2017

Abstract

There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of fabricating or manufacturing MEMS having mechanical structures that operate in controlled or predetermined mechanical damping environments. In this regard, the present invention encapsulates the mechanical structures within a chamber, prior to final packaging and/or completion of the MEMS. The environment within the chamber containing and/or housing the mechanical structures provides the predetermined, desired and/or selected mechanical damping. The parameters of the encapsulated fluid (for example, the gas pressure) in which the mechanical structures are to operate are controlled, selected and/or designed to provide a desired and/or predetermined operating environment.

First claim

What is claimed is:

1. A method of producing a microelectromechanical device, the method comprising:
selecting a pressure range;
selecting a fluid diffusivity;
providing a chamber including a first encapsulation layer, the first encapsulation layer including at least one vent;
providing a microelectromechanical structure disposed at least substantially within the chamber;
determining a level of damping of the microelectromechanical structure during its operation;
providing (a) a semiconductor material disposed in or on the at least one vent to seal the chamber and (b) a fluid within the chamber whose pressure is within the selected pressure range, and whose fluid diffusivity substantially constantly provides the determined damping level of the microelectromechanical structure during its operation, wherein the providing of the fluid includes forming the fluid at least partially as a by-product gas resulting from a gas used to create the semiconductor material; and
subsequent to the at least partial formation of the fluid as the by-product gas, performing a micromachining or integrated circuit processing that facilitates a reaction of elements in the chamber with the by-product gas in the chamber that changes a state of the fluid to at least one of have the pressure within the selected pressure range and the fluid diffusivity that substantially constantly provides the determined damping level.

2. The method of claim 1 , wherein the at least one by-product gas is a hydrogen based gas.

3. The method of claim 1 , wherein the at least one by-product gas is a chlorine based gas.

4. The method of claim 1 , wherein the at least one by-product gas includes a chlorine and a hydrogen based gas.

5. The method of claim 1 , wherein the semiconductor material includes a silicon bearing material.

6. The method of claim 1 , wherein the semiconductor material includes monocrystalline silicon, polycrystalline silicon or amorphous silicon.

7. The method of claim 1 , wherein the semiconductor material includes at least one of germanium, silicon/germanium, silicon carbide and gallium arsenide.

8. The method of claim 1 , wherein the fluid further includes at least one substantially stable gas.

9. The method of claim 8 , wherein the at least one relatively stable gas is helium, nitrogen, neon, argon, krypton, xenon or perfluorinated hydrofluorocarbons.

10. The method of claim 8 , wherein the semiconductor material includes a silicon bearing material.

11. The method of claim 8 , wherein the semiconductor material includes monocrystalline silicon, polycrystalline silicon or amorphous silicon.

12. The method of claim 8 , wherein the at least one by-product gas is a hydrogen based gas.

13. The method of claim 8 , wherein the at least one by-product gas is a chlorine based gas.

14. The method of claim 8 , wherein the at least one by-product gas includes a chlorine and a hydrogen based gas.

15. The method of claim 8 , wherein the semiconductor material includes at least one of germanium, silicon/germanium, silicon carbide and gallium arsenide.

16. The method of claim 1 , wherein the providing of the semiconductor material and of the fluid includes depositing the semiconductor material by a reaction to create the semiconductor material in a deposition process during which a gas that is not used in the reaction that produces the semiconductor material is added to react with the gas that is used in the reaction by which the semiconductor material is created or with a gas that is produced by the reaction by which the semiconductor material is created, thereby generating a by-product gas that at least partially forms the fluid.

17. The method of claim 1 , wherein the micromachining or integrated circuit processing occurs after the by-product gas is trapped in the chamber that had been sealed by the semiconductor material.

Assignees

• Partridge Aaron
• Lutz Markus
• Kronmueller Silvia
• Bosch Gmbh Robert

Inventors

• Partridge Aaron
• Lutz Markus
• Kronmueller Silvia

Classifications

• B81C1/00293 Primary

  maintaining a controlled atmosphere with processes not provided for in B81C1/00285 · CPC title

• B81C2203/0136

  Growing or depositing of a covering layer · CPC title