Method of manufacturing substrate for organic electronic device
US-2016204365-A1 · Jul 14, 2016 · US
US9768398B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9768398-B2 |
| Application number | US-201314441143-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 2, 2013 |
| Priority date | Nov 30, 2012 |
| Publication date | Sep 19, 2017 |
| Grant date | Sep 19, 2017 |
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Provided are a substrate for an organic electronic device (OED), an organic electronic system, a method of manufacturing the substrate or the system, a light source for a display, and a lighting device. The substrate for an OED may form an organic electronic system having enhanced durability by preventing penetration of a foreign material such as moisture or oxygen, and thus having excellent performance including light extraction efficiency.
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What is claimed is: 1. A substrate for an organic electronic device (OED), comprising: a first polymer base layer having a refractive index with respect to light with a wavelength of 633 nm of 1.6 or more; an optical functional layer having a haze of 10 to 50% formed on the first polymer base layer; a high refractive layer including a planarization layer having a refractive index with respect to light of a wavelength of 633 nm of 1.7 or more formed on the optical functional layer and a second polymer base layer having a refractive index with respect to light with a wavelength of 633 nm of 1.6 or more and formed on the planarization layer; and a barrier layer formed on one or both surfaces of the first polymer base layer or the high refractive layer, and having a refractive index with respect to light with a wavelength of 633 nm of 1.45 or more. 2. The substrate according to claim 1 , wherein the first polymer base layer satisfies Equation 1: 15 μm≦ n×d≦ 200 μm [Equation 1] where n is a refractive index of the first polymer base layer with respect to light with a wavelength of 633 nm, and d is a thickness of the first polymer base layer. 3. The substrate according to claim 1 , wherein the first polymer base layer includes a poly(amic acid), polyimide, polyethylene naphthalate, polyether ether ketone, polycarbonate, polyethylene terephthalate, polyether sulfide, polysulfone acryl resin, polystyrene, or epoxy resin. 4. The substrate according to claim 1 , wherein the barrier layer includes at least one selected from the group consisting of TiO, TiO 2 , Ti 3 O 3 , Al 2 O 3 , MgO, SiO, SiO 2 , GeO, NiO, CaO, BaO, Fe 2 O 3 , Y 2 O 3 , ZrO 2 , Nb 2 O 3 and CeO 2 . 5. The substrate according to claim 1 , wherein the optical functional layer is a light scattering layer. 6. The substrate according to claim 5 , wherein the light scattering layer includes a matrix material and scattering particles having a refractive index different from that of the matrix material. 7. The substrate according to claim 5 , wherein the light scattering layer has an uneven structure. 8. The substrate according to claim 1 , wherein the planarization layer includes a poly(amic acid), polyimide, polysiloxane, or epoxy resin. 9. The substrate according to claim 8 , wherein the planarization layer further includes particles having a refractive index with respect to light with a wavelength of 633 nm of 1.8 or more and an average particle size of 50 nm or less. 10. The substrate according to claim 1 , further comprising: a carrier substrate, wherein a side of the first polymer base layer opposite to the optical functional layer is in contact with the carrier substrate. 11. A method of manufacturing a substrate for an organic electronic device (OED), comprising: forming a first polymer base layer having a refractive index with respect to light with a wavelength of 633 nm of 1.6 or more on a carrier substrate; forming an optical functional layer having a haze of 10 to 50% on the first polymer base layer; forming a high refractive layer including a planarization layer having a refractive index with respect to light of a wavelength of 633 nm of 1.7 or more on the optical functional layer and a second polymer base layer having a refractive index with respect to light with a wavelength of 633 nm of 1.6 or more and formed on the planarization layer; and forming a barrier layer having a refractive index with respect to light with a wavelength of 633 nm of 1.45 or more on one or both surfaces of the first polymer base layer or the high refractive layer. 12. The method according to claim 11 , wherein the first polymer base layer is formed by laminating a polymer film or coating a coating solution including a polymer, on the carrier substrate. 13. An organic electronic system, comprising: the substrate for the organic electronic device of claim 1 ; a first electrode formed on the substrate; a functional organic layer formed on the first electrode; and a second electrode formed on the functional organic layer. 14. A method of manufacturing an organic electronic system, comprising: sequentially forming a first electrode, a functional organic layer, and a second electrode on the substrate for the organic electronic device manufactured by the method of claim 11 . 15. A light source for a display, comprising: the organic electronic system of claim 13 . 16. A lighting device, comprising: the organic electronic system of claim 13 .
Substrates, e.g. flexible substrates · CPC title
comprising scattering means · CPC title
Electricity · mapped topic
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