Substrate for organic electronic device and method of manufacturing the same

Patent metadata

Field	Value
Publication number	US-2016164013-A1
Application number	US-201414908033-A
Country	US
Kind code	A1
Filing date	Sep 30, 2014
Priority date	Sep 30, 2013
Publication date	Jun 9, 2016
Grant date	—

Abstract

Provided are a substrate for an OED, a method of manufacturing the same, and a use thereof. The substrate includes a flexible base film and an inorganic material layer, and the inorganic material layer includes a multilayer structure of at least two thin layers. Such an inorganic material layer may have an excellent physical property, for example, a barrier property, by inhibiting crystallinity. In addition, by employing the multilayer structure, an inorganic material layer having a physical property which is difficult to be realized by a conventional inorganic material layer, for example, a high refractive index, in addition to the barrier property may be formed.

First claim

What is claimed is:

1 . A substrate for an organic electronic device (OED), comprising:
a flexible base film; and an inorganic material layer formed on the base film and including a stack structure of first and second sub layers each having a thickness of 7 nm or less.

2 . The substrate according to claim 1 , wherein the base film has a haze of 3 to 30%.

3 . The substrate according to claim 1 , wherein the base film has a refractive index with respect to light having a wavelength of 550 nm of 1.7 or more.

4 . The substrate according to claim 3 , wherein the inorganic material layer has a thickness of 10 to 100 nm.

5 . The substrate according to claim 1 , wherein the inorganic material layer and the base film have a difference in refractive index of 1 or less.

6 . The substrate according to claim 1 , wherein the inorganic material layer does not include a layer having a thickness of more than 7 nm.

7 . The substrate according to claim 1 , wherein the first sub layer and the second sub layer are stacked in contact with each other, and are different oxide layers, nitride layers, or oxynitride layers, respectively.

8 . The substrate according to claim 1 , wherein the inorganic material layer further includes a third sub layer different from the first and second sub layers.

9 . The substrate according to claim 1 , wherein the first sub layer has a refractive index with respect to a wavelength of 550 nm of 1.4 to 1.9, and the second sub layer has a refractive index with respect to a wavelength of 550 nm of 2.0 to 2.6.

10 . The substrate according to claim 1 , wherein the inorganic material layer has a thickness of 10 to 300 nm.

11 . The substrate according to claim 1 , wherein the inorganic material layer has a refractive index with respect to a wavelength of 550 nm of 1.8 to 2.2.

12 . The substrate according to claim 1 , which has a water vapor transmission rate (WVTR) of 10 −6 to 10 −3 g/m 2 /day.

13 . An organic electronic device (OED), comprising:
the substrate for an OED of claim 1 ; and a device region having a first electrode layer, an organic material layer, and a second electrode layer, and present on an inorganic material layer of the substrate.

14 . A light source for a display, comprising:
the OED of claim 13 .

15 . A lighting device, comprising:
the OED of claim 13 .

16 . A method of manufacturing a substrate for an OED, comprising:
forming an inorganic material layer by forming a stack structure of first and second sub layers each having a thickness of 7 nm or less on a flexible base film.

17 . The method according to claim 16 , wherein the stack structure of the first and second sub layers is formed by forming a first sub layer on a base film, and forming a second sub layer having a different material from that of the first sub layer on the first sub layer.

18 . The method according to claim 16 , wherein the inorganic material layer is formed to have a refractive index with respect to a wavelength of 550 nm of 1.8 to 2.2.

19 . The method according to claim 16 , wherein the inorganic material layer is formed by atomic layer deposition (ALD).

Assignees

• Lg Chemical Ltd

Inventors

• Lee Jung Hyoung

Classifications

• B32B2307/546

  Flexural strength; Flexion stiffness · CPC title

• B32B2307/7242

  Non-permeable · CPC title

• B32B2307/732

  Dimensional properties · CPC title

• B32B2457/00

  Electrical equipment · CPC title

• B32B19/04

  next to another layer of {the same or of} a {different material (next to a glass layer B32B17/067)} · CPC title