Liquid treatment apparatus

Patent metadata

Field	Value
Publication number	US-9768010-B2
Application number	US-201213823205-A
Country	US
Kind code	B2
Filing date	Aug 1, 2012
Priority date	Aug 5, 2011
Publication date	Sep 19, 2017
Grant date	Sep 19, 2017

Abstract

A liquid treatment apparatus includes a substrate holder ( 21 ) that holds a substrate horizontally and rotates the substrate, a treatment liquid nozzle ( 82 ) that supplies a treatment liquid to the substrate held by the substrate holder, a cup ( 40 ) that is arranged outside of a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle, a top plate ( 32 ) that covers the substrate held by the substrate holder from above, a top plate rotation driving mechanism that rotates the top plate, and a liquid receiving member ( 130 ) that surrounds a peripheral edge of the top plate and has a circular liquid receiving space ( 132 ).

First claim

The invention claimed is:

1. A liquid treatment apparatus comprising:
a substrate holder that holds a substrate horizontally and rotates the substrate;
a treatment liquid nozzle that supplies a treatment liquid to the substrate held by the substrate holder;
a liquid receiving cup that is arranged outside a peripheral edge of the substrate held by the substrate holder and receives the treatment liquid which has been supplied to the substrate by the treatment liquid nozzle;
a top plate that covers, from above, the substrate held by the substrate holder;
a top plate rotation driving mechanism that rotates the top plate; and
a liquid receiving member that surrounds a peripheral edge of the top plate and has a circular liquid receiving space,
wherein the circular liquid receiving space has at an inner circumference thereof an opening that opens toward a peripheral edge of the top plate to receive a liquid scattering from the top plate, wherein the liquid receiving member has a bottom and a rim member extending upwardly from the bottom to define the liquid receiving space together with the bottom, and forming an inner peripheral edge of the liquid receiving space, wherein the peripheral edge of the top plate is located radially outside of the rim member, and
wherein the rim member extends circumferentially along the peripheral edge of the top plate.

2. The liquid treatment apparatus according to claim 1 , further comprising at least one discharge pipe connected to the liquid receiving space to discharge a fluid within the liquid receiving space.

3. The liquid treatment apparatus according to claim 2 , wherein a suctioning mechanism is connected to the discharge pipe.

4. The liquid treatment apparatus according to claim 3 , further comprising a flow rectifying plate arranged above the top plate, wherein the suctioning mechanism suctions a space located between the top plate and the flow rectifying plate through the liquid receiving space.

5. The liquid treatment apparatus according claim 1 , further comprising:
a holding member that holds the top plate; and
a holding member moving mechanism that moves the holding member,
wherein the liquid receiving member is held by the holding member.

6. The liquid treatment apparatus according to claim 5 ,
wherein the liquid receiving member is non-rotatably fixed to the holding member.

7. The liquid treatment apparatus according to claim 1 , further comprising a top plate cleaning nozzle that supplies a cleaning liquid to a lower surface of the top plate.

8. The liquid treatment apparatus according to claim 1 , further comprising a cylindrical outer cup arranged around the liquid receiving cup and having an upper opening at an upper portion thereof, the cylindrical outer cup being capable of moving up and down between a lifted position at which an upper end of the cylindrical outer cup is located above the liquid receiving cup and a lowered position located under the lifted position, wherein a closed space surrounded by the cylindrical outer cup and the top plate is defined when the liquid receiving member comes close to or into contact with the upper end of the cylindrical outer cup.

9. The liquid treatment apparatus according to claim 1 , wherein the liquid receiving member is coupled to the top plate.

10. The liquid treatment apparatus according to claim 9 , wherein the liquid receiving member has a discharge port.

11. The liquid treatment apparatus according to claim 10 , further comprising a second liquid receiving cup arranged around an outer circumference of the discharge port.

12. The liquid treatment apparatus according to claim 11 , further comprising a cup driving mechanism that moves the second liquid receiving cup between a position at which the second liquid receiving cup surrounds the liquid receiving member and a position at which the second liquid receiving cup does not surround the liquid receiving member.

13. The liquid treatment apparatus according to claim 9 , further comprising a top plate cleaning nozzle that supplies a cleaning liquid to a lower surface of the top plate.

Assignees

• Ito Norihiro
• Aiura Kazuhiro
• Shindo Naoki
• Hachiya Yosuke
• Tokyo Electron Ltd

Inventors

• Ito Norihiro
• Aiura Kazuhiro
• Shindo Naoki
• Hachiya Yosuke

Classifications

• H10P95/70

  Chemical treatments · CPC title

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0414 Primary

  using mainly spraying means, e.g. nozzles · CPC title