Resist underlayer film composition, patterning process, and compound
US-10156788-B2 · Dec 18, 2018 · US
US9765173B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9765173-B2 |
| Application number | US-201414900296-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 27, 2014 |
| Priority date | Jun 26, 2013 |
| Publication date | Sep 19, 2017 |
| Grant date | Sep 19, 2017 |
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There are provided a compound containing a phenolic hydroxyl group which exhibits excellent heat resistance and excellent flame retardancy in terms of a cured product, a phenolic resin including the same, a curable composition and a cured product thereof, and a semiconductor sealing material. The compound containing a phenolic hydroxyl group has a dinaphthofuran skeleton, in which each of the two naphthylene skeletons has a hydroxyl group on an aromatic nucleus thereof.
Opening claim text (preview).
The invention claimed is: 1. A curable composition, comprising as essential components: a compound containing a phenolic hydroxyl group, which has a dinaphthofuran skeleton, wherein each of the two naphthylene skeletons has a hydroxyl group on an aromatic nucleus thereof, and a curing agent. 2. A cured product obtained by a curing reaction of the curable composition according to claim 1 . 3. A semiconductor sealing material, comprising: the curable composition according to claim 1 ; and an inorganic filler. 4. A printed circuit board obtained by impregnating a reinforcement basic material with a resin composition varnished by blending the curable composition according to claim 1 with an organic solvent, and superposing a copper foil on the resulting material, followed by heat-pressing. 5. A curable composition according to claim 1 , wherein at least one of the two naphthylene skeletons has a hydroxyl group at the para position with respect to a carbon atom to which an oxygen atom, forming a furan ring, is bonded. 6. A curable composition according to claim 1 , wherein the compound has a molecular structure represented by the following Structural Formula (I): wherein each of R 1 and R 2 is independently any one of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group, and an aralkyl group, and each of m and n is independently an integer of 0 to 4, in a case where m or n is 2 or greater, a plurality of R 1 's or R 2 's may be the same as or different from each other, and x and y each represent a bonding point on the naphthalene ring and are bonded to the carbons adjacent to each other so as to form a furan ring. 7. A compound containing a phenolic hydroxyl group, which has a dinaphthofuran skeleton, wherein each of the two naphthylene skeletons has a hydroxyl group on an aromatic nucleus thereof, wherein at least one of the two naphthylene skeletons has a hydroxyl group at the para position with respect to a carbon atom to which an oxygen atom, forming a furan ring, is bonded, and at least one of the naphthylene skeleton is selected from a group consisting of 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 2,6-dihydroxynaphthalene, 2,7-dihydroxynaphthalene, and mixtures thereof; wherein each of two naphthylene skeletons further contains 0 to 4 of R 1 or R 2 substituents, and R 1 and R 2 is independently any one of an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aryl group, and an aralkyl group, in a case where the substituents on one naphthylene skeleton is 2 or greater, a plurality of R 1 's or R 2 's may be the same as or different from each other. 8. The compound containing a phenolic hydroxyl group according to claim 7 , which is selected from the following compounds and mixtures thereof:
containing a filler · CPC title
comprising organic materials, e.g. plastics or resins · CPC title
containing O · CPC title
Condensation polymers of aldehydes or ketones with phenols only · CPC title
Use of materials for the {conductive, e.g. } metallic pattern · CPC title
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