Matrix film deposition system

US9757745B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9757745-B2
Application numberUS-201514798691-A
CountryUS
Kind codeB2
Filing dateJul 14, 2015
Priority dateDec 12, 2014
Publication dateSep 12, 2017
Grant dateSep 12, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system capable of depositing a matrix film containing a low amount of impurities (e.g. neutral particles) is provided. The system includes: a first plate electrode 120 having an attachment surface on which a sample plate P is to be attached; a second plate electrode 130 arranged so as to face the attachment surface; a nozzle 110 for spraying a liquid containing a matrix substance into the space between the two electrodes 120 and 130 by an electrospray method, the nozzle 110 arranged so that none of the electrodes 120 and 130 lies on the central axis A of a spray flow of the liquid; and an electric field creator 140 for creating, between the two electrodes 120 and 130 , an electric field for forcing electrically charged droplets contained in the spray flow of the liquid containing the matrix substance to move toward the attachment surface.

First claim

Opening claim text (preview).

The invention claimed is: 1. A matrix film deposition system for depositing a film containing a matrix substance on a surface of a sample plate, the system comprising: a) a first plate electrode having an attachment surface on which the sample plate is to be attached; b) a second plate electrode arranged so as to face the attachment surface; c) an electrostatic spray nozzle for spraying a liquid containing a matrix substance into a space between the first plate electrode and the second plate electrode, the electrostatic spray nozzle being arranged so that neither the first plate electrode nor the second plate electrode lies on a central axis of a spray flow of the liquid; d) an electric field creator for creating, between the first plate electrode and the second plate electrode, an electric field for forcing electrically charged droplets of the liquid containing the matrix substance contained in the spray flow to move toward the attachment surface, by applying DC voltage between the first plate electrode and the second plate electrode; e) an electrode driver for arranging the first plate electrode and the second plate electrode so that the distance between these two electrodes decreases or increases with an increase in the distance from the electrostatic spay nozzle, wherein the nozzle includes: f) a capillary having a tubular shape for allowing the liquid containing the matrix substance to flow from a proximal end to a droplet-spraying hole formed at a distal end, and the system further includes: g) a facing electrode located at a position facing a tip of the nozzle; and h) a voltage supplier for applying DC voltage between the capillary and the facing electrode. 2. The matrix film deposition system according to claim 1 , further comprising: i) a droplet size regulator for regulating a size of the droplets of the liquid containing the matrix substance to be adhered to the sample plate, by changing a potential difference between the first plate electrode and the second plate electrode.

Assignees

Inventors

Classifications

  • B05B5/005Primary

    the high voltage supplied to an electrostatic spraying apparatus being adjustable during spraying operation, e.g. for modifying spray width, droplet size · CPC title

  • Arrangements for supplying liquids or other fluent material · CPC title

  • for applying liquid or other fluent material to separate articles (B05C5/0204 takes precedence) · CPC title

  • Laser desorption/ionisation, e.g. matrix-assisted laser desorption/ionisation [MALDI] (sample holders H01J49/0418) · CPC title

  • characterised by the use of gas {, e.g. electrostatically assisted pneumatic spraying (B05B5/04, B05B5/043, B05B5/047 take precedence)} · CPC title

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What does patent US9757745B2 cover?
A system capable of depositing a matrix film containing a low amount of impurities (e.g. neutral particles) is provided. The system includes: a first plate electrode 120 having an attachment surface on which a sample plate P is to be attached; a second plate electrode 130 arranged so as to face the attachment surface; a nozzle 110 for spraying a liquid containing a matrix substance into t…
Who is the assignee on this patent?
Shimadzu Corp
What technology area does this patent fall under?
Primary CPC classification B05B5/005. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Sep 12 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).