Plasma processing apparatus

Patent metadata

Field	Value
Publication number	US-9754766-B2
Application number	US-201414785471-A
Country	US
Kind code	B2
Filing date	May 14, 2014
Priority date	May 21, 2013
Publication date	Sep 5, 2017
Grant date	Sep 5, 2017

Abstract

A resonance frequency is adjusted or optimized by shifting the resonance frequency without reducing an impedance function or a withstand voltage characteristic against a high frequency noise, when blocking, by using a multiple parallel resonance characteristic of a distributed constant line, the high frequency noise introduced into a line such as a power feed line or a signal line from an electrical member other than a high frequency electrode within a processing vessel. Regarding winding pitches, each of the solenoid coils 104 ( 1 ) and 104 ( 2 ) is divided to multiple sections K 1 , K 2 , . . . in a coil axis direction, and, a winding pitch p i in each section K i (i=1, 2, . . . ) is set independently. Comb teeth M inserted into winding gaps of both solenoid coils 104 ( 1 ) and 104 ( 2 ) are formed on inner surfaces of multiple rod-shaped comb-teeth member 114 provided adjacent to the solenoid coils 104 ( 1 ) and 104 ( 2 ).

First claim

I claim:

1. A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
wherein the filter comprises:
a single solenoid coil forming a part of the line; and
a cylindrical outer conductor, accommodating or surrounding the solenoid coil, configured to form, by being combined with the solenoid coil, a distributed constant line in which parallel resonance occurs at multiple frequencies,
wherein the solenoid coil has a first section and a second section having different winding pitches in an axis direction thereof,
the winding pitch of the first section is equal to or larger than twice the winding pitch of the second section, or equal to or less than ½ the winding pitch of the second section,
the filter has, in the first section, first comb teeth which are made of an insulating material and inserted in winding gaps of the solenoid coil locally at plural positions in a circumferential direction thereof, and
the first comb teeth are formed on an inner surface of a rod-shaped member composed of a plurality of insulating members which are extended in parallel to the solenoid coil in the coil axis direction and, also, arranged adjacent to an outer peripheral surface of the solenoid coil.

2. The plasma processing apparatus of claim 1 ,
wherein the filter has, in the second section, second comb teeth which are made of an insulating material and inserted in winding gaps of the solenoid coil locally at plural positions in a circumferential direction thereof.

3. The plasma processing apparatus of claim 1 ,
wherein the filter has, in the second section, a second coil tube which is made of an insulating material and configured to block winding gaps of the solenoid coil entirely in a circumferential direction thereof.

4. The plasma processing apparatus of claim 1 ,
wherein the solenoid coil has a third section arranged between the first section and the second section in the coil axis direction, and a winding pitch of the third section is the same as the winding pitch of the first section.

5. The plasma processing apparatus of claim 4 ,
wherein the filter has, in the third section, third comb teeth made of an insulating material and inserted in winding gaps of the solenoid coil locally at plural positions in a circumferential direction thereof.

6. The plasma processing apparatus of claim 5 ,
wherein the filter has, in the second section, a second coil tube which is made of an insulating material and configured to block winding gaps of the solenoid coil entirely in the circumferential direction thereof.

7. The plasma processing apparatus of claim 4 ,
wherein the filter has, in the third section, third coil tube which is made of an insulating material and configured to block winding gaps of the solenoid coil entirely in a circumferential direction thereof.

8. The plasma processing apparatus of claim 7 ,
wherein the filter has, in the second section, second comb teeth which are made of an insulating material and inserted in winding gaps of the solenoid coil locally at plural positions in the circumferential direction thereof.

9. The plasma processing apparatus of claim 1 ,
wherein a length of the first section is equal to or larger than ⅕ of a length of the second section and equal to or smaller than 5 times the length of the second section in the coil axis direction.

10. The plasma processing apparatus of claim 1 ,
wherein a shape and a size of a horizontal cross section of each of the solenoid coil and the outer conductor are uniform along the distributed constant line.

11. The plasma processing apparatus of claim 1 ,
wherein a distance between the solenoid coil and the outer conductor is uniform along the distributed constant line.

12. The plasma processing apparatus of claim 1 ,
wherein the solenoid coil is formed of an air core coil.

13. The plasma processing apparatus of claim 1 ,
wherein the electrical member is a heating element provided within or in the vicinity of a high frequency electrode to which a high frequency power of a preset frequency is applied in order to perform the plasma process,
the external circuit is a heater power supply configured to apply a power for heat generation to the heating element, and
the line is a power feed line configured to electrically connect the heater power supply and the heating element.

14. A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
wherein the filter comprises:
a single solenoid coil which forms a part of the line and has a first section and a second section having independent winding pitches;
a cylindrical outer conductor, accommodating or surrounding the solenoid coil, configured to form, by being combined with the solenoid coil, a distributed constant line in which parallel resonance occurs at multiple frequencies;
first comb teeth which are made of an insulating material and inserted into winding gaps of the solenoid coil in the first section locally in a circumferential direction thereof such that only an outer side surface and a part of upper and lower surfaces of the solenoid coil are covered with the first comb teeth; and
a second coil tube which is made of an insulating material and configured to block winding gaps of the solenoid coil entirely in the circumferential direction thereof.

15. A plasma processing apparatus, including an external circuit of a power meter or a signal meter electrically connected via a line to an electrical member within a processing vessel in which a plasma process is performed, configured to reduce or block a high frequency noise of a predetermined frequency introduced from the electrical member into the line toward the external circuit by a filter provided on the line,
wherein the filter comprises:
a single solenoid coil forming a part of the line; and
a cylindrical outer conductor, accommodating or surrounding the solenoid coil, configured to form, by being combined with the solenoid coil, a distributed constant line in which parallel resonance occurs at multiple frequencies,
wherein the solenoid coil has a first section and a second section having different winding pitches in an axis direction thereof,
the winding pitch of the first section is equal to or larger than twice the winding pitch of the second section, or equal to or less than ½ the winding pitch of the second section,
the filter has, in the first section, first comb teeth which are made of an insulating material and inserted in winding gaps of the solenoid coil locally at plural positions in a circumferential direction thereof, and
the first comb teeth are formed on an outer surface of a rod-shaped member composed of a plurality of insulating members which are extended in parallel to the solenoid coil in the coil axis direction and, also, arranged adjacent to an inner peripheral surface of the solenoid coil.

16. A plasma processing apparatus, including an external circuit of a power meter or a signal me

Assignees

• Tokyo Electron Ltd

Inventors

• Okunishi Naohiko

Classifications

• H03H2001/0092

  Inductor filters, i.e. inductors whose parasitic capacitance is of relevance to consider it as filter · CPC title

• H01J37/32724

  Temperature · CPC title

• H01J37/32091 Primary

  the radio frequency energy being capacitively coupled to the plasma · CPC title

• H01F27/006

  with special arrangement or spacing of turns of the winding(s), e.g. to produce desired self-resonance · CPC title

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title