Cylindrical sputtering target material

Patent metadata

Field	Value
Publication number	US-9748079-B2
Application number	US-201514913028-A
Country	US
Kind code	B2
Filing date	Feb 20, 2015
Priority date	Apr 22, 2014
Publication date	Aug 29, 2017
Grant date	Aug 29, 2017

Abstract

Provided is a cylindrical sputtering target material formed of copper or a copper alloy, in which an average value of the special grain boundary length ratios Lσ N /L N which are measured with respect to the outer peripheral surfaces of both end portions and the outer peripheral surface of the center portion in an axis O direction is set to be equal to or greater than 0.5, and each measured value is in a range of ±20% with respect to the average value of the special grain boundary length ratios Lσ N /L N , and the total amount of Si and C which are impurity elements is equal to or smaller than 10 mass ppm and the amount of O is equal to or smaller than 50 mass ppm.

First claim

The invention claimed is:

1. A cylindrical sputtering target material formed of copper or a copper alloy,
wherein, when special grain boundary length ratios Lσ N /L N are defined by a unit total grain boundary length L N which is obtained by using an EBSD method while measuring a total grain boundary length L of crystal grain boundaries in a measurement range and converting the total grain boundary length L into a value per unit area of 1 mm 2 and a unit total special grain boundary length Lσ N which is obtained by using the EBSD method while measuring a total special grain boundary length La of special grain boundaries in a measurement range and converting the total special grain boundary length Lσ into a value per unit area of 1 mm 2 ;
the special grain boundary length ratios Lσ N /LN are measured at 12 points of the target including 4 points which are located away in an axis direction from an edge surface of one side of the target material by 20 mm and are located at intervals of 90° in a circumferential direction, 4 points which are located at a center portion in the axis direction and are located at intervals of 90° in the circumferential direction, and 4 points which are located away in the axis direction from an edge surface of the other side of the target material by 20 mm and are located at intervals of 90° in the circumferential direction;
an average value of the special grain boundary length ratios Lσ N /L N is set to be equal to or greater than 0.5, and each value of special grain boundary length ratios Lσ N /L N is in a range of ±20% with respect to the average value; and
the cylindrical sputtering target material comprises 90 mass % or more of Cu, a total amount of Si and C which are impurity elements is equal to or greater than 0.01 mass ppm and equal to or smaller than 10 mass ppm and an amount of O is equal to or greater than 0.5 mass ppm and equal to or smaller than 50 mass ppm.

2. The cylindrical sputtering target material according to claim 1 ,
wherein an average crystal grain diameter of a crystal structure of the outer peripheral surface is in a range of 10 μm to 150 μm.

3. The cylindrical sputtering target material according to claim 1 ,
wherein a proportion of an area of crystal grains having a crystal grain diameter which is more than double an average crystal grain diameter of a crystal structure of the outer peripheral surface is less than 20% of an entire crystal area.

4. The cylindrical sputtering target material according to claim 2 ,
wherein a proportion of an area of crystal grains having a crystal grain diameter which is more than double the average crystal grain diameter of the crystal structure of the outer peripheral surface is less than 20% of an entire crystal area.

5. The cylindrical sputtering target material according to claim 1 , wherein the following relationships are satisfied:
140 mm ≦D ≦180 mm;

110 mm ≦d ≦135 mm; and

1000 mm ≦L A ≦4000 mm,

where D is outer diameter of the cylindrical sputtering target material, d is an inner diameter of the cylindrical sputtering target material, and L A is a length of the cylindrical sputtering target material in an axis direction.

6. The cylindrical sputtering target material according to claim 1 , wherein the target material is first prepared by melting the copper or copper alloy under a temperature equal to or lower than 1200 ° C. under a non-oxidizing atomosphere.

Assignees

• Mitsubishi Materials Corp

Inventors

• OHTO Michiaki
• Kumagai Satoshi
• Sakurai Akira

Classifications

• H10P14/42

  using a gas or vapour · CPC title

• H01L21/28

  Electricity · mapped topic

• C23C14/3414

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• C22C9/05

  with manganese as the next major constituent · CPC title

• C22C9/00

  Alloys based on copper · CPC title