Coating apparatus and nozzle

US9744551B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9744551-B2
Application numberUS-201313920219-A
CountryUS
Kind codeB2
Filing dateJun 18, 2013
Priority dateJun 27, 2012
Publication dateAug 29, 2017
Grant dateAug 29, 2017

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and the substrate relatively to each other along a surface of the substrate. Also, in the flow path provided in the nozzle, flow resistance at the central portion in the longitudinal direction is larger than that at both end portions in the longitudinal direction.

First claim

Opening claim text (preview).

What is claimed is: 1. A coating apparatus comprising: a nozzle extending in a longitudinal direction provided with a storage chamber that stores a coating liquid supplied from a liquid supply port through an inlet port having a slit-shape extending in the longitudinal direction and a slit-like flow path that is in communication with the storage chamber and having a depth smaller than that of the storage chamber, and configured to discharge the coating liquid to a substrate through a discharge port formed to be protruding from a front end of the flow path extending in the longitudinal direction; and a moving mechanism configured to move the nozzle and the substrate relatively to each other along a surface of the substrate, wherein the nozzle is configured to move in a direction perpendicular to a movement direction of the substrate in order to cover an entire length of the substrate, and a flow path length at a central portion of the nozzle in the longitudinal direction is set to be larger than that at both end portions of the nozzle in the longitudinal direction such that a discharge amount of the coating liquid discharged from the discharge port at the central portion of the nozzle is smaller than that at both end portions of the nozzle. 2. The coating apparatus according to claim 1 , wherein the nozzle has a land formed with the flow path along with the longitudinal direction of the nozzle and the central portion of the land in the longitudinal direction protrudes towards the storage chamber side. 3. The coating apparatus according to claim 2 , wherein the land has a boundary portion between the land and the storage chamber, and the boundary portion is formed in a step shape when viewed from a width direction. 4. The coating apparatus according to claim 2 , wherein the land has a boundary portion with the storage chamber and the boundary portion is formed in a curved shape when viewed from a width direction. 5. The coating apparatus according to claim 2 , wherein the shape of the land is determined based on a thickness distribution of the coating liquid coated using a nozzle provided with a land of which the boundary portion with the storage chamber is flat. 6. The coating apparatus according to claim 1 , further comprising: a pressure adjusting unit configured to adjust the pressure inside the storage chamber; and a pressure control unit configured to control the pressure adjusting unit to adjust the pressure inside the storage chamber such that a discharge amount of the coating liquid becomes constant while the coating liquid is being coated on the substrate. 7. The coating apparatus according to claim 1 , further comprising: a liquid surface detecting unit configured to detect a liquid surface of the coating liquid stored in the storage chamber. 8. The coating apparatus according to claim 7 , further comprising: a coating processing control unit configured to determine whether the liquid surface becomes flat based on a detection result of the liquid surface detecting unit, and when it is determined that the liquid surface become flat, to start a coating processing using the nozzle. 9. The coating apparatus according to claim 7 , wherein a portion of the storage chamber is formed with a transparent material and the liquid surface detecting unit detects the liquid surface through the transparent material from the outside of the nozzle. 10. The coating apparatus according to claim 9 , further comprising: a prism configured to reflect or refract light, wherein the liquid surface detecting unit is disposed obliquely with respect to the liquid surface at a predetermined angle and captures an image of the liquid surface viewed from a direction substantially parallel to the liquid surface through the prism. 11. The coating apparatus according to claim 6 , further comprising: a liquid supply port configured to supply the coating liquid to the storage chamber, wherein the liquid supply port has a slit shape extending in the longitudinal direction of the flow path. 12. A nozzle comprising: a storage chamber configured to store a coating liquid therein supplied from a liquid supply port through an inlet port having a slit-shape extending in a longitudinal direction; a slit-like flow path that is in communication with the storage chamber and having a gap smaller than that of the storage chamber; and a discharge port formed at a front end of the flow path and configured to discharge the coating liquid to a substrate, wherein the nozzle is extended in a longitudinal direction perpendicular to a movement direction of a substrate in order to cover an entire length of the substrate, and a flow path length at a central portion of the nozzle in the longitudinal direction is set to be larger than that at both end portions of the nozzle in the longitudinal direction such that a discharge amount of the coating liquid discharged from the discharge port at the central portion of the nozzle is smaller than that at both end portions of the nozzle.

Assignees

Inventors

Classifications

  • Apparatus for applying a liquid, a resin, an ink or the like · CPC title

  • B05C5/0258Primary

    flow controlled, e.g. by a valve (B05C5/0262, B05C5/0266 take precedence) · CPC title

  • Coating heads with slot-shaped outlet (B05C5/0283 takes precedence) · CPC title

  • Slits, e.g. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains (B05B1/046 takes precedence) · CPC title

  • responsive to the weight of a reservoir or container for liquid or other fluent material; responsive to level or volume of liquid or other fluent material in a reservoir or container · CPC title

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What does patent US9744551B2 cover?
Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The m…
Who is the assignee on this patent?
Tokyo Electron Ltd
What technology area does this patent fall under?
Primary CPC classification B05C5/0258. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 29 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).