Methods to form high density through-mold interconnections

US9741692B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9741692-B2
Application numberUS-201414767471-A
CountryUS
Kind codeB2
Filing dateSep 15, 2014
Priority dateSep 15, 2014
Publication dateAug 22, 2017
Grant dateAug 22, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Methods of fabricating a microelectronic device comprising forming a microelectronic substrate having a plurality microelectronic device attachment bond pads and at least one interconnection bond pad formed in and/or on an active surface thereof, attaching a microelectronic device to the plurality of microelectronic device attachment bond pads, forming a mold chase having a mold body and at least one projection extending from the mold body, wherein the at least one projection includes at least one sidewall and a contact surface, contacting the mold chase projection contact surface to a respective microelectronic substrate interconnection bond pad, disposing a mold material between the microelectronic substrate and the mold chase, and removing the mold chase to form at least one interconnection via extending from a top surface of the mold material to a respective microelectronic substrate interconnection bond pad.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method of fabricating a microelectronic device comprising: forming a microelectronic substrate having a plurality of microelectronic device attachment bond pads and at least one interconnection bond pad formed in and/or on an active surface thereof; attaching a microelectronic device to the plurality of microelectronic device attachment bond pads; forming a mold chase having a mold body and at least one projection extending from the mold body, wherein the at least one projection includes at least one sidewall and a contact surface, and wherein the at least one projection includes a portion comprising a resilient material that is different from the material of the remainder of the at least one projection, and wherein the portion of the at least one projection includes the mold chase projection contact surface; contacting the at least one mold chase projection contact surface to a respective microelectronic substrate interconnection bond pad; disposing a mold material between the microelectronic substrate and the mold chase; and removing the mold chase to form at least one interconnection via extending from a top surface of the mold material to a respective microelectronic substrate interconnection bond pad. 2. The method of claim 1 , further comprising filling the at least one interconnection via with a conductive material to form a through-mold interconnection. 3. The method of claim 1 , further comprising curing the mold material prior the removing the mold chase. 4. The method of claim 1 , wherein disposing the mold material comprises disposing the mold material between the microelectronic substrate and the mold chase to substantially encapsulate the microelectronic device and surrounds the at least one interconnection projection sidewall. 5. The method of claim 1 , wherein forming the microelectronic substrate comprises forming a microelectronic substrate having an active surface with a plurality microelectronic device attachment bond pads and at least one interconnection bond pad having a protective bump formed in and/or on the microelectronic substrate active surface. 6. The method of claim 5 , wherein forming the microelectronic substrate comprises forming the protective bump from a solder material. 7. The method of claim 1 , wherein contacting the mold chase projection contact surface to a respective microelectronic substrate interconnection bond pad comprises contacting the mold chase projection contact surface to a respective protective bump of the microelectronic substrate interconnection bond pad. 8. The method of claim 1 , wherein the at least one mold chase projection has a cross section shape having a width greater than a height. 9. The method of claim 1 , wherein attaching a microelectronic device to the plurality of microelectronic device attachment bond pads comprises forming solder interconnects between microelectronic device to the plurality of microelectronic device attachment bond pads. 10. The method of claim 1 , wherein attaching a microelectronic device to the plurality of microelectronic device attachment bond pads comprises forming conductive filled epoxy interconnects between microelectronic device to the plurality of microelectronic device attachment bond pads. 11. The method of claim 1 , wherein forming the mold chase having the mold body and the at least one projection extending from the mold body, wherein the at least one projection includes the at least one sidewall and the contact surface comprises the at least one projection extending from a first surface of the mold body, wherein the contact surface is substantially parallel to the mold body first surface. 12. The method of claim 1 , wherein the portion of the at least one mold chase projection comprises a material selected from the group consisting from butyl rubbers, ethylene rubber, and fluoropolymer elastomers. 13. The method of claim 1 , wherein disposing the mold material between the microelectronic substrate and the mold chase comprises disposing an epoxy resin mold material between the microelectronic substrate and the mold chase. 14. The method of claim 2 , wherein filling the at least one interconnection via with the conductive material to form the through-mold interconnection comprises filling the at least one interconnection via with solder to form the through-mold interconnection.

Assignees

Inventors

Classifications

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between stacked chips · CPC title

  • on active surfaces of flip-chip devices, e.g. underfills · CPC title

  • characterised by their shape or disposition · CPC title

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Frequently asked questions

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What does patent US9741692B2 cover?
Methods of fabricating a microelectronic device comprising forming a microelectronic substrate having a plurality microelectronic device attachment bond pads and at least one interconnection bond pad formed in and/or on an active surface thereof, attaching a microelectronic device to the plurality of microelectronic device attachment bond pads, forming a mold chase having a mold body and at lea…
Who is the assignee on this patent?
Karhade Omkar G, Deshpande Nitin A, Cetegen Edvin, and 4 more
What technology area does this patent fall under?
Primary CPC classification H10W74/016. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 22 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).