Integrated circuit devices and methods
US-9362291-B1 · Jun 7, 2016 · US
US9741428B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9741428-B2 |
| Application number | US-201615134640-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 21, 2016 |
| Priority date | May 13, 2011 |
| Publication date | Aug 22, 2017 |
| Grant date | Aug 22, 2017 |
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Official abstract text for this publication.
An integrated circuit can include multiple SRAM cells, each including at least two pull-up transistors, at least two pull-down transistors, and at least two pass-gate transistors, each of the transistors having a gate; at least one of the pull-up transistors, the pull-down transistors, or the pass-gate transistors having a screening region a distance below the gate and separated from the gate by a semiconductor layer, the screening region having a concentration of screening region dopants, the concentration of screening region dopants being higher than a concentration of dopants in the semiconductor layer, the screening region providing an enhanced body coefficient for the pull-down transistors and the pass-gate transistors to increase the read static noise margin for the SRAM cell when a bias voltage is applied to the screening region; and a bias voltage network operable to apply one or more bias voltages to the multiple SRAM cells.
Opening claim text (preview).
What is claimed is: 1. An integrated circuit comprising: multiple static random access memory (SRAM) cells, each SRAM cell having at least two pull-up transistors, at least two pull-down transistors, and at least two pass-gate transistors, each of the transistors having a gate; at least one of the pull-up transistors, the pull-down transistors, or the pass-gate transistors having a screening region positioned a distance below the gate and separated from the gate by a semiconductor layer, the screening region having a concentration of screening region dopants, the concentration of screening region dopants being higher than a concentration of dopants in the semiconductor layer, the screening region providing an enhanced body coefficient for the pull-down transistors and the pass-gate transistors to increase the read static noise margin for the SRAM cell when a bias voltage is applied to the screening region; and a bias voltage network operable to apply one bias voltage to the SRAM cell that is being accessed for a read operation and the other bias voltage to the other SRAM cells that are being not accessed for the read operation.
Read-write [R-W] circuits · CPC title
with means for avoiding parasitic signals · CPC title
Voltage and signal distribution in integrated semi-conductor memory access lines, e.g. word-line, bit-line, cross-over resistance, propagation delay · CPC title
Power supply arrangements {, e.g. power down, chip selection or deselection, layout of wirings or power grids, or multiple supply levels} · CPC title
using field-effect transistors only · CPC title
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