Machine for the plasma treatment of containers, comprising offset depressurization/pressurization circuits

Patent metadata

Field	Value
Publication number	US-9737909-B2
Application number	US-44605507-A
Country	US
Kind code	B2
Filing date	Oct 17, 2007
Priority date	Oct 18, 2006
Publication date	Aug 22, 2017
Grant date	Aug 22, 2017

Abstract

Machine ( 1 ) for the plasma treatment of containers ( 3 ), which comprises: a chamber ( 5 ) suitable for receiving a container ( 3 ) to be treated, a cover ( 8 ) defining a nozzle ( 9 ) in the extension of the chamber ( 5 ); a duct ( 14 ) for depressurization the container ( 3 ), which duct opens into the nozzle ( 9 ) and connects the latter to a vacuum source ( 15 ); a first valve ( 19 ) having a closed position, in which it closes off the depressurization duct ( 14 ), and an open position, in which it brings the nozzle ( 9 ) and the vacuum source ( 15 ) into communication; a duct ( 27 ) for pressurizing the container ( 3 ), separate from the depressurization duct ( 14 ), this pressurization duct ( 27 ) emerging in the nozzle ( 9 ) beyond the depressurization duct ( 14 ) and connecting the nozzle ( 9 ) to a pressure source ( 28 ); and a second valve ( 29 ) having a closed position, in which it closes off the pressurization duct ( 27 ), and an open position, in which it brings the nozzle ( 9 ) and the pressure source ( 28 ) into communication.

First claim

The invention claimed is:

1. A machine for treating containers by plasma, comprising:
an enclosure suitable for receiving a container to be treated,
a cover defining a nozzle in an extension of the enclosure where the container is held rigidly sealed to the cover during plasma treatment, in order to prevent any communication between the nozzle and the enclosure, whereby communication between an interior of the container and an exterior of the container is prevented;
a duct for the depressurization of the container, having a terminal end disposed in the cover so as to connect said nozzle to a vacuum source;
a first valve having a closed position in which the first valve closes off the depressurization duct, and an open position in which first valve brings the nozzle and the vacuum source into communication;
a duct for the pressurization of the container, distinct from the depressurization duct, having a terminal end disposed in the cover so as to connect the nozzle to a pressure source, the terminal end of the depressurization duct being disposed in a portion of the cover between the terminal end of the pressurization duct and the container, so that gas that surges between the depressurization duct and the container does not flow by the terminal end of the pressurization duct;
a second valve having a closed position in which it closes off the pressurization duct, and an open position in which it places the nozzle in communication with the pressure source, so that gas which passes through the second valve flows only out through the terminal end of the pressurization duct;
an intermediate chamber formed within a wall of the cover; and
a partition wall having holes and disposed between the intermediate chamber and the nozzle, wherein the terminal end of the depressurization duct opens into the intermediate chamber and communicates with the nozzle via the partition wall,
wherein the nozzle has a central portion and a terminal portion disposed above the central portion, so that the terminal end of the pressurization duct is connected to the terminal portion, wherein the central portion is formed by a bore that forms a post discharge zone and the terminal portion comprises an annular chamber connected to the bore of the central portion by oblique holes.

2. The machine as claimed in claim 1 , wherein the terminal portion of the nozzle is formed in the cover, configured to allow gas to flow from the terminal end of the pressurization duct into the annular chamber.

3. The machine as claimed in claim 1 , which further comprises a duct for the depressurization of the enclosure, independent of the duct for the depressurization of the container, and which connects the enclosure to a vacuum source.

4. The machine as claimed in claim 1 , which further comprises a duct for pressurization of the enclosure, independent of the duct for pressurization of the container and which connects the enclosure to a pressure source.

5. The machine as claimed in claim 4 , which further comprises a duct for the depressurization of the enclosure, independent of the duct for the depressurization of the container, and which connects to a vacuum source, wherein the depressurization duct and the pressurization duct for the enclosure open into a common channel which opens into the enclosure.

6. A plasma treatment system, comprising:
an enclosure configured to receive a container to be treated;
a cover extending from the enclosure, including a nozzle configured to introduce a precursor gas from a precursor source into the container, the container being held rigidly sealed to the cover during plasma treatment, in order to prevent any communication between the nozzle and the enclosure, such that an interior of the container cannot communicate with an exterior of the container in the enclosure;
a gas duct configured to supply the precursor gas to the nozzle;
a depressurization duct configured to depressurize the container, which connects the nozzle to a vacuum source;
a first valve having a closed position in which it closes off the depressurization duct, and an open position in which it causes the nozzle and the vacuum source to communicate;
a pressurization duct configured to pressurize the container, separate and distinct from the depressurization duct and the gas duct, which connects the pressurization duct to a pressure source, said pressurization duct connected to the nozzle at a position between the depressurization duct and the gas duct;
a second valve having a closed position in which it closes off the nozzle, and an open position in which it causes the nozzle and the pressure source to communicate so that gas which passes through the second valve flows only out through the pressurization duct;
an intermediate chamber formed within a wall of the cover; and
a partition wall having holes and disposed between the intermediate chamber and the nozzle, wherein the terminal end of the depressurization duct opens into the intermediate chamber and communicates with the nozzle via the partition wall,
wherein the nozzle has a central portion and a terminal portion disposed above the central portion, so that the terminal end of the pressurization duct is connected to the terminal portion, wherein the central portion is formed by a bore that forms a post discharge zone and the terminal portion comprises an annular chamber connected to the bore of the central portion by oblique holes.

Assignees

• Duclos Yves-Alban
• Danel Laurent
• Boutroix Naima
• Sidel Participations

Inventors

• Duclos Yves-Alban
• Danel Laurent
• Boutroix Naima

Classifications

• C23C16/50

  using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} · CPC title

• C23C16/045

  Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates · CPC title

• C23C16/4412

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• B05D1/62

  Plasma-deposition of organic layers (plasma deposition in general C23C14/00, C23C16/00) · CPC title

• B05D2201/02

  Polymeric substrate · CPC title