Processing-liquid supply apparatus and processing-liquid supply method

Patent metadata

Field	Value
Publication number	US-9732910-B2
Application number	US-201414497930-A
Country	US
Kind code	B2
Filing date	Sep 26, 2014
Priority date	Oct 2, 2013
Publication date	Aug 15, 2017
Grant date	Aug 15, 2017

Abstract

A processing-liquid supply apparatus includes a source, a discharge device, a supply channel connecting the source and discharge device, a filter device positioned in the channel to form first side having the source and second side having the discharge device, a pump device positioned in the channel, and a control device which controls suction and discharge by the pump device. The control device controls the pump device such that the liquid is discharged from the discharge device, that remaining of the liquid on the second side is suctioned to be returned to the first side and that the remaining of the liquid returned to the first side flows from the first toward second side together with refill of the liquid from the source, and the control device is set such that return amount of the liquid to the filter device is equal to or greater than amount of the discharge.

First claim

What is claimed is:

1. A processing-liquid supply apparatus, comprising:
a processing-liquid supply source of a processing liquid for processing a target substrate;
a discharge nozzle device which discharges the processing liquid to the target substrate;
a supply channel connecting the processing-liquid supply source and the discharge nozzle device such that the processing liquid is supplied to the target substrate;
a filter device which is positioned in the supply channel and forming a first side having the processing-liquid supply source and a second side having the discharge nozzle device such that the filter device removes contaminant from the processing liquid;
a pump device which is positioned in the supply channel and suctions and discharges the processing liquid in the supply channel; and
a control device built into a control computer configured to control suction and discharge by the pump device,
wherein the control device built into the control computer is configured to control the pump device such that a discharge portion of the processing liquid flowed to the second side is discharged from the discharge nozzle device, that a remaining portion of the processing liquid on the second side is suctioned to be returned to the first side and that the remaining portion of the processing liquid returned to the first side flows from the first side toward the second side together with a refill portion of the processing liquid from the processing-liquid supply source, and the control device built into the control computer is set such that a return amount of the processing liquid to the filter device is equal to or greater than an amount of the discharge portion of the processing liquid.

2. A processing-liquid supply apparatus according to claim 1 , wherein an amount of the refill portion of the processing liquid from the processing-liquid supply source corresponds to the amount of the discharge portion of the processing liquid.

3. A processing-liquid supply apparatus according to claim 1 , wherein the supply channel includes a reverse-flow channel through which the remaining portion of the processing liquid is returned to the first side of the filter device.

4. A processing-liquid supply apparatus according to claim 3 , further comprising:
a trap tank which traps and exhausts bubbles in the processing liquid and is positioned on the second side of the filter device in the reverse-flow channel.

5. A processing-liquid supply apparatus according to claim 3 , wherein the reverse-flow channel includes a first reverse-flow channel connecting a discharge side of the pump device and the first side of the filter device and a second reverse-flow channel connected to a flow channel inside the filter device between the second side and the first side of the filter device, and the control device built into the control computer is configured to control the supply channel such that the remaining portion of the processing liquid returns to the first side of the filter device via the first reverse-flow channel and the second reverse-flow channel.

6. A processing-liquid supply apparatus according to claim 1 , further comprising:
a supply pump device which is positioned on the first side of the filter device and supplies the processing liquid,
wherein the pump device is a discharge pump device which is positioned on the second side of the filter device, and the control device built into the control computer is configured to control the supply pump device and the discharge pump device such that the discharge pump device and the supply pump device return the remaining portion of the processing liquid to the first side of the filter device and supply the refill portion of the processing liquid from the processing-liquid supply source to the supply pump device.

7. A processing-liquid supply apparatus according to claim 6 , further comprising:
a reverse-flow channel positioned outside the filter device,
wherein the remaining portion of the processing liquid is returned to a suction side of the supply pump device via the reverse-flow channel.

8. A processing-liquid supply apparatus according to claim 7 , wherein the reverse-flow channel includes a third reverse-flow channel formed from a discharge side of the discharge pump device to a point between a discharge side of the supply pump device and the first side of the filter device, a flow channel inside the filter device and a fourth reverse-flow channel formed from a point between the second side of the filter device and a suction side of the discharge pump device to a suction side of the supply pump device, and the control device built into the control computer is configured to control the supply channel such that the remaining portion of the processing liquid returns to the suction side of the supply pump device via the third reverse-flow channel, the filter device and the fourth reverse-flow channel.

9. A method for supplying processing liquid, comprising:
flowing a processing liquid from a first side of a filter device to a second side of the filter device through the filter device such that contaminant in the processing liquid is removed;
discharging a discharge portion of the processing liquid flowed from the first side of the filter device to the second side of the filter device from a discharge nozzle device onto a target substrate;
returning a remaining portion of the processing liquid in the second side to the first side of the filter device; and
passing the remaining portion of the processing liquid returned to the first side of the filter device together with a refill portion of the processing liquid from a processing-liquid supply source,
wherein an amount of the processing liquid returned to the filter device is set to be equal to or greater than an amount of the discharge portion of the processing liquid discharged from the discharge nozzle device.

10. A method for supplying processing liquid according to claim 9 , wherein an amount of the refill portion of the processing liquid from the processing-liquid supply source corresponds to the amount of the discharge portion of the processing liquid.

11. A method for supplying processing liquid according to claim 9 , wherein the remaining portion of the processing liquid is returned to the first side of the filter device via a reverse-flow channel formed outside the filter device.

12. A method for supplying processing liquid according to claim 11 , wherein the reverse-flow channel includes a first reverse-flow channel connecting a discharge side of a pump device and the first side of the filter device and a second reverse-flow channel connected to a flow channel inside the filter device between the second side and the first side of the filter device, the pump device is positioned in a supply channel and suctions and discharges the processing liquid in the supply channel connecting the processing liquid-supply source and the discharge nozzle device, and the remaining portion of the processing liquid is returned to the first side of the filter device via the first reverse-flow channel and the second reverse-flow channel.

13. A method for supplying processing liquid according to claim 9 , wherein the pump device is a discharge pump device positioned on the second side of the filter device, the discharge pump device and a supply pump device positioned on the first side of the filter device return the remaining portion of the processing liquid to the first side of the filter device and supply the refill portion of the processing liquid from the processing-liquid supply source to the supply pump device.

14. A method for supplying processing liquid acco

Assignees

• Tokyo Electron Ltd

Inventors

• Takayanagi Koji
• Yoshihara Kousuke
• Terashita Yuichi
• Furusho Toshinobu
• Sasa Takashi

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• Y10T137/0318

  Processes · CPC title

• Y10T137/794

  With means for separating solid material from the fluid · CPC title

• F17D3/01 Primary

  for controlling, signalling, or supervising the conveyance of a product · CPC title

• F17C1/00 Primary

  Pressure vessels, e.g. gas cylinder, gas tank, replaceable cartridge (pressurised apparatus for purposes other than storage, see the relevant subclasses such as A62C, B05B; associated with vehicles, see the appropriate subclass of classes B60 - B64; pressure vessels in general F16J12/00 {; autoclaves B01J3/04; tank vehicles B60P3/22; railway tank wagons for carrying fluent materials B61D5/00; accumulators for supplying fluid under pressure F15B1/04; liquefied gas stoves F24C3/00}) · CPC title