Applications for nanopillar structures

US9716141B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9716141-B2
Application numberUS-201514595851-A
CountryUS
Kind codeB2
Filing dateJan 13, 2015
Priority dateJun 29, 2012
Publication dateJul 25, 2017
Grant dateJul 25, 2017

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A disclosed method of fabricating a hybrid nanopillar device includes forming a mask on a substrate and a layer of nanoclusters on the hard mask. The hard mask is then etched to transfer a pattern formed by the first layer of nanoclusters into a first region of the hard mask. A second nanocluster layer is formed on the substrate. A second region of the hard mask overlying a second region of the substrate is etched to create a second pattern in the hard mask. The substrate is then etched through the hard mask to form a first set of nanopillars in the first region of the substrate and a second set of nanopillars in the second region of the substrate. By varying the nanocluster deposition steps between the first and second layers of nanoclusters, the first and second sets of nanopillars will exhibit different characteristics.

First claim

Opening claim text (preview).

What is claimed is: 1. A nanopillar device, comprising: a substrate; a first set of nanopillars formed embedded in a first region of the substrate, wherein the first set of nanopillars has a first set of characteristics; and a second set of nanopillars formed embedded in a second region of the substrate wherein the second set of nanopillars has a second set of characteristics; wherein the first set of characteristics differs from the second set of characteristics; wherein the first set of nanopillars includes a first end physically coupled with a first insulating layer and includes a second end directly physically coupled with a non-conformal dielectric bond layer. 2. The device of claim 1 , further comprising a flexible and electrically conductive top plate formed overlying at least one of the first nanopillar region and the second nanopillar region, wherein the electrically conductive top plate is substantially perpendicular to nanopillars in the at least one of the first nanopillar region and the second nanopillar region, and wherein the nanopillar piezoresistance is used as a sensor. 3. The device of claim 1 , further comprising a wave guide conveying light to the first nanopillar region and the second nanopillar region to attenuate an incoming light signal. 4. The device of claim 1 , further comprising a wave guide conveying light to the first nanopillar region and the second nanopillar region to polarize an incoming light signal. 5. The device of claim 1 , further comprising a sound channel enabling sound to enter the first region and the second region. 6. The device of claim 1 , wherein a nanopillar in the first set of nanopillars includes a p-type doped portion and an n-type doped portion suitable for use as a light emitting diode. 7. The device of claim 1 , wherein the first set of nanopillars include a ferromagnetic material. 8. The device of claim 1 , wherein the first set of nanopillars are coated with a reactive agent to perform at least one of biological and chemical sensing. 9. A hybrid nanopillar device, comprising: a substrate, including: a first set of nanopillars formed embedded in a first region of the substrate, wherein the first set of nanopillars is substantially perpendicular to the substrate and has a first set of characteristics; and a second set of nanopillars formed embedded in a second region of the substrate, wherein the second set of nanopillars is substantially perpendicular to the substrate and has a second set of characteristics which differs from the first set of characteristics; wherein the first set of nanopillars includes a first end physically coupled with a first insulating layer and includes a second end directly physically coupled with a non-conformal dielectric bond layer; and at least one of: a first device structure to provide a signal to at least one of the first set of nanopillars and the second set of nanopillars; and a second device element to monitor a characteristic of at least one of the first set of nanopillars and the second set of nanopillars. 10. The device of claim 9 , wherein the first set of nanopillars are coated with a reactive agent to perform at least one of biological and chemical sensing. 11. A nanopillar device, comprising: a substrate; a first set of nanopillars formed embedded in a first region of the substrate, wherein the first set of nanopillars has a first average diameter; and a second set of nanopillars formed embedded in a second region of the substrate wherein the second set of nanopillars has a second average diameter; wherein the first average diameter differs from the second average diameter; wherein the first set of nanopillars includes a first end physically coupled with a first insulating layer and includes a second end directly physically coupled with a non-conformal dielectric bond layer. 12. The device of claim 11 , further comprising a flexible and electrically conductive top plate formed overlying at least one of the first nanopillar region and the second nanopillar region, wherein the electrically conductive top plate is substantially perpendicular to nanopillars in the at least one of the first nanopillar region and the second nanopillar region, and wherein a bottom surface of the electrically conductive top plate coincides with a top surface of the substrate. 13. The device of claim 11 , further comprising a wave guide conveying light to the first nanopillar region and the second nanopillar region to attenuate an incoming light signal. 14. The device of claim 11 , further comprising a wave guide conveying light to the first nanopillar region and the second nanopillar region to polarize an incoming light signal. 15. The device of claim 11 , further comprising a sound channel enabling sound to enter the first region and the second region. 16. The device of claim 11 , wherein a nanopillar in the first set of nanopillars includes a p-type doped portion and an n-type doped portion suitable for use as a light emitting diode. 17. The device of claim 11 , wherein the first set of nanopillars include a ferromagnetic material. 18. The device of claim 11 , wherein the first set of nanopillars are coated with a reactive agent to perform at least one of biological and chemical sensing.

Assignees

Inventors

Classifications

  • characterised by the process involved to create the mask, e.g. lift-off masks or sidewalls or to modify the mask · CPC title

  • Electricity · mapped topic

  • using polarisation effects {(G02B6/1226 takes precedence)} · CPC title

  • Electricity · mapped topic

  • Nanooptics, e.g. quantum optics or photonic crystals · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9716141B2 cover?
A disclosed method of fabricating a hybrid nanopillar device includes forming a mask on a substrate and a layer of nanoclusters on the hard mask. The hard mask is then etched to transfer a pattern formed by the first layer of nanoclusters into a first region of the hard mask. A second nanocluster layer is formed on the substrate. A second region of the hard mask overlying a second region of the…
Who is the assignee on this patent?
Freescale Semiconductor Inc, Nxp Usa Inc
What technology area does this patent fall under?
Primary CPC classification G01L9/06. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Jul 25 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).