Gas distribution blocker apparatus

Patent metadata

Field	Value
Publication number	US-9714465-B2
Application number	US-62757809-A
Country	US
Kind code	B2
Filing date	Nov 30, 2009
Priority date	Dec 1, 2008
Publication date	Jul 25, 2017
Grant date	Jul 25, 2017

Abstract

Embodiments of the present invention generally provide apparatus and methods for altering the flow and pressure differential of process gases supplied across a showerhead of a processing chamber to provide improved deposition uniformity across the surface of a substrate disposed therein. In one embodiment, a blocker plate is disposed between a backing plate and a showerhead. In one embodiment, the distance between the blocker plate and the showerhead is adjustable. In another embodiment, the blocker plate has a non-planar surface contour. In another embodiment, a regional blocker plate is disposed between a backing plate and a showerhead. In another embodiment, a central blocker plate and a peripheral blocker plate are disposed between a backing plate and a showerhead.

First claim

The invention claimed is:

1. A processing apparatus, comprising:
a backing plate having an aperture in fluid communication with a gas source;
a showerhead coupled to the backing plate and having a plurality of orifices disposed from an upstream side to a downstream side thereof; and
a blocker plate having gas passages sized and configured to establish a pressure gradient across the blocker plate, and disposed between the backing plate and the showerhead such that a first plenum is formed between the backing plate and the blocker plate and a second plenum is formed between the blocker plate and the showerhead, wherein the volume of the first plenum is adjustable with respect to the volume of the second plenum.

2. The processing apparatus of claim 1 , further comprising a support member and an actuator configured to adjust the contour of the blocker plate in situ.

3. The processing apparatus of claim 1 , wherein the blocker plate has an upstream and downstream side thereof, and wherein the downstream side has a convex surface contour.

4. A processing apparatus, comprising:
a backing plate having an aperture in fluid communication with a gas source;
a showerhead coupled to the backing plate and having a plurality of orifices disposed from an upstream side to a downstream side thereof; and
a blocker plate having gas passages sized and configured to establish a pressure gradient across the blocker plate, and disposed between the backing plate and the showerhead such that a first plenum is formed between the backing plate and the blocker plate and a second plenum is formed between the blocker plate and the showerhead, wherein the volume of the plenums vary across the area of the showerhead.

5. A processing apparatus, comprising:
a backing plate having an orifice disposed therethrough and in fluid communication with a gas source;
a showerhead having a plurality of gas passages disposed therethrough; and
a blocker plate having a plurality of gas passages disposed therethrough sized and configured to establish a pressure gradient across the blocker plate, and coupled to the showerhead such that a first gas passage disposed through the showerhead is aligned with a gas passage disposed through the blocker plate and a second gas passage disposed through the showerhead is blocked by the blocker plate,
wherein the blocker plate forms a first plenum with the backing plate and a second plenum with the showerhead, wherein the volume of each plenum varies across the area of the backing plate.

6. The processing apparatus of claim 4 , wherein the blocker plate has a bottom that has a non-planar downstream surface.

7. The processing apparatus of claim 4 , wherein the blocker plate has a gas passage disposed therethrough that is non-perpendicular with respect to a top surface of the showerhead.

8. The processing apparatus of claim 4 , further comprising a support member and an actuator configured to adjust the contour of the blocker plate in situ.

9. The processing apparatus of claim 4 , wherein the blocker plate has a plurality of gas passages disposed between an upstream and downstream side thereof, and wherein the downstream side has a convex surface contour.

10. The processing apparatus of claim 4 , wherein the blocker plate is positioned in a central region of the showerhead.

11. The processing apparatus of claim 5 , wherein the blocker plate has a bottom that has a non-planar downstream surface.

12. The processing apparatus of claim 5 , wherein the blocker plate has at least one gas passage disposed therethrough that is non-perpendicular with respect to a top surface of the showerhead.

13. The processing apparatus of claim 5 , further comprising a support member and an actuator configured to adjust the contour of the blocker plate in situ.

14. The processing apparatus of claim 5 , wherein the blocker plate has a convex surface contour.

15. The processing apparatus of claim 5 , wherein the blocker plate is positioned in a central region of the showerhead.

16. The processing apparatus of claim 1 , wherein the blocker plate has a bottom that has a non-planar downstream surface.

17. The processing apparatus of claim 1 , wherein the blocker plate has a gas passage disposed therethrough that is non-perpendicular with respect to a top surface of the showerhead.

18. The processing apparatus of claim 1 , wherein the blocker plate is positioned in a central region of the showerhead.

Assignees

• Tsuei Lun
• Tso Alan
• Cho Tom K
• Shieh Brian Sy-Yuan
• Applied Materials Inc

Inventors

• Tsuei Lun
• Tso Alan
• Cho Tom K
• Shieh Brian Sy-Yuan

Classifications

• Y02P70/521

  Cross-Sectional Technologies · mapped topic

• Y02E10/545

  Microcrystalline silicon PV cells · CPC title

• C23C16/45559

  Diffusion of reactive gas to substrate · CPC title

• H01L31/1824

  Electricity · mapped topic

• H01L31/076

  Electricity · mapped topic