Locally-trap-characteristic-enhanced charge trap layer for three-dimensional memory structures

Patent metadata

Field	Value
Publication number	US-9711530-B1
Application number	US-201615158954-A
Country	US
Kind code	B1
Filing date	May 19, 2016
Priority date	Mar 25, 2016
Publication date	Jul 18, 2017
Grant date	Jul 18, 2017

Abstract

Threshold voltage shift due to programming of a neighboring memory element can be reduced or suppressed by forming a compositionally modulated charge storage layer in a three-dimensional memory device. The compositionally modulated charge storage layer can be formed by providing an oxygen-containing dielectric silicon compound layer outside a tunneling dielectric layer, and subsequently nitriding portions of the oxygen-containing dielectric silicon compound layer only at levels of the control gate electrodes. An alternating stack of sacrificial material layers and insulating layers can be employed to form a memory stack structure therethrough. After removal of the sacrificial material layers, a nitridation process can be performed to convert physically exposed portions of the oxygen-containing dielectric silicon compound layer into silicon nitride portions, which are vertically spaced from one another by remaining oxygen-containing dielectric silicon compound portions that have inferior charge trapping property to the silicon nitride portions.

First claim

What is claimed is:

1. A three-dimensional memory device, comprising:
an alternating stack of insulating layers and electrically conductive layers located over a substrate; and
a memory stack structure extending through the alternating stack and comprising a compositionally modulated charge storage layer, a tunneling dielectric, and a vertical semiconductor channel, wherein the compositionally modulated charge storage layer comprises a vertically alternating stack of silicon nitride portions and silicon oxynitride portions.

2. The three-dimensional memory device of claim 1 , wherein each silicon nitride portion of the compositionally modulated charge storage layer is a vertical portion of a continuous silicon nitride layer that extends from a bottommost level of the electrically conductive layers to a topmost level of the electrically conductive layers.

3. The three-dimensional memory device of claim 2 , wherein horizontal portions of the continuous silicon nitride layer have a lesser thickness than the silicon nitride portions of the compositionally modulated charge storage layer.

4. The three-dimensional memory device of claim 2 , further comprising at least one backside blocking dielectric layer located between the continuous silicon nitride layer and each of the electrically conductive layers.

5. The three-dimensional memory device of claim 4 , wherein the at least one backside blocking dielectric layer comprises a stack of a continuous silicon oxide layer and a continuous dielectric metal oxide layer.

6. The three-dimensional memory device of claim 2 , wherein:
the insulating layers comprise silicon oxide; and
each horizontal interface region between horizontal portions of the continuous silicon nitride layer and the insulating layers has a vertical nitrogen concentration gradient.

7. The three-dimensional memory device of claim 2 , further comprising an epitaxial channel portion comprising a single crystalline semiconductor material that is epitaxially aligned to another single crystalline semiconductor material in the substrate, wherein a portion of the continuous silicon nitride layer contacts a sidewall of the epitaxial channel portion.

8. The three-dimensional memory device of claim 1 , wherein the tunneling dielectric contacts substantially vertical inner sidewalls of the silicon oxynitride portions and inner sidewalls of the silicon nitride portions.

9. The three-dimensional memory device of claim 1 , wherein the silicon oxynitride portions are discrete structures that are vertically spaced apart among one another by the silicon nitride portions and located at each level of the insulating layers.

10. The three-dimensional memory device of claim 9 , further comprising annular silicon oxide portions laterally surrounding respective silicon oxynitride portions and laterally surrounded by respective insulating layers.

11. The three-dimensional memory device of claim 1 , wherein:
the silicon nitride portions are located at each level of the electrically conductive layers; and
the silicon oxynitride portions are located at each level of the insulating layers.

12. The three-dimensional memory device of claim 1 , wherein inner sidewalls of the silicon oxide portions are vertically coincident with inner sidewalls of the silicon oxynitride portions.

13. The three-dimensional memory device of claim 1 , wherein:
at least one bottommost silicon oxynitride portion among the silicon oxynitride portions contact an outer sidewall of the vertical semiconductor channel; and
all silicon oxynitride portions except the at least one bottommost silicon oxynitride portion is laterally spaced from the vertical semiconductor channel by the tunneling dielectric.

14. The three-dimensional memory device of claim 1 , wherein:
the monolithic three-dimensional memory structure comprises a monolithic three-dimensional NAND memory device;
the electrically conductive layers comprise, or are electrically connected to, a respective word line of the monolithic three-dimensional NAND memory device;
the substrate comprises a silicon substrate;
the monolithic three-dimensional NAND memory device comprises an array of monolithic three-dimensional NAND strings over the silicon substrate;
at least one memory cell in a first device level of the array of monolithic three-dimensional NAND strings is located over another memory cell in a second device level of the array of monolithic three-dimensional NAND strings;
the silicon substrate contains an integrated circuit comprising a driver circuit for the memory device located thereon; and
the array of monolithic three-dimensional NAND strings comprises:
a plurality of semiconductor channels, wherein at least one end portion of each of the plurality of semiconductor channels extends substantially perpendicular to a top surface of the substrate;
a plurality of charge storage elements, each charge storage element located adjacent to a respective one of the plurality of semiconductor channels; and
a plurality of control gate electrodes having a strip shape extending substantially parallel to the top surface of the substrate, the plurality of control gate electrodes comprise at least a first control gate electrode located in the first device level and a second control gate electrode located in the second device level.

Assignees

• Sandisk Technologies Llc

Inventors

• IKAWA Yusuke
• Sakakibara Kiyohiko
• Takii Eisuke

Classifications

• H10P14/6322

  Formation by thermal treatments (formation by plasma treatment H10P14/6319) · CPC title

• H10P14/6319

  Formation by plasma treatments, e.g. plasma oxidation of the substrate · CPC title

• H10P14/69433

  the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz · CPC title

• H10P14/6316

  Formation by nitridation, e.g. nitridation of the substrate · CPC title

• H10P14/3458

  Monocrystalline · CPC title