Three dimensional NAND device with birds beak containing floating gates and method of making thereof

US9252151B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9252151-B2
Application numberUS-201414183152-A
CountryUS
Kind codeB2
Filing dateFeb 18, 2014
Priority dateJul 8, 2013
Publication dateFeb 2, 2016
Grant dateFeb 2, 2016

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method of making a monolithic three dimensional NAND string including forming a stack of alternating layers of a first material and a second material over a substrate. The first material comprises an electrically insulating material and the second material comprises a semiconductor or conductor material. The method also includes etching the stack to form a front side opening in the stack, forming a blocking dielectric layer over the stack of alternating layers of a first material and a second material exposed in the front side opening, forming a semiconductor or metal charge storage layer over the blocking dielectric, forming a tunnel dielectric layer over the charge storage layer, forming a semiconductor channel layer over the tunnel dielectric layer, etching the stack to form a back side opening in the stack, removing at least a portion of the first material layers and portions of the blocking dielectric layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of making a monolithic three dimensional NAND string, comprising: forming a stack of alternating layers of a first material and a second material over a substrate, wherein the first material comprises an electrically insulating material and wherein the second material comprises a semiconductor or conductor material; etching the stack to form a front side opening in the stack; forming a blocking dielectric layer over the stack of alternating laye…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9252151B2 cover?
A method of making a monolithic three dimensional NAND string including forming a stack of alternating layers of a first material and a second material over a substrate. The first material comprises an electrically insulating material and the second material comprises a semiconductor or conductor material. The method also includes etching the stack to form a front side opening in the stack, for…
Who is the assignee on this patent?
Sandisk Technologies Inc
What technology area does this patent fall under?
Primary CPC classification H10D88/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 02 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).