System for fast ions generation and a method thereof

Patent metadata

Field	Value
Publication number	US-9711319-B2
Application number	US-201615237681-A
Country	US
Kind code	B2
Filing date	Aug 16, 2016
Priority date	Dec 18, 2008
Publication date	Jul 18, 2017
Grant date	Jul 18, 2017

Abstract

The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.

First claim

The invention claimed is:

1. A system for generating a beam of fast ions, the system comprising;
a sapphire substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and
a beam unit configured to receive a high power coherent electromagnetic radiation beam and to focus it onto the patterned surface of a target substrate to cause interaction between the coherent electromagnetic radiation beam and the substrate supporting creation of a flow of fast ions; and
wherein an angle of polarization direction of the high power coherent electromagnetic radiation beam is controlled relative to the orientation direction of filaments of an oriented patterned target (OPT), such that by rotating polarization direction of the high power coherent electromagnetic radiation beam relative to direction of filaments of OPT orientation, energy of fast ions is decreased; and
wherein the sapphire substrate is coupled to a cooling unit including a heat exchanger block coupled to a liquid nitrogen circulation system that pumps liquid nitrogen through the heat exchanger block to remove heat from the sapphire substrate.

2. A system for generating a beam of fast ions, the system comprising;
a sapphire substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and
a beam unit configured to receive a high power coherent electromagnetic radiation beam and to focus it onto the patterned surface of a target substrate to cause interaction between the coherent electromagnetic radiation beam and the substrate supporting creation of a flow of fast ions; and
wherein the sapphire substrate is coupled to a cooling unit including a heat exchanger block coupled to a liquid nitrogen circulation system that pumps liquid nitrogen through the heat exchanger block to remove heat from the sapphire substrate,
wherein the sapphire substrate is sandwiched between bias electrodes connected to a power supply.

3. The system of claim 1 wherein a thickness of the sapphire substrate is 1 mm.

4. A system for generating a beam of fast ions, the system comprising;
a sapphire substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and
a beam unit configured to receive a high power coherent electromagnetic radiation beam and to focus it onto the patterned surface of a target substrate to cause interaction between the coherent electromagnetic radiation beam and the substrate supporting creation of a flow of fast ions; and
a power supply configured to apply a potential voltage between electrodes that generates a biasing electric field in the sapphire substrate, the electric field being parallel to direction of nanoscale pattern features,
wherein the sapphire substrate is coupled to a cooling unit including a heat exchanger block coupled to a liquid nitrogen circulation system that pumps liquid nitrogen through the heat exchanger block to remove heat from the sapphire substrate.

5. The system of claim 1 wherein the high power coherent electromagnetic radiation beam is polarized and wherein polarization direction of the high power coherent electromagnetic radiation beam is substantially parallel to direction of orientation of filaments of oriented patterned targets (OPT) features.

6. The system of claim 1 wherein the nanoscale pattern features oriented substantially uniformly along a common axis comprise elongated clusters with characteristic size of 0.01-0.1 micron.

7. The system of claim 1 wherein the sapphire substrate is sandwiched between bias electrodes connected to a power supply.

Assignees

• Yissum Res Dev Company Of Hebrew Univ Of Jerusalem Ltd
• Hil Applied Medical Ltd
• Yissum Res Dev Co

Inventors

• Zigler Arie
• Eisenmann Shmuel
• Palchan Tala
• Brink-Danan Sagi
• Gad Nahum Eyal

Classifications

• H01J27/24 Primary

  using photo-ionisation, e.g. using laser beam · CPC title