Apparatus for generating charged particles

US10056221B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10056221-B2
Application numberUS-201715795754-A
CountryUS
Kind codeB2
Filing dateOct 27, 2017
Priority dateNov 15, 2016
Publication dateAug 21, 2018
Grant dateAug 21, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Disclosed is an apparatus for generating charged particles. The apparatus comprises a light source that emits a laser, a target layer that receives the laser to generate charged particles, and a focusing structure that is between the light source and the target source and focuses the laser. The focusing structure comprises solid layers and pore sections alternately and repeatedly disposed along a first direction parallel to a top surface of the target layer. Each of the pore sections comprises a porous layer.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for generating charged particles, comprising: a light source that emits a laser; a target layer that receives the laser to generate charged particles; and a focusing structure that is between the light source and the target layer and focuses the laser, wherein the focusing structure comprises solid layers and pore sections alternately and repeatedly disposed along a first direction parallel to a top surface of the target layer, each of the pore sections comprising a porous layer. 2. The apparatus of claim 1 , wherein the focusing structure transforms into a plasma layer when the laser is irradiated, wherein the plasma layer comprises free electrons that are distributed to have an electron density reaching a vicinity of a critical electron density of the plasma layer. 3. The apparatus of claim 2 , wherein the electron density reaching the vicinity of the critical electron density is less than and 0.7 times greater than the critical electron density, or is greater than and 3 times less than the critical electron density. 4. The apparatus of claim 1 , wherein each of the pore sections comprises pores and a boundary layer surrounding the pores. 5. The apparatus of claim 4 , wherein the boundary layer has a uniform distribution in each of the pore sections. 6. The apparatus of claim 4 , wherein the boundary layer has a mesh shape. 7. The apparatus of claim 6 , wherein the focusing structure is obtained from a wing of a swallowtail butterfly. 8. The apparatus of claim 4 , wherein the boundary layer comprises first sub-boundary layers and second sub-boundary layers protruding from a sidewall and an opposing sidewall, respectively, of each of the solid layers, the first sub-boundary layers being arranged in a third direction perpendicular to the top surface of the target layer, the second sub-boundary layers being arranged in the third direction, and each of the second sub-boundary layers being between the first sub-boundary layers. 9. The apparatus of claim 8 , wherein the first and second sub-boundary layers extend along a second direction that is parallel to the top surface of the target layer and crosses the first direction. 10. The apparatus of claim 8 , wherein the focusing structure is obtained from a wing of a morpho butterfly. 11. The apparatus of claim 1 , further comprising a controller that controls a distance between the light source and the focusing structure, wherein the controller places a top surface of the focusing structure in position within a Rayleigh range around a focal point of the laser. 12. The apparatus of claim 1 , further comprising a matching structure between the focusing structure and the target layer, wherein the matching structure has a refractive index between those of the focusing structure and the target layer.

Assignees

Inventors

Classifications

  • Ion sources, e.g. ECR, duoplasmatron, PIG, laser sources · CPC title

  • Ion sources; Ion guns {(for examination or processing discharge tubes H01J37/08; ion sources, ion guns for particle spectrometer or separator tubes H01J49/10; ion propulsion F03H1/00)} · CPC title

  • H01J27/24Primary

    using photo-ionisation, e.g. using laser beam · CPC title

  • Ion sources; Ion guns · CPC title

  • H05H1/54Primary

    Plasma accelerators · CPC title

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What does patent US10056221B2 cover?
Disclosed is an apparatus for generating charged particles. The apparatus comprises a light source that emits a laser, a target layer that receives the laser to generate charged particles, and a focusing structure that is between the light source and the target source and focuses the laser. The focusing structure comprises solid layers and pore sections alternately and repeatedly disposed along…
Who is the assignee on this patent?
Electronics & Telecommunications Res Inst, Electronics & Telecommunications Res Institute
What technology area does this patent fall under?
Primary CPC classification H01J27/24. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 21 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).