Electromagnetic wave shielding structure and method for fabricating the same
US-9236169-B2 · Jan 12, 2016 · US
US9707706B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9707706-B2 |
| Application number | US-201514627913-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 20, 2015 |
| Priority date | Feb 25, 2014 |
| Publication date | Jul 18, 2017 |
| Grant date | Jul 18, 2017 |
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A flexible substrate embedded with wires includes a flexible substrate constituted by a polymer material, and a continuous wire pattern containing a plurality of pores embedded in the flexible substrate, wherein the polymer material fills the pores. A method for fabricating a flexible substrate embedded with wires providing a carrier; forming a continuous wire pattern on the carrier, the continuous wire pattern containing a plurality of pores; covering a polymer material over the continuous wire pattern and the carrier and to fill into the pores; and separating the polymer material and the carrier to form a flexible substrate embedded with the continuous wire pattern” where the only change is the addition of wires.
Opening claim text (preview).
What is claimed is: 1. A flexible substrate embedded with wires, comprising: a flexible substrate constituted by a polymer material; and a continuous wire pattern containing a plurality of pores embedded in the flexible substrate, wherein the polymer material fills the pores. 2. The flexible substrate embedded with wires as claimed in claim 1 , wherein the polymer material comprises polyimide (PI) or polyvinylidene fluoride (PVDF). 3. The flexible substrate embedded with wires as claimed in claim 1 , wherein the wire pattern comprises silver, copper, nickel or an alloy thereof. 4. The flexible substrate embedded with wires as claimed in claim 1 , wherein the wire pattern has a resistivity ranging from 1.6×10 −6 Ω·cm to 10×10 −6 Ω·cm. 5. The flexible substrate embedded with wires as claimed in claim 1 , wherein the pore has a size ranging from 10 nm to 100 μm. 6. The flexible substrate embedded with wires as claimed in claim 1 , wherein the continuous wire pattern is embedded in an area inside the flexible substrate. 7. The flexible substrate embedded with wires as claimed in claim 1 , wherein the continuous wire pattern is embedded in an area near a surface of the flexible substrate. 8. A method for fabricating a flexible substrate embedded with wires, comprising: providing a carrier; forming a continuous wire pattern on the carrier, wherein the continuous wire pattern contains a plurality of pores; covering a polymer material over the continuous wire pattern and the carrier and to fill into the pores; and separating the polymer material and the carrier to form a flexible substrate embedded with the continuous wire pattern. 9. The method for fabricating a flexible substrate embedded with wires as claimed in claim 8 , wherein the carrier comprises glass or metal. 10. The method for fabricating a flexible substrate embedded with wires as claimed in claim 8 , further comprising performing a surface treatment process on the flexible substrate embedded with the continuous wire pattern. 11. The method for fabricating a flexible substrate embedded with wires as claimed in claim 8 , wherein the step of forming a continuous wire pattern on the carrier comprises: providing a metal glue with a solid content ranging from 80% to 85%; forming a continuous pattern of the metal glue on the carrier; and performing a sintering process on the carrier, wherein the sintering process has a sintering temperature ranging from 300° C. to 350° C. and a sintering time ranging from 30 min to 40 min. 12. The method for fabricating a flexible substrate embedded with wires as claimed in claim 8 , wherein the step of covering a polymer material over the continuous wire pattern and the carrier comprises: providing a polyvinylidene fluoride (PVDF) with a solid content ranging from 5% to 30%; forming a polyvinylidene fluoride (PVDF) layer on the continuous wire pattern and the carrier; and performing a baking process on the carrier, wherein the baking process has a baking temperature ranging from 50° C. to 180° C. and a baking time ranging from 10 min to 30 min. 13. The method for fabricating a flexible substrate embedded with wires as claimed in claim 8 , wherein the step of covering a polymer material over the continuous wire pattern and the carrier comprises: providing a polyimide (PI) with a solid content ranging from 5% to 40%; forming a polyimide (PI) layer on the continuous wire pattern and the carrier; and performing a baking process on the carrier, wherein the baking process has a baking temperature ranging from 50° C. to 210° C. and a baking time ranging from 30 min to 60 min.
PVDF, i.e. polyvinylidene fluoride · CPC title
Anchoring, i.e. one structure gripping into another · CPC title
Sintering, i.e. fusing of metal particles to achieve or improve electrical conductivity · CPC title
using a prefabricated paste pattern, ink pattern or powder pattern · CPC title
PI, i.e. polyimides or derivatives thereof · CPC title
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