Efem

Patent metadata

Field	Value
Publication number	US-9704727-B2
Application number	US-201414569293-A
Country	US
Kind code	B2
Filing date	Dec 12, 2014
Priority date	Dec 13, 2013
Publication date	Jul 11, 2017
Grant date	Jul 11, 2017

Abstract

An EFEM includes a housing 3 that constitutes a wafer transport chamber 9 that is substantially closed by connecting load ports 4 to an opening 31 a provided on a wall 31 , and connecting a processing apparatus 6 ; a wafer transport apparatus 2 , and transports a wafer between the processing apparatus 6 and the FOUPs 7 mounted on the load ports 4 ; a gas delivery port 11 ; a gas suction port 12 ; a gas feedback path 10 ; and a FFU 13 that includes a filter 13 b that is provided in the gas delivery port 11 , and eliminates particles contained in the delivered gas, wherein the gas in the wafer transport chamber 9 is circulated by generating a downward gasflow in the wafer transport chamber 9 and feeding back the gas through the gas feedback path 10.

First claim

What is claimed is:

1. An EFEM comprising:
a load port;
a load lock chamber including a processing apparatus;
a wafer transport chamber having a space inside a housing, the wafer transport chamber communicating with the load port through a first opening provided on a first side wall of the housing, and the wafer transport chamber communicating with the load lock chamber through a second opening provided on a second side wall of the housing;
a wafer transport apparatus provided in the wafer transport chamber, the wafer transport apparatus having a base part having a driving mechanism, the base part provided on the first wall, the base part moving inside the wafer transport chamber, the wafer transport apparatus transporting a wafer between a FOUP mounted on the load port and the load lock chamber;
a gas delivery port provided in an upper part of the wafer transport chamber, the gas delivery port delivering gas to the wafer transport chamber;
a gas suction port provided in a lower part inside the wafer transport chamber, the gas suction port sucking the gas in the wafer transport chamber;
a gas feedback path provided in the housing, the gas feedback path feeding back the gas taken in through the gas suction port to the gas delivery port; and
a filter provided in the gas delivery port, the filter eliminating particles included in the gas,
wherein the gas feedback path is provided in an area inside the housing, the area located between the second side wall having the second opening and a partition member provided inside the second wall, the area located outside an operating area of the wafer transport apparatus, and the area separated from the wafer transport chamber by the partition member,
wherein the gas in the wafer transport chamber is circulated by generating a downward gasflow in the wafer transport chamber and feeding back the gas through the gas feedback path.

2. The EFEM according to claim 1 , wherein the housing includes columns that supports the first and second walls of the housing from the inside of the housing, and a part of the gas feedback path is formed by using the second wall, the column and the partition member.

3. The EFEM according to claim 2 , wherein:
the first opening that connects the load port and the second opening that connects the load lock chamber of the processing apparatus are provided at opposite positions in the housing, and
the gas feedback path is configured to continue to the gas delivery port from the gas suction port via both sides of the second opening that connects the load lock chamber of the processing apparatus.

4. The EFEM according to claim 3 , wherein a first blowing unit is connected to the gas delivery port, a second blowing unit is connected to the gas suction port, the first blowing unit sends gas to the wafer transport chamber through the gas delivery port, and the second blowing unit sucks the gas in the wafer transport chamber through the gas suction port.

5. The EFEM according to claim 4 , further comprising a gas supply unit that supplies gas to the wafer transport chamber, and a gas discharge unit for discharging gas from the wafer transport chamber.

6. The EFEM according to claim 3 , further comprising a gas supply unit that supplies gas to the wafer transport chamber, and a gas discharge unit for discharging gas from the wafer transport chamber.

7. The EFEM according to claim 3 , wherein a chemical filter is provided in the gas suction port, and the gas in the wafer transport chamber flows into the gas feedback path through the chemical filter.

8. The EFEM according to claim 2 , wherein a first blowing unit is connected to the gas delivery port, a second blowing unit is connected to the gas suction port, the first blowing unit sends gas to the wafer transport chamber through the gas delivery port, and the second blowing unit sucks the gas in the wafer transport chamber through the gas suction port.

9. The EFEM according to claim 8 , further comprising a gas supply unit that supplies gas to the wafer transport chamber, and a gas discharge unit for discharging gas from the wafer transport chamber.

10. The EFEM according to claim 2 , further comprising a gas supply unit that supplies gas to the wafer transport chamber, and a gas discharge unit for discharging gas from the wafer transport chamber.

11. The EFEM according to claim 2 , wherein a chemical filter is provided in the gas suction port, and the gas in the wafer transport chamber flows into the gas feedback path through the chemical filter.

12. The EFEM according to claim 1 , wherein a first blowing unit is connected to the gas delivery port, a second blowing unit is connected to the gas suction port, the first blowing unit sends gas to the wafer transport chamber through the gas delivery port, and the second blowing unit sucks the gas in the wafer transport chamber through the gas suction port.

13. The EFEM according to claim 12 , further comprising a gas supply unit that supplies gas to the wafer transport chamber, and a gas discharge unit for discharging gas from the wafer transport chamber.

14. The EFEM according to claim 1 , further comprising a gas supply unit that supplies gas to the wafer transport chamber, and a gas discharge unit for discharging gas from the wafer transport chamber.

15. The EFEM according to claim 1 , wherein a chemical filter is provided in the gas suction port, and the gas in the wafer transport chamber flows into the gas feedback path through the chemical filter.

16. The EFEM according to claim 1 , wherein the gas is an inert gas.

17. The EFEM according to claim 1 , wherein the wafer transport apparatus is provided in the wafer transport chamber and directly below the gas delivery port.

Assignees

• Sinfonia Technology Co Ltd

Inventors

• Segawa Mikio
• Taniyama Yasushi
• Natsume Mitsuo
• Suzuki Atsushi
• Kawai Toshihiro
• Sato Kunihiko

Classifications

• H10P72/3411

  involving loading and unloading of wafers · CPC title

• H10P72/3406

  involving removal of lid, door or cover · CPC title

• H10P72/3402

  Mechanical parts of transfer devices · CPC title

• H10P72/0436

  mainly by radiation · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title