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US9105673B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9105673-B2
Application numberUS-12339108-A
CountryUS
Kind codeB2
Filing dateMay 19, 2008
Priority dateMay 9, 2007
Publication dateAug 11, 2015
Grant dateAug 11, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate processing system including a processing section arranged to hold a processing atmosphere therein, a carrier having a shell forming an internal volume for holding at least one substrate for transport to the processing section, the shell being configured to allow the internal volume to be pumped down to a predetermined vacuum pressure that is different than an exterior atmosphere outside the substrate processing system, and a load port communicably connected to the processing section to isolate the processing atmosphere from the exterior atmosphere, the load port being configured to couple with the carrier to pump down the internal volume of the carrier and to communicably connect the carrier to the processing section, for loading the substrate into the processing section through the load port.

First claim

Opening claim text (preview).

What is claimed is: 1. A substrate processing system comprising: a processing section arranged to hold a processing vacuum therein, the processing vacuum corresponding to at least one vacuum process from the group of material deposition, ion implantation, etching and lithography; a carrier having a shell forming an internal volume for holding at least one substrate for transport to the processing section, the shell having first and second carrier registration features and being…

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Frequently asked questions

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What does patent US9105673B2 cover?
A substrate processing system including a processing section arranged to hold a processing atmosphere therein, a carrier having a shell forming an internal volume for holding at least one substrate for transport to the processing section, the shell being configured to allow the internal volume to be pumped down to a predetermined vacuum pressure that is different than an exterior atmosphere out…
Who is the assignee on this patent?
Babbs Daniel, Fosnight William, May Robert C, and 2 more
What technology area does this patent fall under?
Primary CPC classification H10P72/1916. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 11 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).