Tunnel insulation layer structures, methods of manufacturing the same, and vertical memory devices including the same

Patent metadata

Field	Value
Publication number	US-9698233-B2
Application number	US-201514644408-A
Country	US
Kind code	B2
Filing date	Mar 11, 2015
Priority date	Mar 31, 2014
Publication date	Jul 4, 2017
Grant date	Jul 4, 2017

Abstract

Tunnel insulation layer structures and methods of manufacturing the same are disclosed. The tunnel insulation layer structures may include a first tunnel insulation layer, a second tunnel insulation layer, a third tunnel insulation layer, a fourth tunnel insulation layer and a fifth tunnel insulation layer. The first tunnel insulation layer on a substrate has a first band gap energy. The second tunnel insulation layer on the first tunnel insulation layer has a second band gap energy which is lower than the first band gap energy. The third tunnel insulation layer on the second tunnel insulation layer has a third band gap energy which is higher than the second band gap energy. The fourth tunnel insulation layer on the third tunnel insulation layer has a fourth band gap energy which is lower than the third band gap energy. The fifth tunnel insulation layer on the fourth tunnel insulation layer has a fifth band gap energy which is higher than the fourth band gap energy.

First claim

What is claimed is:

1. A tunnel insulation layer structure, comprising:
a first tunnel insulation layer on a substrate, the first tunnel insulation layer having a first band gap energy;
a second tunnel insulation layer on the first tunnel insulation layer, the second tunnel insulation layer having a second band gap energy which is lower than the first band gap energy;
a third tunnel insulation layer on the second tunnel insulation layer, the third tunnel insulation layer having a third band gap energy which is higher than the second band gap energy;
a fourth tunnel insulation layer on the third tunnel insulation layer, the fourth tunnel insulation layer having a fourth band gap energy which is lower than the third band gap energy; and
a fifth tunnel insulation layer on the fourth tunnel insulation layer, the fifth tunnel insulation layer having a fifth band gap energy which is higher than the fourth band gap energy.

2. The tunnel insulation layer structure of claim 1 ,
wherein the first tunnel insulation layer, the third tunnel insulation layer and the fifth tunnel insulation layer comprise silicon oxide,
and wherein the second tunnel insulation layer and the fourth tunnel insulation layer comprise silicon oxy-nitride.

3. The tunnel insulation layer structure of claim 2 , wherein nitrogen concentrations of the second tunnel insulation layer and the fourth tunnel insulation layer are higher than about 20 at %.

4. The tunnel insulation layer structure of claim 1 ,
wherein the first tunnel insulation layer comprises silicon oxide,
wherein the second tunnel insulation layer, the third tunnel insulation layer, the fourth tunnel insulation layer and the fifth tunnel insulation layer comprise silicon oxy-nitride,
and wherein nitrogen concentrations of the second tunnel insulation layer and the fourth tunnel insulation layer are higher than nitrogen concentrations of the third tunnel insulation layer and the fifth tunnel insulation layer.

5. The tunnel insulation layer structure of claim 4 ,
wherein the nitrogen concentrations of the second tunnel insulation layer and the fourth tunnel insulation layer are higher than about 20 at %,
and wherein the nitrogen concentrations of the third tunnel insulation layer and the fifth tunnel insulation layer are lower than about 10 at %.

6. The tunnel insulation layer structure of claim 1 , wherein a thickness of the third tunnel insulation layer is smaller than a thickness of the second tunnel insulation layer.

7. The tunnel insulation layer structure of claim 1 , wherein a thickness of the second tunnel insulation layer is smaller than a thickness of the fourth tunnel insulation layer.

8. The tunnel insulation layer structure of claim 1 , further comprising a sixth tunnel insulation layer between the fourth tunnel insulation layer and the fifth tunnel insulation layer,
wherein the sixth tunnel insulation layer has a sixth band gap energy which is higher than the fourth band gap energy and lower than the fifth band gap energy.

9. A method of manufacturing a tunnel insulation layer structure, the method comprising:
forming a first tunnel insulation layer on a substrate, the first tunnel insulation layer having a first band gap energy;
forming a second tunnel insulation layer on the first tunnel insulation layer, the second tunnel insulation layer having a second band gap energy which is lower than the first band gap energy;
forming a third tunnel insulation layer on the second tunnel insulation layer, the third tunnel insulation layer having a third band gap energy which is higher than the second band gap energy;
forming a fourth tunnel insulation layer on the third tunnel insulation layer, the fourth tunnel insulation layer having a fourth band gap energy which is lower than the third band gap energy; and
forming a fifth tunnel insulation layer on the fourth tunnel insulation layer, the fifth tunnel insulation layer having a fifth band gap energy which is higher than the fourth band gap energy.

10. The method of claim 9 ,
wherein forming the second tunnel insulation layer comprises depositing a silicon oxy-nitride layer,
and wherein forming the fourth tunnel insulation layer comprises depositing a silicon oxy-nitride layer.

11. The method of claim 10 , wherein the second tunnel insulation layer has a thickness of about 10 Å to about 30 Å.

12. The method of claim 10 , wherein forming the third tunnel insulation layer comprises partially oxidizing the second tunnel insulation layer.

13. The method of claim 12 , wherein partially oxidizing the second tunnel insulation layer comprises partially oxidizing the second tunnel insulation layer using O 2 gas, H 2 gas and O 2 gas, N 2 O gas or NO gas.

14. The method of claim 12 , wherein forming the third tunnel insulation layer comprises removing shallow trap site in the second tunnel insulation layer.

15. The method of claim 9 , wherein the third tunnel insulation layer has a thickness below about 10 Å.

16. The method of claim 10 , wherein forming the fifth tunnel insulation layer comprises partially oxidizing the fourth tunnel insulation layer.

17. The method of claim 16 , wherein partially oxidizing the fourth tunnel insulation layer comprises partially oxidizing the fourth tunnel insulation layer using N 2 O gas, O 2 gas or NO gas.

18. A vertical memory device, comprising:
a channel extending in a first direction substantially perpendicular to a top surface of a substrate;
a charge storage layer structure including a tunnel insulation layer structure, a charge storage layer pattern and a blocking layer pattern which are sequentially stacked on a sidewall of the channel in a second direction substantially parallel to the top surface of the substrate; and
a plurality of gate electrodes arranged on a sidewall of the charge storage layer structure and spaced apart from each other in the first direction,
wherein the tunnel insulation layer structure comprises first, second, third, fourth and fifth tunnel insulation layers sequentially stacked on the sidewall of the channel in the second direction, and
wherein the first tunnel insulation layer has a first band gap energy, the second tunnel insulation layer has a second band gap energy that is lower than the first band gap energy, and the third tunnel insulation layer has a third band gap energy that is higher than the second band gap energy.

19. The vertical memory device of claim 18 , wherein each of the first, second, third, fourth and fifth tunnel insulation layers has a nitrogen concentration which is different from nitrogen concentrations of adjacent tunnel insulation layers.

20. The vertical memory device of claim 18 , wherein the fourth tunnel insulation layer has a fourth band gap energy that is lower than the third band gap energy, and the fifth tunnel insulation layer has a fifth band gap energy that is higher than the fourth band gap energy.

Assignees

• Choi Eun-Yeoung
• Noh Young-Jin
• Kim Bi-O
• Park Kwang-Min
• Ahn Jae-Young
• Yun Ju-Mi
• Choi Jae-Ho
• Hwang Ki-Hyun
• Samsung Electronics Co Ltd

Inventors

• Choi Eun-Yeoung
• Noh Young-Jin
• Kim Bi-O
• Park Kwang-Min
• Ahn Jae-Young
• Yun Ju-Mi
• Choi Jae-Ho
• Hwang Ki-Hyun

Classifications

• H01L21/28282

  Electricity · mapped topic

• H01L27/11582

  Electricity · mapped topic

• H01L29/518

  Electricity · mapped topic

• H01L29/513 Primary

  Electricity · mapped topic

• H10D64/693

  the insulator comprising nitrogen, e.g. nitrides, oxynitrides or nitrogen-doped materials · CPC title