Exclusive-OR gate using magneto-electric tunnel junctions
US-9503085-B1 · Nov 22, 2016 · US
US9692413B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9692413-B2 |
| Application number | US-201615337962-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 28, 2016 |
| Priority date | Sep 30, 2015 |
| Publication date | Jun 27, 2017 |
| Grant date | Jun 27, 2017 |
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A configurable ME MTJ XOR/XNOR gate includes an insulator separating a top and bottom FM layer, a top ME layer with a first boundary magnetism at an interface of the top ME layer and the top FM layer, a bottom ME layer with a second boundary magnetism at an interface of the bottom ME layer and the bottom FM layer, and a top electrode coupled to the top ME layer and a bottom electrode coupled to the bottom ME layer. A voltage between the top electrode and FM layer is a first input, a voltage between the bottom electrode and FM layer is a second input, and a resistance between the top and bottom FM layer is indicative of the XOR or the XNOR of the inputs. The configurable ME MTJ XOR/XNOR gate has reduced energy consumption, smaller area, faster switching times, is non-volatile, and is configurable.
Opening claim text (preview).
What is claimed is: 1. A configurable magneto-electric (ME) magnetic tunnel junction (MTJ) Exclusive-OR (XOR)/Exclusive-NOR (XNOR) gate comprising: an insulator separating a top ferromagnetic (FM) layer and a bottom FM layer; a top ME layer on the top FM layer with a first boundary magnetism at an interface of the top ME layer and the top FM layer; a bottom ME layer on the bottom FM layer with a second boundary magnetism at an interface of the bottom ME layer and the bottom FM layer where the top ME layer and the bottom ME layer are opposite the insulator; and a top electrode coupled to the top ME layer and a bottom electrode coupled to the bottom ME layer; wherein a voltage between the top electrode and the top FM layer is a first input; a voltage between the bottom electrode and the bottom FM layer is a second input; and a resistance between the top FM layer and the bottom FM layer is indicative of either the XOR or the XNOR of the first input and the second input. 2. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein: the first boundary magnetism at the interface of the top ME layer and the top FM layer and the second boundary magnetism at the interface of the bottom ME layer and the bottom FM layer are directed in the same direction; and the resistance between the top FM layer and the bottom FM layer is indicative of the XNOR of the first input and the second input. 3. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein: the first boundary magnetism at the interface of the top ME layer and the top FM layer and the second boundary magnetism at the interface of the bottom ME layer and the bottom FM layer are directed opposite to one another; and the resistance between the top FM layer and the bottom FM layer is indicative of the XOR of the first input and the second input. 4. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein at least one of the first boundary magnetism and the second boundary magnetism is generated by a nanostructured magnet. 5. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein at least one of the first boundary magnetism and the second boundary magnetism is generated by a cross-wire array. 6. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein at least one of the first boundary magnetism and the second boundary magnetism is generated by a spin-transfer torque. 7. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein the top ME layer and the bottom ME layer are antiferromagnetic (AFM). 8. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein a voltage applied to the top ME layer through the top electrode causes the top ME layer to exhibit boundary magnetism, and a voltage applied to the bottom ME layer through the bottom electrode causes the bottom ME layer to exhibit boundary magnetism. 9. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein a relatively high resistance between the top FM layer and the bottom FM layer indicates a logical TRUE and a relatively low resistance between the top FM layer and the bottom FM layer indicates a logical FALSE. 10. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein: when the voltage between the top electrode and the top FM layer is similar to the voltage between the bottom electrode and the bottom FM layer, then spin vectors in the top FM layer will be aligned parallel to spin vectors in the bottom FM layer; and when the voltage between the top electrode and the top FM layer is dissimilar to the voltage between the bottom electrode and the bottom FM layer, then spin vectors in the top FM layer will be aligned antiparallel to spin vectors in the bottom FM layer. 11. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein a required surface area for forming the ME MTJ XOR gate is less than a required surface area for forming a Complementary Metal-Oxide Semiconductor (CMOS) XOR gate. 12. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein an amount of time to operate the ME MTJ XOR gate is less than an amount of time to operate a Complementary Metal-Oxide Semiconductor (CMOS) XOR gate. 13. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein at least one of the top ME layer and the bottom ME layer is chosen from the group consisting of Cr 2 O 3 and Fe 2 TeO 6 . 14. The configurable ME MTJ XOR/XNOR gate of claim 13 wherein both of the top ME layer and the bottom ME layer are Cr 2 O 3 . 15. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein the insulator is crystalline MgO. 16. The configurable ME MTJ XOR/XNOR gate of claim 1 wherein the insulator is less than 10 nanometers thick. 17. A method of configuring a configurable magneto-electric (ME) magnetic tunnel junction (MTJ) Exclusive-OR (XOR)/Exclusive-NOR (XNOR) gate comprising an insulator separating a top ferromagnetic (FM) layer and a bottom FM layer; a top ME layer on the top FM layer; a bottom ME layer on the bottom FM layer where the top ME layer and the bottom ME layer are opposite the insulator; and a top electrode coupled to the top ME layer and a bottom electrode coupled to the bottom ME layer, the method comprising: causing a first boundary magnetism at an interface of the top ME layer and the top FM layer; and causing a second boundary magnetism at an interface of the bottom ME layer and the bottom FM layer; wherein a voltage between the top electrode and the top FM layer is a first input; a voltage between the bottom electrode and the bottom FM layer is a second input; and a resistance between the top FM layer and the bottom FM layer is indicative of either the XOR or the XNOR of the first input and the second input. 18. The method of claim 17 wherein: causing the second boundary magnetism at the interface of the bottom ME layer and the bottom FM layer comprises causing the second boundary magnetism to be directed in the same direction as the first boundary magnetism at the interface of the top ME layer and the top FM layer; and the resistance between the top FM layer and the bottom FM layer is indicative of the XNOR of the first input and the second input. 19. The method of claim 17 wherein: causing the second boundary magnetism at the interface of the bottom ME layer and the bottom FM layer comprises causing the second boundary magnetism to be directed opposite to the first boundary magnetism at the interface of the top ME layer and the top FM layer; and the resistance between the top FM layer and the bottom FM layer is indicative of the XOR of the first input and the second input. 20. A method of operating a configurable magneto-electric (ME) magnetic tunnel junction (MTJ) Exclusive-OR (XOR)/Exclusive-NOR (XNOR) gate comprising an insulator separating a top ferromagnetic (FM) layer and a bottom FM layer; a top ME layer on the top FM layer; a bottom ME layer on the bottom FM layer where the top ME layer and the bottom ME layer are opposite the insulator; and a top electrode coupled to the top ME layer and a bottom electrode coupled to the bottom ME layer, the method comprising: causing a first boundary magnetism at an interface of the top ME layer and the top FM layer; causing a second boundary magnetism at an interface of the bottom ME layer and the bottom FM layer; wherein a voltage between the top electrode and the top FM layer is a first input; a voltage between the bottom electrode and the bottom FM layer is a second input; and a resistance between the top FM layer and the bottom FM layer is indicative of a first function chosen from the group consisting of the XOR or the XNOR of the first input
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