Pellicles and methods of manufacturing the same

Patent metadata

Field	Value
Publication number	US-9690190-B2
Application number	US-201514969645-A
Country	US
Kind code	B2
Filing date	Dec 15, 2015
Priority date	Jan 9, 2015
Publication date	Jun 27, 2017
Grant date	Jun 27, 2017

Abstract

A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.

First claim

What is claimed is:

1. A method of manufacturing a pellicle, the method comprising:
forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst;
forming a protective pattern on a second surface of the substrate;
immersing the substrate in an etchant solution in a container, such that a portion of the substrate exposed through the protective pattern is removed to form a frame;
replacing the etchant solution with a first solvent including water in the same container; and
replacing the first solvent with a second solvent including alcohol to remove the protective pattern in the same container.

2. The method as claimed in claim 1 , wherein the substrate is formed of at least one of iron (Fe), nickel (Ni), cobalt (Co), copper (Cu), and silicon (Si).

3. The method as claimed in claim 1 , wherein the membrane is formed of at least one of graphite, carbon nano tube (CNT), and graphene.

4. The method as claimed in claim 1 , wherein replacing the first solvent with the second solvent is performed using a dropping pipette.

5. The method as claimed in claim 1 , wherein removing the second solvent is performed by evaporation.

6. The method as claimed in claim 1 , wherein:
the protective pattern is formed on a peripheral portion of the substrate, and
the frame supports a peripheral portion of the membrane.

7. The method as claimed in claim 1 , wherein the etchant solution has a relatively high etching rate with respect to the substrate, and has a relatively low etching rate with respect to the protective pattern and the membrane.

8. The method as claimed in claim 1 , wherein the protective pattern is formed of a photoresist material, a polymer material, or an adhesive material.

Assignees

• Samsung Electronics Co Ltd
• Sungkyunkwan University'S Res & Business Found

Inventors

• Kim Mun-Ja
• Kim Tae-Sung
• Yoo Ji-Beom
• Kim Byung-Gook
• Kim Soo-Young
• Shin Dong-Wook
• Choi Jae-Hyuck

Classifications

• C23C16/56

  After-treatment · CPC title

• G03F1/64 Primary

  characterised by the frames, e.g. structure or material, including bonding means therefor · CPC title

• G03F1/62 Primary

  Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof · CPC title

• C01B32/205

  Preparation · CPC title

• C23C16/26

  Deposition of carbon only · CPC title