Extreme UV radiation light source device

Patent metadata

Field	Value
Publication number	US-9686846-B2
Application number	US-201615227082-A
Country	US
Kind code	B2
Filing date	Aug 3, 2016
Priority date	Apr 30, 2013
Publication date	Jun 20, 2017
Grant date	Jun 20, 2017

Abstract

An extreme ultraviolet light source device includes a raw material supplying mechanism. The raw material supplying mechanism includes a disk-shaped rotor, a motor for causing the rotor to rotate, a cover-shaped structure surrounding the rotor via a gap, and a first reservoir provided inside the cover-shaped structure for reserving a liquid high temperature plasma raw material. When the rotor rotates, a portion of the surface on the rotor becomes coated with the liquid high temperature plasma raw material. A portion of the cover-shaped structure has an aperture exposing that surface of the rotor which coated with the high temperature plasma raw material. The high temperature plasma raw material is irradiated with an energy beam from an energy beam supply device through the aperture, and generates EUV radiation.

First claim

The invention claimed is:

1. An extreme ultraviolet light source device comprising:
a disc-like rotating element having two side surfaces and an outer circumferential surface between said two side surfaces, each of the two side surfaces being flat;
a rotation unit configured to cause the rotating element to rotate about a rotation center shaft, which is perpendicular to one of the two side surfaces of the rotating element;
a cover-like structure configured to surround the rotating element with a gap;
a first reserving vessel disposed in the cover-like structure and configured to reserve a liquid high temperature plasma raw material, with part of the rotating element being immersed in the high temperature plasma raw material reserved in the first reserving vessel;
a raw material supplying mechanism configured to apply the liquid high temperature plasma raw material onto at least part of said one of the two side surfaces of the rotating element upon a rotating movement of the rotating element;
an energy beam providing device configured to irradiate the high temperature plasma raw material with an energy beam; and
a film thickness controlling mechanism provided in the cover-like structure, the film thickness controlling mechanism including a U-shaped structure, the U-shaped structure having two opposite sides and one connecting portion spanning the two opposite sides to define a U shape, each of the two opposite sides having a free end face, the U-shaped structure being biased by an elastic body in a direction against said one of the two side surfaces of the rotating element such that said free end faces of the two opposite sides of the U-shaped structure contact said one of the two side surfaces of the rotating element, a clearance between the rotating element and said one connecting portion of the U-shaped structure, which faces the rotating element, being set such that the liquid high temperature plasma raw material applied on the rotating element has a predetermined film thickness,
the cover-like structure having an opening to expose a portion of said one of the two side surfaces of the rotating element and a portion of the outer circumferential surface of the rotating element such that the energy beam is directed to said one of the two side surfaces of the rotating element, on which the high temperature plasma raw material is applied, through the opening of the cover-like structure, and extreme ultraviolet light generated upon irradiation of the energy beam is released from the opening of the cover-like structure,
the cover-like structure having a scattering preventing member extending in said opening of the cover-like structure, the scattering preventing member having a bending surface to oppose a direction of a centrifugal force acting on the rotating element, which is caused to rotate by the rotation unit, in said opening of the cover-like structure, the cover-like structure and the scattering preventing member being configured, in combination, to cover entirety of the outer circumferential surface of the rotating element.

2. The extreme ultraviolet light source device according to claim 1 , wherein a groove, a recess or a through hole is formed in at least said one of the two side surfaces of the disc-like rotating element which is irradiated with the energy beam, the two side surfaces of the rotating element being perpendicular to the rotation center shaft of the rotating element.

3. The extreme ultraviolet light source device according to claim 1 further comprising:
an electrode that faces at least said one of the two side surfaces of the disc-like rotating element in a region irradiated with the energy beam, the two side surfaces of the rotating element being perpendicular to the rotation center shaft of the rotating element; and
a power source device for applying a voltage across the electrode and the rotating element.

4. The extreme ultraviolet light source device according to claim 1 further comprising a liquid raw material circulating device, the liquid raw material circulating device including a second reserving vessel configured to reserve the high temperature plasma raw material, a raw material inflow conduit connected between the second reserving vessel and the first reserving vessel and configured to allow the high temperature plasma raw material to flow in the first reserving vessel from the second reserving vessel, a raw material outflow conduit connected between the second reserving vessel and the first reserving vessel and configured to allow the high temperature plasma raw material to flow in the second reserving vessel from the first reserving vessel, and a raw material drive unit configured to convey the high temperature plasma raw material to the first reserving vessel from the second reserving vessel.

5. The extreme ultraviolet light source device according to claim 1 , wherein the energy beam directed to said one of the two side surfaces of the rotating element onto which the high temperature plasma raw material is applied is a laser beam.

6. The extreme ultraviolet light source device according to claim 1 , wherein the energy beam directed to said one of the two side surfaces of the rotating element onto which the high temperature plasma raw material is applied includes two laser beams.

Assignees

• Ushio Electric Inc

Inventors

• Teramoto Yusuke
• Niimi Gota
• Hiraoka Takahiro
• Goldhoorn Pieter

Classifications

• H01S3/1643

  YAG · CPC title

• H01S3/23

  Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media · CPC title

• H01S3/2232

  Carbon dioxide (CO2) or monoxide [CO] · CPC title

• H05G2/002

  Supply of the plasma generating material · CPC title

• H05G2/0094 Primary

  Reduction, prevention or protection from contamination; Cleaning · CPC title